US4665412A
Expired / Lapsed
US
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Coupled heterostructure superlattice devices
Assignee: General Atomics Corp
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Filing: 1985-06-19
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Granted: 1987-05-12
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Expires: 2005-06-19
Abstract
Abstract A superlattice quantum well device comprising a first set of conductive layers and a second set of conductive layers having discrete electronic energy levels different from those of the first set of layers, separated by relatively nonconductive insulation layers.
Inventors
- 👤 Tihiro Ohkawa
- 👤 Lawrence D. Woolf
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-06 07:24
CPC Classifications
H; H10; H10D; H10D62/00; H10D62/80; H10D62/81; H10D62/815; H10D62/8161; H10D62/8162; H10D48/00; H10D48/30; H10D48/32; H10D48/36; H10D48/362; H10D62/8163
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
156 words
A superlattice quantum well device comprising an integral periodic array of a plurality of quantum mechanically coupled conductive layers separated by relatively nonconductive insulation layers, said conductive layers comprising a first set of conductive layers each having a first set of discrete electronic energy levels of predetermined energy spacing and a second set of conductive layers each having a second set of discrete electronic energy levels of predetermined energy spacing different from said energy spacing of said first set of conductive layers, said conductive layers of said first set of layers being interleaved with said conductive layers of said second set of layers such that charge carriers may resonantly tunnel in the array through said insulator layers between said conductive layers at an energy level common to both said first set of discrete energy levels of said first set of conductive layers and said second set of energy levels of said second set of conductive layers.
Claim 2
Dependent Claim
156 words
A superlattice quantum well device comprising an integral periodic array of a plurality of quantum mechanically coupled conductive layers separated by relatively nonconductive insulation layers, said conductive layers comprising a first set of conductive layers each having a first set of discrete electronic energy levels of predetermined energy spacing and a second set of conductive layers each having a second set of discrete electronic energy levels of predetermined energy spacing different from said energy spacing of said first set of conductive layers, said conductive layers of said first set of layers being interleaved with said conductive layers of said second set of layers such that charge carriers may resonantly tunnel in the array through said insulator layers between said conductive layers at an energy level common to both said first set of discrete energy levels of said first set of conductive layers and said second set of energy levels of said second set of conductive layers.
Claim 3
Dependent Claim
26 words
A device in accordance with claim 1 wherein said device comprises at least about 10 conductive quantum well layers separated by thin insulation tunneling barrier layers.
Claim 4
Dependent Claim
46 words
A device in accordance with claim 1 wherein said conductive layers are composed of a metal or metal alloy having a charge carrier concentration of at least 10 21 cm -3 and a thickness in the range of from about 10 Angstroms to about 300 Angstroms.
Claim 5
Dependent Claim
43 words
A device in accordance with claim 1 wherein said conductive layers are composed of a semiconductor having a charge carrier concentration of at least 10 17 cm -3 and a thickness in the range of from about 10 Angstroms to about 300 Angstroms.
Claim 6
Dependent Claim
23 words
A device in accordance with claim 1 wherein the energy level spacings in each conductor layer are at least about 10 -3 eV.
Claim 7
Dependent Claim
14 words
A device in accordance with claim 1 wherein said array is a monocrystalline heterostructure.
Claim 8
Dependent Claim
31 words
A device in accordance with claim 1 wherein said insulation layers are composed of a semiconductor having a bandgap at least 0.2 eV greater than the bandgap of said conductor layers.
Claim 9
Dependent Claim
50 words
A device in accordance with claim 1 wherein said insulation layers are composed of a high bandgap dielectric having a bandgap of at least about 2.0 eV, a bulk conductivity of less than about 1×10 -8 ohm -1 cm -1 , and a thickness of less than about 20 Angstroms.
Claim 10
Dependent Claim
61 words
A quantum well device comprising a substantially monocrystalline metallic layer of a metallic compound selected from the group consisting of nickel disilicide and cobalt disilicide, a first substantially monocrystalline insulator layer of calcium difluoride epitaxially adjacent one side of said conductor layer, and a second substantially monocrystalline insulator layer of calcium difluoride epitaxially adjacent the other side of said metallic layer.
Claim 11
Dependent Claim
61 words
A quantum well device comprising a substantially monocrystalline metallic layer of a metallic compound selected from the group consisting of nickel disilicide and cobalt disilicide, a first substantially monocrystalline insulator layer of calcium difluoride epitaxially adjacent one side of said conductor layer, and a second substantially monocrystalline insulator layer of calcium difluoride epitaxially adjacent the other side of said metallic layer.
Claim 12
Dependent Claim
48 words
A device in accordance with claim 9 wherein said first and said second insulator layers have a thickness in the range of from about 10 to about 25 Angstroms, and wherein said metallic layer has a thickness in the range of from about 50 to about 500 Angstroms.
Claim 13
Dependent Claim
31 words
A heteroepitaxial composition comprising a substantially monocrystalline conductive layer selected from the group consisting of cobalt disilicide and nickel disilicide, and epitaxially adjacent thereto a substantially monocrystalline layer of calcium difluoride.
Claim 14
Dependent Claim
31 words
A heteroepitaxial composition comprising a substantially monocrystalline conductive layer selected from the group consisting of cobalt disilicide and nickel disilicide, and epitaxially adjacent thereto a substantially monocrystalline layer of calcium difluoride.
References Cited (Backward Citations)
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