US4674180A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of making a micromechanical electric shunt
Assignee: Schneider Electric Systems USA Inc
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Filing: 1984-05-01
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Granted: 1987-06-23
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Expires: 2004-05-01
Abstract
Abstract A micromechanical electric shunt is fabricated by micromachining according to recent IC fabrication procedures. A plurality of such shunts is incorporated on a single substrate to form novel process station or post identification or signature encoding apparatus for use on a telecommunications bus or the equivalent. Such identification of signature encoding apparatus may be configured for conventional binary coding. Both frequency and current derivative mode apparatus are disclosed.
Inventors
- 👤 Paul M. Zavracky
- 👤 Richard H. Morrison, Jr.
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-06 08:24
CPC Classifications
B; B81; B81C; B81C1/00; B81C1/00015; B81C1/00134; B81C1/0015; G; G06; G06K; G06K19/00; G06K19/06; G06K19/067; H; H01; H01H; H01H1/00; H01H1/0036; B81B; B81B2203/00; B81B2203/03; B81B2203/0353; B81C2201/00; B81C2201/05; B81C2201/056; Y; Y10; Y10T; Y10T29/00; Y10T29/49; Y10T29/49002; Y10T29/49105; Y10T29/49117; Y10T29/49204; Y10T29/49224
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
226 words
The method of making a micromechanical electric shunt on a substrate having a planar top surface, comprising the steps of: (a) preparing an insulating substrate by cleaning and drying the top surface thereof; (b) depositing a first metallic covering layer on the top surface of said substrate; (c) depositing a second metallic layer on the top surface of said first metallic layer; (d) removing excess of said metallic layers from around two spaced apart areas of said metallic layers to produce a first metallic terminal and a second metallic terminal, by etching; (e) depositing a removable third metallic layer over the top surface of said substrate, including said first terminal and said second terminal; (f) etching a first hole through said third metallic layer to said first terminal and etching a second hole into said third metallic layer to form a surface within said third metallic layer and which is separated from said second terminal; (g) providing an elongated cantilever beam plating surface resist pattern around and between said first and second holes on said third metallic layer; (h) depositing a fourth metallic layer on said third metallic layer within said cantilever beam plating surface pattern to form a cantilever beam; (i) removing said resist pattern; (j) relieving said cantilever beam by removal of the entire third metallic layer; and (k) cleaning the micromechanical electric shunt.
Claim 2
Independent Claim
226 words
The method of making a micromechanical electric shunt on a substrate having a planar top surface, comprising the steps of: (a) preparing an insulating substrate by cleaning and drying the top surface thereof; (b) depositing a first metallic covering layer on the top surface of said substrate; (c) depositing a second metallic layer on the top surface of said first metallic layer; (d) removing excess of said metallic layers from around two spaced apart areas of said metallic layers to produce a first metallic terminal and a second metallic terminal, by etching; (e) depositing a removable third metallic layer over the top surface of said substrate, including said first terminal and said second terminal; (f) etching a first hole through said third metallic layer to said first terminal and etching a second hole into said third metallic layer to form a surface within said third metallic layer and which is separated from said second terminal; (g) providing an elongated cantilever beam plating surface resist pattern around and between said first and second holes on said third metallic layer; (h) depositing a fourth metallic layer on said third metallic layer within said cantilever beam plating surface pattern to form a cantilever beam; (i) removing said resist pattern; (j) relieving said cantilever beam by removal of the entire third metallic layer; and (k) cleaning the micromechanical electric shunt.
Claim 3
Dependent Claim
10 words
The method of claim 1, wherein said substrate is glass.
Claim 4
Dependent Claim
12 words
The method of claim 1, wherein said first metallic layer is chromium.
Claim 5
Dependent Claim
12 words
The method of claim 1, wherein said second metallic layer is gold.
Claim 6
Dependent Claim
17 words
The method of claim 4, wherein said second metallic layer is between 2,000 and 3,000 Angstroms thick.
Claim 7
Dependent Claim
12 words
The method of claim 1, wherein said third metallic layer is nickel.
Claim 8
Dependent Claim
17 words
The method of claim 6, wherein said third metallic layer is between 1 and 2 microns thick.
Claim 9
Dependent Claim
23 words
The method of claim 1, further including the step of depositing an electrical resistance layer on said second terminal last before step (e).
Claim 10
Dependent Claim
27 words
The method of claim 8, wherein said electrical resistance layer is selected from the group consisting of germanium, copper, an oxide of copper, silicon, or aluminum-bearing silicon.
Claim 11
Dependent Claim
21 words
The method of claim 1, further including forming in step (d) a force-plate terminal between said first and second metallic terminals.
Claim 12
Dependent Claim
26 words
The method of claim 1, further including additional repetitions of steps (a) through (k) to form a plurality of micromechanical electric shunts on a single substrate.
Claim 13
Dependent Claim
72 words
The method of claim 1, further including the additional process steps of: forming first and second elongated, spaced apart, unconnected electrical contact buses, one of said buses including one of said first and second metallic terminals; forming a fusible link between the other of said buses and the other of said first and second metallic terminals; enlarging the other of said first and second metallic layers to form an expanded contact area.
Claim 14
Dependent Claim
39 words
The method of claim 1, further including the additional process steps of: forming a capacitor electrically connected to and parallel with said micromechanical electrical shunt, and forming a resistor electrically connected in series with said capacitor and shunt combination.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1990-06-22 | 1990-12-22 | 1991-06-23 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1994-06-22 | 1994-12-22 | 1995-06-23 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1998-06-22 | 1998-12-22 | 1999-06-23 | $7700.00 | Window Closed / Lapsed |