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US4645684A Expired / Lapsed US ⏱️ 0.0 years remaining

Method for forming deposited film

Assignee: Canon Inc
•
Filing: 1985-10-03
•
Granted: 1987-02-24
•
Expires: 2005-10-03
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Abstract

Abstract A method for forming a deposited film comprises forming in a vacuum chamber housing a substrate therein a deposited film containing silicon on the substrate by subjecting a gas represented by the general formula: ##STR1## wherein R 1 , R 2 , R 3 and R 4 , can be the same or different and are each independently hydrogen or a hydrocarbon group, to polymerization.

Inventors

  • 👤 Yoshiyuki Osada
  • 👤 Hisanori Tsuda
  • 👤 Masafumi Sano
  • 👤 Satoshi Omata
  • 👤 Katsuji Takasu
  • 👤 Yutaka Hirai

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-27 21:17
CPC Classifications
B; B05; B05D; B05D1/00; B05D1/60; B05D1/62; B05D3/00; B05D3/06; B05D3/061; Y; Y02; Y02E; Y02E10/00; Y02E10/50; Y02E10/549

Claims Analysis

Total Claims: 8
Claim 1
Independent Claim 83 words
A method for forming a deposited film, comprising subjecting a gas represented by the formula: ##STR4## wherein R 1 , R 2 , R 3 and R 4 are the same or different and are each independently hydrogen or a hydrocarbon group, in a vacuum chamber housing a substrate therein, to at least one energy selected from the group consisting of plasma energy, light energy and heat energy to hereby polymerize said gas and form a deposited film containing silicon on the substrate.
Claim 2
Independent Claim 83 words
A method for forming a deposited film, comprising subjecting a gas represented by the formula: ##STR4## wherein R 1 , R 2 , R 3 and R 4 are the same or different and are each independently hydrogen or a hydrocarbon group, in a vacuum chamber housing a substrate therein, to at least one energy selected from the group consisting of plasma energy, light energy and heat energy to hereby polymerize said gas and form a deposited film containing silicon on the substrate.
Claim 3
Dependent Claim 12 words
The method according to claim 1, wherein the energy is plasma energy.
Claim 4
Dependent Claim 12 words
The method according to claim 1, wherein the energy is heat energy.
Claim 5
Dependent Claim 11 words
The method according to claim 1, wherein energy is light energy.
Claim 6
Dependent Claim 24 words
The method according to claim 1, wherein at least one of R 1 , R 2 , R 3 and R 4 is hydrogen.
Claim 7
Dependent Claim 24 words
The method according to claim 1, wherein at least one of R 1 , R 2 , R 3 and R 4 is alkyl.
Claim 8
Dependent Claim 24 words
The method according to claim 1, wherein at least one of R 1 , R 2 , R 3 and R 4 is aryl.

References Cited (Backward Citations)

No citation records indexed.

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1990-02-23 1990-08-25 1991-02-24 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1994-02-23 1994-08-25 1995-02-24 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1998-02-23 1998-08-25 1999-02-24 $7700.00 Window Closed / Lapsed

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