US4663269A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of forming highly sensitive photoresist film in the absence of water
Assignee: POLYTECHNIC INSTITUTE OF NEW YORK 333 JAY STREET BROOKLYN NEW YORK 111201 A CORP OF NY
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Filing: 1985-08-07
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Granted: 1987-05-05
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Expires: 2005-08-07
Abstract
Abstract Method of forming highly sensitive, high resolution positive photoresist compositions that are developed from polycarbonates derived from t-diols and various diphenols and homopolycarbonates from t-diols, mixed with 2-10% of onium salts wtih complex metal halide counterions. The high sensitivity of the photoresist compositions is due to the thermodynamic stabilities of the resulting incipient dicarbocations and dienes.
Inventors
- 👤 Subhash C. Narang
- 👤 Shabbir Attarwala
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 18:26
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/039
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
78 words
A method of forming positive images with high sensitivity and high resolution in the absence of water on a substrate comprising: (a) forming on the substrate a photoresist film comprising 2-10% by weight of onium salts and a polycarbonate, as follows: ##STR3## where R, R', R"=aryl, alkyl, arylalkyl, R'"=aryl, (CH 2 )n and aralkyl; (b) exposing the film to radiation; and (c) removing the radiation exposed portion of said film with an organic solvent or aqueous alkali solution.
Claim 2
Independent Claim
78 words
A method of forming positive images with high sensitivity and high resolution in the absence of water on a substrate comprising: (a) forming on the substrate a photoresist film comprising 2-10% by weight of onium salts and a polycarbonate, as follows: ##STR3## where R, R', R"=aryl, alkyl, arylalkyl, R'"=aryl, (CH 2 )n and aralkyl; (b) exposing the film to radiation; and (c) removing the radiation exposed portion of said film with an organic solvent or aqueous alkali solution.
Claim 3
Dependent Claim
29 words
A method of forming positive images with high sensitivity and high resolution as in claim 1, wherein the onium salt is a catalyst for the degradation of the polycarbonate.
Claim 4
Dependent Claim
56 words
A method of forming positive images with high sensitivity and high resolution as in claim 2, including applying the photoresist composition as a thin film upon a substrate prior to said photolyzing, then post-baking at a temperature below the glass transition temperature of the polymer, so as to effect acid catalyzed thermal decomposition of the polycarbonate.
Claim 5
Independent Claim
86 words
A method of forming positive images with high sensitivity and high resolution comprising: a. photolyzing a thin film of photoresist composition consisting of: i. a polycarbonate, as follows: ##STR4## where R, R', R"=aryl, alkyl, arylalkyl, R'"=aryl, (CH 2 )n and aralkyl; ii. a catalyst onium salt, and; iii. complex metal halide counterions; b. post-baking at a temperature below the glass transition temperature of the polymer so as to effect acid catalyzed thermal decomposition of said polycarbonate; and c. developing the photolyzed composition in an organic solvent.
Claim 6
Independent Claim
86 words
A method of forming positive images with high sensitivity and high resolution comprising: a. photolyzing a thin film of photoresist composition consisting of: i. a polycarbonate, as follows: ##STR4## where R, R', R"=aryl, alkyl, arylalkyl, R'"=aryl, (CH 2 )n and aralkyl; ii. a catalyst onium salt, and; iii. complex metal halide counterions; b. post-baking at a temperature below the glass transition temperature of the polymer so as to effect acid catalyzed thermal decomposition of said polycarbonate; and c. developing the photolyzed composition in an organic solvent.
Claim 7
Dependent Claim
32 words
A method of forming positive images with high sensitivity and high resolution as in claim 3, wherein said applying of photoresist composition is as a film with a thickness of 2.0 microns.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1990-05-04 | 1990-11-03 | 1991-05-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1994-05-04 | 1994-11-03 | 1995-05-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1998-05-04 | 1998-11-03 | 1999-05-05 | $7700.00 | Window Closed / Lapsed |