US4715929A
Expired / Lapsed
US
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Pattern forming method
Assignee: Panasonic Holdings Corp
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Filing: 1986-07-15
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Granted: 1987-12-29
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Expires: 2006-07-15
Abstract
Abstract Method of forming any film pattern on an arbitrary substrate, more particularly, a pattern forming method which comprises selectively forming a film on an arbitrary substrate, by use of chemical vapor reaction, and further, a method of forming the pattern of an organic film by selectively removing the organic film at a lower layer, using the pattern of the Langmuir-Blodgett's film or chemical adsorption film containing Si as a mask.
Inventors
- 👤 Kazufumi Ogawa
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 10:45
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/16; G03F7/165; G03F7/004; G03F7/027; G03F7/075; G03F7/0757; G03F7/26; G03F7/265; G03F7/38; H; H10; H10P; H10P14/00; H10P14/60; H10P14/63; H10P14/6326; H10P14/6342; H10P14/6344; H10P14/69; H10P14/692; H10P14/6921; H10P14/6922
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
116 words
A pattern forming method comprising the steps of: forming on a substrate a monomolecular film having responsive groups which undergo chemical vapor reactions under irradiation of an energy beam; irradiating an energy beam in a pattern on said monomolecular film, thereby forming bonds between said responsive groups at the irradiated portion to selectively deactivate the responsive groups in the irradiated portion; transferring said substrate into a polymerizing monomer atmosphere; and irradiating the entire surface of said monomolecular film in said monomer atmosphere to activate the responsive groups in a pattern not deactivated and additionally polymerize said monomer onto the monomolecular film except in the previously deactivated portion, whereby a polymerized film is formed in a pattern.
Claim 2
Dependent Claim
116 words
A pattern forming method comprising the steps of: forming on a substrate a monomolecular film having responsive groups which undergo chemical vapor reactions under irradiation of an energy beam; irradiating an energy beam in a pattern on said monomolecular film, thereby forming bonds between said responsive groups at the irradiated portion to selectively deactivate the responsive groups in the irradiated portion; transferring said substrate into a polymerizing monomer atmosphere; and irradiating the entire surface of said monomolecular film in said monomer atmosphere to activate the responsive groups in a pattern not deactivated and additionally polymerize said monomer onto the monomolecular film except in the previously deactivated portion, whereby a polymerized film is formed in a pattern.
Claim 3
Dependent Claim
34 words
The pattern forming method of claim 1, wherein the monomolecular film is formed so that the responsive groups may be exposed in line on the substrate surface by a Langmuir-Blodgett process or adsorption process.
Claim 4
Dependent Claim
18 words
The pattern forming method of claim 1, wherein a substance containing Si is used as the polymerizing monomer.
Claim 5
Dependent Claim
47 words
The pattern forming method of claim 3, wherein an organic photosensitive film is formed on the substrate, a polymerized film in a pattern is formed by a substance containing Si selectively, and oxygen plasma processing is conducted to transfer the pattern containing Si onto said organic film.
Claim 6
Dependent Claim
25 words
The pattern forming method of claim 1, wherein a vinyl group or ethynyl group is the responsive group or polymerizing group of the polymerizing monomer.
Claim 7
Dependent Claim
128 words
A pattern forming method comprising the steps of: forming on a substrate a monomolecular film having responsive groups which undergo chemical vapor reactions under irradiation of an energy beam; irradiating an energy beam in a pattern on said monomolecular film, thereby forming bonds between said responsive groups at the irradiated portion to selectively deactivate the responsive groups in the irradiated portion; irradiating energy beams, in vacuum, onto the entire surface of the monomolecular film having the responsive groups deactivated in the pattern, to activate the responsive groups not deactivated in the preceding step; and introducing a polymerizing monomer gas onto the responsive film to polymerize said monomer onto the monomolecular film in an area other than said pattern irradiated portion, thereby forming a polymerized film in a pattern.
Claim 8
Dependent Claim
128 words
A pattern forming method comprising the steps of: forming on a substrate a monomolecular film having responsive groups which undergo chemical vapor reactions under irradiation of an energy beam; irradiating an energy beam in a pattern on said monomolecular film, thereby forming bonds between said responsive groups at the irradiated portion to selectively deactivate the responsive groups in the irradiated portion; irradiating energy beams, in vacuum, onto the entire surface of the monomolecular film having the responsive groups deactivated in the pattern, to activate the responsive groups not deactivated in the preceding step; and introducing a polymerizing monomer gas onto the responsive film to polymerize said monomer onto the monomolecular film in an area other than said pattern irradiated portion, thereby forming a polymerized film in a pattern.
Claim 9
Dependent Claim
34 words
The pattern forming method of claim 6, wherein the monomolecular film is formed so that the responsive groups may be exposed in line on the substrate surface by a Langmuir-Blodgett process or adsorption process.
Claim 10
Dependent Claim
18 words
The pattern forming method of claim 6, wherein a substance containing Si is used as the polymerizing monomer.
Claim 11
Dependent Claim
47 words
The pattern forming method of claim 8, wherein an organic photosensitive film is formed on the substrate, a polymerized film in a pattern is formed by a substance containing Si selectively, and oxygen plasma processing is conducted to transfer the pattern containing Si onto said organic film.
Claim 12
Dependent Claim
24 words
The pattern forming method claim 6, wherein a vinyl group or ethynyl group is the responsive group and polymerizing group of the polymerizing monomer.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1990-12-28 | 1991-06-29 | 1991-12-29 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1994-12-28 | 1995-06-29 | 1995-12-29 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1998-12-28 | 1999-06-29 | 1999-12-29 | $7700.00 | Window Closed / Lapsed |