US4595745A
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Organic solvent-soluble photosensitive polyamide resin
Assignee: Ube Corp
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Filing: 1984-06-21
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Granted: 1986-06-17
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Expires: 2004-06-21
Abstract
Abstract An organic solvent-soluble photosensitive polyamide resin usable for producing photoset resin product having excellent heat resistance and electrical and mechanical properties, comprising a polycondensation product of an aromatic dicarboxylic acid component with an aromatic diamine component consisting of 10 to 100 molar % of a photosensitive diamine compound of the formula (I) and 10 to 90 molar % of a non-photosensitive diamine compound of the formula (II), H2N-R1-NH2 (I) H2N-R2-NH2 (II) wherein R1 represents an aromatic divalent residue having a photosensitive radical and R2 represents an armoatic divalent residue having no photosensitive radical.
Inventors
- 👤 Tsunetomo Nakano
- 👤 Hiroshi Yasuno
- 👤 Kazuaki Nishio
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 10:35
CPC Classifications
C; C08; C08G; C08G69/00; C08G69/02; C08G69/26; C08G69/40; G; G03; G03F; G03F7/00; G03F7/004; G03F7/038; G03F7/0387
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
213 words
An organic solvent-soluble photosensitive polyamide resin comprising a polycondensation product of an aromatic dicarboxylic acid component consisting of at least one member selected from the group consisting of aromatic carboxylic acids and acid halides thereof with an aromatic diamine component consisting of 10 to 100 molar % of at least one member selected from the group consisting of diamino chalcone compounds and aromatic diamine compounds of the formula ##STR12## wherein X represents a divalent radical selected from the group consisting of --CO--O-- and --CH 2 --O--; R 3 represents a radical selected from the group consisting of ##STR13## R 4 represents a member selected from the group consisting of --CH═CH 2 and ##STR14## R 5 represents a member selected from the group consisting of hydrogen and --NH--CO--R 4 ; R 6 represents a member selected from the group consisting of hydrogen and alkyl having from 1 to 5 carbon atoms; and R 7 represents a member selected from the group consisting of CH 2 ═CH--COOCH 2 CH 2 OOC-- and CH 2 ═C(CH 3 )--COOCH 2 CH 2 OOC--; and 0 to 90 molar % of at least one aromatic diamine compound of the formula (II): H.sub.2 N--R.sub.2 --NH.sub.2 (II) in which formula (II) R 2 represents a nonphoto crosslinkable aromatic divalent residue.
Claim 2
Dependent Claim
213 words
An organic solvent-soluble photosensitive polyamide resin comprising a polycondensation product of an aromatic dicarboxylic acid component consisting of at least one member selected from the group consisting of aromatic carboxylic acids and acid halides thereof with an aromatic diamine component consisting of 10 to 100 molar % of at least one member selected from the group consisting of diamino chalcone compounds and aromatic diamine compounds of the formula ##STR12## wherein X represents a divalent radical selected from the group consisting of --CO--O-- and --CH 2 --O--; R 3 represents a radical selected from the group consisting of ##STR13## R 4 represents a member selected from the group consisting of --CH═CH 2 and ##STR14## R 5 represents a member selected from the group consisting of hydrogen and --NH--CO--R 4 ; R 6 represents a member selected from the group consisting of hydrogen and alkyl having from 1 to 5 carbon atoms; and R 7 represents a member selected from the group consisting of CH 2 ═CH--COOCH 2 CH 2 OOC-- and CH 2 ═C(CH 3 )--COOCH 2 CH 2 OOC--; and 0 to 90 molar % of at least one aromatic diamine compound of the formula (II): H.sub.2 N--R.sub.2 --NH.sub.2 (II) in which formula (II) R 2 represents a nonphoto crosslinkable aromatic divalent residue.
Claim 3
Dependent Claim
29 words
The photosensitive polyamide resin as claimed in claim 1, wherein said aromatic dicarboxylic acid is selected from the group consisting of terephthalic acid, isophthalic acid, 4,4'-dicarboxy-biphenyl, 4,4'-dicarboxydiphenylmethane, and 4,4'-dicarboxy-biphenylether.
Claim 4
Dependent Claim
80 words
The photosensitive polyamide resin as claimed in claim 1, wherein said aromatic diamine compound of the formula (III) is selected from the group consisting of 3,5-diaminobenzoic acid ethyleneglycol monoacrylate ester, 3,5-diaminobenzoic acid ethyleneglycol monomethacrylate ester, 3,5-diaminobenzoic acid glycidyl acrylate ester, 3,5-diaminobenzoic acid glycidyl methacrylate ester, 3,5-diaminobenzoic acid cinnamic acid ester, 2,4-diaminobenzoic acid ethyleneglycol monoacrylate ester, 2,4-diaminobenzoic acid ethyleneglycol monomethacrylate ester, 2,4-diaminobenzoic acid glycidyl acrylate ester, 2,4-diaminobenzoic acid glycidyl methacrylate ester, 2,4-diaminobenzoic acid cinnamic acid ester 3,5-diaminobenzyl acrylate, and 3,5-diaminobenzyl methacrylate.
Claim 5
Dependent Claim
31 words
The photosensitive polyamide resin as claimed in claim 1, wherein the aromatic diamine compound of the formula (IV) is selected from the group consisting of 4-acrylamido-3,4'-diaminodiphenylether, 2-acrylamido-3,4'-diaminodiphenylether, 4-cinnamamido-3,4'-diaminodiphenylether, 3,4'-diacrylamido-3',4-diaminodiphenylether, and 3,4'-dicinnamamido-3',4-diaminodiphenylether.
Claim 6
Dependent Claim
29 words
The photosensitive polyamide resin as claimed in claim 1, wherein the aromatic diamine compound of the formula (V) is selected from the group consisting of 4-methyl-2'-carboxyethyl methacrylate-3,4'-diaminodiphenylether and 4-methyl-2'-carboxyethylacrylate-3,4'-diaminodiphenylether.
Claim 7
Dependent Claim
28 words
The photosensitive polyamide resin as claimed in claim 1, wherein the diaminochalcone compound is selected from the group consisting of 4,4'-diaminochalcone, 3,3'-diaminochalcone, 3,4'-diaminochalcone, 3',4-diaminochalcone, 4'-methyl-3',4-diaminochalcone, 4'-methoxy-3',4-diaminochalcone and 3'-methyl-3,5-diaminochalcone.
Claim 8
Dependent Claim
35 words
The photosensitive polyamide resin as claimed in claim 1, wherein said aromatic diamine compound of the formula (II) is selected from the group consisting of p-phenylenediamine, m-phenylenediamine, 2,4-diaminotoluene, 4,4'-diaminodiphenylether, 4,4'-diaminodiphenylmethane, o-toluidine, 1,4-bis(4-aminophenoxy)benzene, 2,2-bis(4-aminophenoxyphenyl)propane and o-toluidinesulfone.
Claim 9
Dependent Claim
51 words
The photosensitive polyamide resin as claimed in claim 1, wherein the aromatic divalent residue R 2 in said aromatic diamine compound of the formula (II) is selected from the group consisting of residues of the formula: ##STR15## wherein Ar represents an aromatic ring and R represents a methyl or ethyl group.
Claim 10
Dependent Claim
38 words
The photosensitive polyamide resin as claimed in claim 8, wherein the amount of said aromatic diamine compound of the formula (II) is not more than 40 molar % based on the total amount of the aromatic diamine component.
Claim 11
Dependent Claim
32 words
The photosensitive polyamide resin as claimed in claim 8, wherein said aromatic diamine compound of the formula (II) is selected from the group consisting of 9,9-bis(4-aminophenyl)-10-anthrone, 1,5-diaminoanthaquinone, 1,4-diaminoanthraquinone, 3,3'-diaminobenzophenone, 4'-N,N-dimethylamino,3,5-diaminobenzophenone, and 1-dimethylamino-4-(3,5-diaminobenzoyl)naphthalene.
References Cited (Backward Citations)
US4397999A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-06-16 | 1989-12-16 | 1990-06-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-06-16 | 1993-12-16 | 1994-06-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-06-16 | 1997-12-16 | 1998-06-17 | $7700.00 | Window Closed / Lapsed |