US4720445A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Copolymers from maleimide and aliphatic vinyl ethers and esters used in positive photoresist
Assignee: EMD Performance Materials Corp
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Filing: 1986-02-18
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Granted: 1988-01-19
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Expires: 2006-02-18
Abstract
Abstract A novel positive photoresist formulation is provided based on a 1:1 copolymer of maleimide and an aliphatic vinyl ether or ester in combination with a photoactive sensitizer capable of undergoing a change in aqueous alkaline solubility upon exposure to actinic radiation. The copolymers disclosed have structures of the following type: ##STR1## where R is an alkyl substituent of from 1 to 20 carbon atoms, benzyl, C 1 to C 10 aralkyl, C 3 to C 12 cycloalkyl or ##STR2## where R" has the structures assigned to R, and where R' is independently H, C 1 to C 10 alkyl, phenyl, benzyl or C 1 to C 10 aralkyl. The polymers are compounded with a photoactive sensitizer capable of undergoing a change in aqueous alkaline solubility upon exposure to actinic radiation such as with diazonaphthoquinone sulfonic acid esters and amides. The polymer and sensitizer compositions are dissolved together in a solvent useful for spin casting of thin films on substrates.
Inventors
- 👤 Karime Brahim
- 👤 Michael J. McFarland
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 20:39
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/022; G03F7/023; G03F7/0233
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
137 words
A positive photoresist composition comprising a mixture of: (a) 1 to 35 dry weight percent of an alkali-insoluble photoactive compound, capable of being transferred into an alkali-soluble species upon exposure to actinic radiation, in an amount sufficient to render the mixture alkali-insoluble prior to exposure; and (b) 65-99 dry weight percent of a film forming copolymer of maleimide and a vinyl ether or vinyl ester having the structure: ##STR9## where R is an alkyl substitutent of from 1 to 20 carbon atoms, R 1 is independently H,C 1 to C 10 alkyl, phenyl, benzyl, or C 1 to C 10 aralkyl and wherein said copolymer has a sufficient number of imide N--H groups to render the mixture soluble in aqueous alkali after exposure; and (c) a solvent capable of dissolving both the polymer and the photoactive compound.
Claim 2
Dependent Claim
137 words
A positive photoresist composition comprising a mixture of: (a) 1 to 35 dry weight percent of an alkali-insoluble photoactive compound, capable of being transferred into an alkali-soluble species upon exposure to actinic radiation, in an amount sufficient to render the mixture alkali-insoluble prior to exposure; and (b) 65-99 dry weight percent of a film forming copolymer of maleimide and a vinyl ether or vinyl ester having the structure: ##STR9## where R is an alkyl substitutent of from 1 to 20 carbon atoms, R 1 is independently H,C 1 to C 10 alkyl, phenyl, benzyl, or C 1 to C 10 aralkyl and wherein said copolymer has a sufficient number of imide N--H groups to render the mixture soluble in aqueous alkali after exposure; and (c) a solvent capable of dissolving both the polymer and the photoactive compound.
Claim 3
Dependent Claim
18 words
The photoresist composition of claim 1 wherein the photoactive compound is a diazonaphthoquinone sulfonic acid ester or amide.
Claim 4
Dependent Claim
14 words
The photoresist of claim 1 wherein the photoactive compound is a diazobarbituric acid derivative.
Claim 5
Dependent Claim
15 words
The photoresist composition of claim 1 wherein the imide containing polymer is poly(maleimide-co-n-decyl vinyl ether).
Claim 6
Dependent Claim
15 words
The photoresist composition of claim 1 wherein the imide containing polymer is poly(maleimide-co-n-dodecyl vinyl ether).
Claim 7
Dependent Claim
15 words
The photoresist composition of claim 1 wherein the imide containing polymer is poly(maleimide-co-n-tetradecyl vinyl ether).
Claim 8
Dependent Claim
15 words
The photoresist composition of claim 1 wherein the imide containing polymer is poly(maleimide-co-n-hexadecyl vinyl ether).
Claim 9
Dependent Claim
15 words
The photoresist composition of claim 1 wherein the imide containing polymer is poly(maleimide-co-n-octadecyl vinyl ether).
Claim 10
Dependent Claim
13 words
The photoresist composition of claim 1 wherein the solvent is 2-methoxyethyl ether (diglyme).
Claim 11
Dependent Claim
131 words
A photosensitive element comprising a substrate bearing a layer of a photoresist composition comprising a mixture of: (a) 1 to 35 weight percent of an alkali-insoluble photoactive compound, capable of being transformed into an alkali-soluble species upon exposure to actinic radiation, in an amount sufficient to render the mixture alkali-insoluble prior to exposure; and (b) 65-99 dry weight percent of a film forming copolymer of maleimide and a vinyl ether or vinyl ester having the structure: ##STR10## where R is an alkyl substitutent of from 1 to 20 carbon atoms, R 1 is independently H,C 1 to C 10 alkyl, phenyl, benzyl, or C 1 to C 10 aralkyl and wherein said copolymer has a sufficient number of imide N--H groups to render the mixture soluble in aqueous alkali after exposure.
Claim 12
Dependent Claim
131 words
A photosensitive element comprising a substrate bearing a layer of a photoresist composition comprising a mixture of: (a) 1 to 35 weight percent of an alkali-insoluble photoactive compound, capable of being transformed into an alkali-soluble species upon exposure to actinic radiation, in an amount sufficient to render the mixture alkali-insoluble prior to exposure; and (b) 65-99 dry weight percent of a film forming copolymer of maleimide and a vinyl ether or vinyl ester having the structure: ##STR10## where R is an alkyl substitutent of from 1 to 20 carbon atoms, R 1 is independently H,C 1 to C 10 alkyl, phenyl, benzyl, or C 1 to C 10 aralkyl and wherein said copolymer has a sufficient number of imide N--H groups to render the mixture soluble in aqueous alkali after exposure.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-01-18 | 1991-07-20 | 1992-01-19 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-01-18 | 1995-07-20 | 1996-01-19 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-01-18 | 1999-07-20 | 2000-01-19 | $7700.00 | Window Closed / Lapsed |