US4575408A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for floating transport of substrates
Assignee: INTEGRATED AUTOMATION Ltd OLD SCOTIA BUILDING PO BOX 92 ROAD TOWN TORTOLA BVI A TORTOLA CORP
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Filing: 1983-08-23
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Granted: 1986-03-11
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Expires: 2003-08-23
Abstract
Abstract Improved apparatus (10), including passage (22) for inter-cushion processing and transport of substrates (12) towards and from process modules (14) and (16) for main processing of said substrates (12) at non-atmospheric pressure in a series of successive process chambers (64), located in between successive processors/transporters (66), in which secondary processing and transport of said substrates (12) take place.
Inventors
- 👤 Edward Bok
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 10:50
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/30; H10P72/36; B; B65; B65G; B65G51/00; B65G51/02; B65G51/03; H10P72/33; H10P72/3306; Y; Y10; Y10S; Y10S438/00; Y10S438/907
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
102 words
Method for floating gaseous transport and processing of substrates and tape comprising: (a) introducing said substrates into an elongated transport and processing passage; (b) maintaining a pressurized source of gaseous transport medium in communication with said passage; (c) injecting said pressurized gaseous transport medium from above and below into said passage via a successive series of transversely aligned gaseous medium supply ports, while (d) simultaneously removing said gaseous transport medium via a series of transversely arrayed discharge ports intersecting said passage both before and behind each said series of gaseous medium supply ports; and (e) processing the moving substrates within said passage.
Claim 2
Dependent Claim
102 words
Method for floating gaseous transport and processing of substrates and tape comprising: (a) introducing said substrates into an elongated transport and processing passage; (b) maintaining a pressurized source of gaseous transport medium in communication with said passage; (c) injecting said pressurized gaseous transport medium from above and below into said passage via a successive series of transversely aligned gaseous medium supply ports, while (d) simultaneously removing said gaseous transport medium via a series of transversely arrayed discharge ports intersecting said passage both before and behind each said series of gaseous medium supply ports; and (e) processing the moving substrates within said passage.
Claim 3
Dependent Claim
44 words
Method for floating gaseous transport and processing of substrates as in claim 1, wherein said gaseous transport medium supply ports and gaseous medium discharge ports are arranged successively in segment packages intersecting said passage and main processing is carried out intermediate said segment packages.
Claim 4
Dependent Claim
37 words
Method for floating gaseous transport and processing of substrates as in claim 2, wherein the discharge ports behind said supply ports provide a secondary flow of gaseous transport medium opposite to the direction of the moving substrate.
Claim 5
Dependent Claim
27 words
Method for floating gaseous transport and processing of substrates as in claim 1, including reducing the pressure of said gaseous transport medium in a pressure reduction module.
Claim 6
Dependent Claim
40 words
Method for floating gaseous transport and processing of substrates as in claim 2, wherein said main processing is conducted under a vacuum and within transporter segment discharge channels the pressure of said gaseous transport medium is dropped to near vacuum.
Claim 7
Dependent Claim
28 words
Method for floating gaseous transport and processing of substrates as in claim 5, including cooling by said gaseous transport medium in transporter segments subsequently of said main processing.
Claim 8
Dependent Claim
34 words
Method for floating gaseous transport and processing of substrates as in claim 6, including maintaining the temperature of said medium as secondary processing medium lower than the temperature of the surface of the substrate.
Claim 9
Dependent Claim
32 words
Method for floating gaseous transport and processing of substrates as in claim 7, wherein said main processing is from the group at least including microwave, electrostatic scanning, ion implantation, etching, and oxidation.
Claim 10
Dependent Claim
26 words
Method of floating gaseous transport and processing of substrates as in claim 8, wherein said processing is restricted to processing on one side of said substrate.
Claim 11
Dependent Claim
21 words
Method for floating gaseous transport and processing of substrates as in claim 8, including processing on both sides of said substrate.
Claim 12
Dependent Claim
36 words
Method for floating gaseous transport and processing of substrates as in claim 9, including maintaining the gaseous transport medium beneath said substrates at a greater pressure than the gaseous transport medium on top of said substrates.
Claim 13
Dependent Claim
22 words
Method for floating gaseous transport and processing of substrates as in claim 8, wherein said main processing is conducted under high vacuum.
Claim 14
Dependent Claim
30 words
Method for floating gaseous transport and processing of substrates as in claim 12, including removing of said main processing medium from (below said passage) processing chambers located between transporter segments.
References Cited (Backward Citations)
US3731823A
Cited
US3904506A
Cited
US4109157A
Cited
US4226526A
Cited
US4081201A
Cited
US4278366A
Cited
US4331526A
Cited
US4299518A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-03-10 | 1989-09-09 | 1990-03-11 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-03-10 | 1993-09-09 | 1994-03-11 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-03-10 | 1997-09-09 | 1998-03-11 | $7700.00 | Window Closed / Lapsed |