US4545851A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Etching method for semiconductor devices
Assignee: Fujitsu Ltd
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Filing: 1984-05-01
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Granted: 1985-10-08
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Expires: 2004-05-01
Abstract
Abstract An etching method for fabricating a contact hole in an insulating layer between multi-layered wiring layers of a semiconductor device. Etching is performed by chemical dry etching, in which the plasma of the etchant gas is formed in a separate chamber and fed to the etching chamber. The substrate is covered with a photo resist mask which includes a pattern hole and is heated, from the side opposite the mask, up to a softening temperature of the photo resist. The edge of the photo resist mask surrounding the pattern hole gradually rolls up as side etching proceeds under the edge of the photo resist mask with the result that the side walls of the contact hole are tapered. Consequently, the subsequently formed wiring layer formed thereon has good step coverage over the side walls of the contact hole, so that discontinuities and breakage of the wiring layer is prevented and the reliability and yield of the manufacturing process are improved.
Inventors
- 👤 Tadakazu Takada
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 12:47
CPC Classifications
H; H10; H10P; H10P95/00; H10P95/90; H10P95/906; H10P50/00; H10P50/20; H10P50/28; H10P50/282; H10P50/283; H10P50/73; H10P95/08
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
93 words
An etching method for fabricating a semiconductor device having first and second surfaces on opposite sides, said method comprising the steps of: (a) forming a layer to be etched on the first surface of the device; (b) forming a photo resist mask having a predetermined pattern on the layer and leaving a portion of the layer exposed; (c) heating the second surface of the device to a first temperature; and (d) supplying an active etchant gas at a second temperature lower than the first temperature and etching the portion of the layer exposed.
Claim 2
Dependent Claim
93 words
An etching method for fabricating a semiconductor device having first and second surfaces on opposite sides, said method comprising the steps of: (a) forming a layer to be etched on the first surface of the device; (b) forming a photo resist mask having a predetermined pattern on the layer and leaving a portion of the layer exposed; (c) heating the second surface of the device to a first temperature; and (d) supplying an active etchant gas at a second temperature lower than the first temperature and etching the portion of the layer exposed.
Claim 3
Dependent Claim
20 words
An etching method as recited in claim 1, wherein the first temperature is sufficient to soften the photo resist mask.
Claim 4
Dependent Claim
57 words
An etching method as recited in claim 1, further comprising the steps of: (e) placing the device in an etching chamber prior to step (c); and (f) generating a plasma etchant gas in a chamber separate from the etching chamber, and wherein step (d) comprises supplying the plasma to the etching chamber as the active etchant gas.
Claim 5
Dependent Claim
80 words
An etching method as recited in claim 1, wherein the layer to be etched includes an insulating layer and step (d) comprises forming a contact hole through the portion of the layer exposed, and said etching method further comprises the steps of: (e) forming a first wiring layer on the first surface of the substrate prior to step (a); and (f) forming an upper wiring layer on the insulating layer to contact the first wiring layer through the contact hole.
Claim 6
Dependent Claim
29 words
An etching method as recited in claim 1, wherein the photo resist mask comprises a positive photo resist film and the first temperature is between 120° and 160° C.
Claim 7
Dependent Claim
29 words
An etching method as recited in claim 1, wherein the photo resist mask comprises a negative photo resist film and the first temperature is between 160° and 200° C.
Claim 8
Dependent Claim
20 words
An etching method as recited in claim 1, wherein the active etchant gas comprises a mixture of tetrafluoromethane and oxygen.
Claim 9
Dependent Claim
71 words
An etching method as recited in claim 1, wherein the photo resist mask has an edge surrounding the portion of the layer which is exposed, and wherein step (d) comprises side etching and step (c) comprises gradually rolling up the edge of the photo resist mask, steps (c) and (d) occurring at least partially concurrently where the side etching proceeds as the edge of the photo resist mask is rolled up.
Claim 10
Independent Claim
56 words
A method of etching a semiconductor device having a resist mask on a first side with a hole therethrough, comprising the steps of: (a) heating a second side of the semiconductor device opposite to the first side; and (b) etching the first side of the semiconductor device through the hole with a dry etching plasma gas.
Claim 11
Independent Claim
56 words
A method of etching a semiconductor device having a resist mask on a first side with a hole therethrough, comprising the steps of: (a) heating a second side of the semiconductor device opposite to the first side; and (b) etching the first side of the semiconductor device through the hole with a dry etching plasma gas.
Claim 12
Dependent Claim
41 words
A method as recited in claim 9, wherein said heating in step (a) is to a first temperature sufficient to soften the resist mask and the dry etching plasma gas is supplied at a second temperature lower than the first temperature.
References Cited (Backward Citations)
US3986912A
Cited
US4354897A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1988-10-07 | 1989-04-08 | 1989-10-08 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1992-10-07 | 1993-04-08 | 1993-10-08 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1996-10-07 | 1997-04-08 | 1997-10-08 | $7700.00 | Window Closed / Lapsed |