US4812418A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Micron and submicron patterning without using a lithographic mask having submicron dimensions
Assignee: NXP USA Inc
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Filing: 1987-11-27
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Granted: 1989-03-14
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Expires: 2007-11-27
Abstract
Abstract An electronic process is provided for creating a small dimensioned pattern in a semiconductor device. In one embodiment, the pattern functions to electrically separate two areas of the substrate by less than a micron. A lithographic mask which does not have to utilize dimensions as small as those being formed on the semiconductor device is used to form a predetermined pattern with at least one separation region by irradiating and developing a photoresist material. A layer of buffer material below the photoresist material reacts with a reactive ion etch to form a separation area with sloping sides comprised of polymer filaments produced from the reaction. The sloped sides of the separation region provide a separation dimension in the substrate of the semiconductor structure which is significantly smaller than a corresponding dimension required to be implemented on the lithographic mask.
Inventors
- 👤 James R. Pfiester
- 👤 Louis C. Parrillo
- 👤 J. William Dockrey
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-27 06:15
CPC Classifications
H; H10; H10P; H10P76/00; H10P76/20; H10P76/204; H10P76/2041; H10P76/40; Y; Y10; Y10S; Y10S438/00; Y10S438/942; Y10S438/948; Y10S438/95; Y10S438/978
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
231 words
A method of forming a pattern in a semiconductor device comprising the steps of: providing a layer of substrate material; providing a layer of oxide material above the substrate material; providing a layer of etchable mask material above the oxide material; providing a layer of buffer material above the layer of etchable mask material; providing a layer of photoresist material above the layer of buffer material; positioning a photolithographic mask above the layer of photoresist material, said photolithographic mask having a predetermined pattern formed thereon including at least one opening having a first width; irradiating the layer of photoresist materisal with light thru the at least one opening of the photolithographic mask and developing the photoresist material to form the predetermined pattern in the layer of photoresist, said predetermined pattern defining at least one cavity area in the photoresist material; etching the layers of buffer material, etchable mask material and oxide material with an etchant said etchant etching the at least one cavity area to the layer of substrate material thereby dividing the oxide material, said etchant reacting with the layer of buffer material to form sloped sides in the cavity area to expose the substrate material a second width which is substantially less than the first width; completely removing any remaining buffer material; forming oxide in the at least one cavity area; and removing the etchable layer of mask material.
Claim 2
Independent Claim
231 words
A method of forming a pattern in a semiconductor device comprising the steps of: providing a layer of substrate material; providing a layer of oxide material above the substrate material; providing a layer of etchable mask material above the oxide material; providing a layer of buffer material above the layer of etchable mask material; providing a layer of photoresist material above the layer of buffer material; positioning a photolithographic mask above the layer of photoresist material, said photolithographic mask having a predetermined pattern formed thereon including at least one opening having a first width; irradiating the layer of photoresist materisal with light thru the at least one opening of the photolithographic mask and developing the photoresist material to form the predetermined pattern in the layer of photoresist, said predetermined pattern defining at least one cavity area in the photoresist material; etching the layers of buffer material, etchable mask material and oxide material with an etchant said etchant etching the at least one cavity area to the layer of substrate material thereby dividing the oxide material, said etchant reacting with the layer of buffer material to form sloped sides in the cavity area to expose the substrate material a second width which is substantially less than the first width; completely removing any remaining buffer material; forming oxide in the at least one cavity area; and removing the etchable layer of mask material.
Claim 3
Dependent Claim
16 words
The method of claim 1 wherein the etchable mask material is as layer of nitride material.
Claim 4
Dependent Claim
18 words
The method of claim 1 wherein the layer of buffer material is a layer of low temperature oxide.
Claim 5
Dependent Claim
23 words
The method of claim 1 wherein the first width is greater than one micron and the second width is less than one micron.
Claim 6
Dependent Claim
26 words
The method of claim 1 wherein the layers of buffer material, etchable mask material and oxide material are etched by a chlorine based reactive ion etch.
Claim 7
Dependent Claim
13 words
The method of claim 1 wherein the layer of buffer material is polyimide.
Claim 8
Independent Claim
236 words
A method of patterning a semiconductor device to form at least one separation structure for electrically separating two portions of the semiconductor device, comprising the steps of: providing a layer of substrate material; providing a layer of oxide material above the substrate material; providing a layer of nitride material above the oxide material; providing a layer of buffer material above the layer of nitride material; providing a layer of photoresist material above the layer of buffer material; positioning a mask above the layer of photoresist material, said mask having a predetermined pattern formed thereon including at least one opening having a first width; irradiating the layer of photoresist material with light thru the at least one opening of the mask and developing the photoresist material to form the predetermined pattern in the layer of photoresist, said predetermined pattern defiing at least one separation area in the photoresist material; etching the layers of buffer material, nitride material and oxide material with an etchant, said etchant etching the at least one separation area to the layer of substrate material thereby separating two portions of the oxide material, said etchant reacting with the layer of buffer material, nitride material and oxide material with sloped sides to expose the substrate material a second width substantially less than the first width; removing the buffer material; forming oxide in the at least one separation area; and removing the layer of nitride material.
Claim 9
Independent Claim
236 words
A method of patterning a semiconductor device to form at least one separation structure for electrically separating two portions of the semiconductor device, comprising the steps of: providing a layer of substrate material; providing a layer of oxide material above the substrate material; providing a layer of nitride material above the oxide material; providing a layer of buffer material above the layer of nitride material; providing a layer of photoresist material above the layer of buffer material; positioning a mask above the layer of photoresist material, said mask having a predetermined pattern formed thereon including at least one opening having a first width; irradiating the layer of photoresist material with light thru the at least one opening of the mask and developing the photoresist material to form the predetermined pattern in the layer of photoresist, said predetermined pattern defiing at least one separation area in the photoresist material; etching the layers of buffer material, nitride material and oxide material with an etchant, said etchant etching the at least one separation area to the layer of substrate material thereby separating two portions of the oxide material, said etchant reacting with the layer of buffer material, nitride material and oxide material with sloped sides to expose the substrate material a second width substantially less than the first width; removing the buffer material; forming oxide in the at least one separation area; and removing the layer of nitride material.
Claim 10
Dependent Claim
15 words
The method of claim 7 wherein the etchant is a chlorine based reactive ion etch.
Claim 11
Dependent Claim
23 words
The method of claim 7 wherein the first width is greater than one micron and the second width is less than one micron.
Claim 12
Dependent Claim
15 words
The method of claim 7 wherein the buffer material is a low temperature oxide material.
Claim 13
Dependent Claim
11 words
The method of claim 7 wherein the buffer material is polyimide.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1992-03-13 | 1992-09-12 | 1993-03-14 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1996-03-13 | 1996-09-12 | 1997-03-14 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2000-03-13 | 2000-09-12 | 2001-03-14 | $7700.00 | Window Closed / Lapsed |