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US4551575A Expired / Lapsed US ⏱️ 0.0 years remaining

Substrate for amorphous silicon semiconductor material

Assignee: Mitsubishi Chemical Corp
•
Filing: 1983-09-26
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Granted: 1985-11-05
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Expires: 2003-09-26
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Abstract

Abstract A substrate for an amorphous silicon semiconductor material characterized in that a metal or alloy film is formed on the surface of a metal substrate by means of an electroplating treatment.

Inventors

  • 👤 Kiyoshi Takahashi
  • 👤 Makoto Konagai
  • 👤 Toshihiko Yoshitomi
  • 👤 Takeshi Omori

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-02 22:38
CPC Classifications
H; H10; H10F; H10F77/00; H10F77/10; H10F77/16; H10F77/169; H10F77/1692; H10F71/00; H10F71/10; H10F71/103; Y; Y02; Y02E; Y02E10/00; Y02E10/50; Y02P; Y02P70/00; Y02P70/50; Y10; Y10T; Y10T428/00; Y10T428/12; Y10T428/12493; Y10T428/12528

Claims Analysis

Total Claims: 8
Claim 1
Independent Claim 105 words
An amorphous silicon semiconductor solar cell comprising one or more layers of amorphous silicon semiconductor material, a metal substrate on one side of and in contact with the amorphous silicon semiconductor material and a transparent electroconductive layer or Schottky barrier layer on the other side of and in contact with the silicon semiconductor material, characterized in that the surface of the metal substrate in contact with the amorphous silicon semiconductor is the surface of a two layer laminated metal or alloy film present upon an aluminum plate or film base and formed by means of an electroplating treatment on said aluminum plate or film base.
Claim 2
Dependent Claim 105 words
An amorphous silicon semiconductor solar cell comprising one or more layers of amorphous silicon semiconductor material, a metal substrate on one side of and in contact with the amorphous silicon semiconductor material and a transparent electroconductive layer or Schottky barrier layer on the other side of and in contact with the silicon semiconductor material, characterized in that the surface of the metal substrate in contact with the amorphous silicon semiconductor is the surface of a two layer laminated metal or alloy film present upon an aluminum plate or film base and formed by means of an electroplating treatment on said aluminum plate or film base.
Claim 3
Dependent Claim 48 words
An amorphous silicon semiconductor solar cell according to claim 1 wherein the said two layer laminated metal or alloy film formed by electroplating has a laminated structure in which nickel and chromium or nickel and rhodium are electroplated in the stated sequence on the aluminum plate or film.
Claim 4
Dependent Claim 30 words
An amorphous silicon semiconductor solar cell according to claim 1 wherein the said metal or alloy film formed by electroplating has a thickness of from 0.01 to 30 μm. PG,25
Claim 5
Dependent Claim 45 words
A multilayer structure comprising at least one layer of an amorphous silicon semiconductor material in contact with the surface of two layer laminated metal or alloy film present upon an aluminum plate or film base and formed by electroplating said aluminum plate or film base.
Claim 6
Dependent Claim 45 words
A multilayer structure comprising at least one layer of an amorphous silicon semiconductor material in contact with the surface of two layer laminated metal or alloy film present upon an aluminum plate or film base and formed by electroplating said aluminum plate or film base.
Claim 7
Dependent Claim 42 words
A structure according to claim 4, wherein the said two layer laminated metal or alloy film has a laminated structure in which nickel and chromium or nickel and rhodium are electroplated in the stated sequence on the aluminum plate or film base.
Claim 8
Dependent Claim 22 words
A structure according to claim 4, wherein the said metal or alloy film has a thickness of from 0.01 to 30 μm.

References Cited (Backward Citations)

JPS5694677A Cited
US4251289A Cited
US4284689A Cited
US4334523A Cited
US4359367A Cited
US4439470A Cited
US4431710A Cited
JPS57211279A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1988-11-04 1989-05-06 1989-11-05 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1992-11-04 1993-05-06 1993-11-05 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1996-11-04 1997-05-06 1997-11-05 $7700.00 Window Closed / Lapsed

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