US4716050A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Chemical vapor deposition of aluminum on an activated surface
Assignee: Nokia Bell Labs
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Filing: 1986-11-10
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Granted: 1987-12-29
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Expires: 2006-11-10
Abstract
Abstract Chemical vapor deposition of an aluminum layer on a substrate is facilitated by surface activation prior to deposition. Surface activation is at relatively low temperature and results in a hydrated surface; low temperature surface activation is advantageous in the interest of keeping deposition apparatus free of additional chemicals, and substrates activated in this manner may be stored for considerable lengths of time prior to aluminum deposition. Among suitable activating agents are organochromium, organosilane, and organoaluminum compounds.
Inventors
- 👤 Martin L. Green
- 👤 Roland A. Levy
- 👤 Ralph G. Nuzzo
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 01:42
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/04; C23C16/06; C23C16/18; C23C16/20; H; H10; H10P; H10P14/00; H10P14/40; H10P14/412; H10P14/42; H10P14/43
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
70 words
In the manufacture of semiconductor integrated devices, a method for depositing an aluminum layer on a surface, said depositing being by chemical vapor deposition while said substrate is heated at a desired temperature, and said method comprising treating said surface, prior to said depositing, with an activating agent so as to produce on said surface a surface layer comprising hydroxyl groups, derivatizing said surface layer, and decomposing the derivatized layer.
Claim 2
Dependent Claim
70 words
In the manufacture of semiconductor integrated devices, a method for depositing an aluminum layer on a surface, said depositing being by chemical vapor deposition while said substrate is heated at a desired temperature, and said method comprising treating said surface, prior to said depositing, with an activating agent so as to produce on said surface a surface layer comprising hydroxyl groups, derivatizing said surface layer, and decomposing the derivatized layer.
Claim 3
Dependent Claim
28 words
Method of claim 1 in which said surface is treated with said activating agent while said substrate is at a temperature which is less than 100 degrees C.
Claim 4
Dependent Claim
20 words
Method of claim 1 in which hydroxyl groups are established on said surface prior to treatment with said activating agent.
Claim 5
Dependent Claim
12 words
Method of claim 3 in which hydroxyl groups are established by rinsing.
Claim 6
Dependent Claim
15 words
Method of claim 4 in which said surface is cleaned by acid prior to rinsing.
Claim 7
Dependent Claim
13 words
Method of claim 1 in which said activating agent is an organochromium compound.
Claim 8
Dependent Claim
13 words
Method of claim 1 in which said activating agent is an organosilane compound.
Claim 9
Dependent Claim
14 words
Method of claim 1 in which said activating agent is an aluminum alkyl compound.
Claim 10
Dependent Claim
19 words
Method of claim 1 in which said activating agent is an organosilane compound followed by an aluminum alkyl compound.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1990-12-28 | 1991-06-29 | 1991-12-29 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1994-12-28 | 1995-06-29 | 1995-12-29 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1998-12-28 | 1999-06-29 | 1999-12-29 | $7700.00 | Window Closed / Lapsed |