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US4844568A Expired / Lapsed US ⏱️ 0.0 years remaining

Scanning type projection exposure system

Assignee: Panasonic Holdings Corp
•
Filing: 1988-05-26
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Granted: 1989-07-04
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Expires: 2008-05-26
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Abstract

Abstract A scanning type projection exposure system includes a source emitting light. The light is applied to a portion of a mask having a preset pattern. At least one optical erect projection sub-system images a portion of the pattern on a substrate. The portion of the pattern corresponds to the portion of the mask exposed to the light. The projection sub-system is subjected to scanning movement. The mask and the substrate are subjected to scanning movement. Relative positions of the mask and the substrate are held fixed during the scanning movement of the mask and the substrate.

Inventors

  • 👤 Masaki Suzuki
  • 👤 Hiroyuki Nagano
  • 👤 Takeo Sato
  • 👤 Toshiyuki Watanabe

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-01 13:56
CPC Classifications
C; C03; C03B; C03B5/00; C03B5/02; G; G03; G03F; G03F7/00; G03F7/70; G03F7/70058; G03F7/70075; G03B; G03B17/00; G03F7/70216; G03F7/70358; G03F7/70366

Claims Analysis

Total Claims: 13
Claim 1
Independent Claim 112 words
A scanning type projection exposure system comprising: (a) a source emitting light; (b) means for applying the light to a portion of a mask having a preset pattern; (c) at least one optical erect projection sub-system imaging a portion of the pattern on a substrate, wherein said portion of the pattern corresponds to the portion of the mask exposed to the light; (d) first scanning means for producing scanning movement of the projection sub-system; (e) second scanning means for producing scanning movement of the mask and the substrate; and (f) means for holding relative positions of the mask and the substrate fixed during the scanning movement of the mask and the substrate.
Claim 2
Dependent Claim 112 words
A scanning type projection exposure system comprising: (a) a source emitting light; (b) means for applying the light to a portion of a mask having a preset pattern; (c) at least one optical erect projection sub-system imaging a portion of the pattern on a substrate, wherein said portion of the pattern corresponds to the portion of the mask exposed to the light; (d) first scanning means for producing scanning movement of the projection sub-system; (e) second scanning means for producing scanning movement of the mask and the substrate; and (f) means for holding relative positions of the mask and the substrate fixed during the scanning movement of the mask and the substrate.
Claim 3
Dependent Claim 32 words
The system of claim 1 wherein the light applying means comprises at least one spot illumination sub-system forming an illumination spot at a point near an optical axis of the projection sub-system.
Claim 4
Dependent Claim 36 words
The system of claim 1 wherein the light applying means comprises a condenser focusing the light, an optical fiber cable transmitting the focused light, and a spot illumination sub-system focusing the transmitted light on the mask.
Claim 5
Dependent Claim 17 words
The system of claim 1 wherein the first scanning means comprises means for rotating the projection sub-system.
Claim 6
Dependent Claim 18 words
The system of claim 1 wherein the first scanning means comprises means for linearly moving the projection sub-system.
Claim 7
Dependent Claim 19 words
The system of claim 1 wherein the second scanning means comprises means for rotating the mask and the substrate.
Claim 8
Dependent Claim 20 words
The system of claim 1 wherein the second scanning means comprises means for linearly moving the mask and the substrate.
Claim 9
Dependent Claim 112 words
A scanning type projection exposure system comprising: (a) a source emitting light; (b) a condenser focusing the light; (c) at least one optical fiber cable transmitting the focused light; (d) at least one spot illumination sub-system focusing the transmitted light on a mask; (e) means for rotating the optical fiber cable and the spot illumination sub-system together in scanning movement; (f) an optical projection sub-system applying the light, which passed through the mask, to a substrate; (g) means for producing scanning movement of the mask and the substrate; and (h) means for holding relative positions of the mask and the substrate fixed during the scanning movement of the mask and the substrate.
Claim 10
Dependent Claim 112 words
A scanning type projection exposure system comprising: (a) a source emitting light; (b) a condenser focusing the light; (c) at least one optical fiber cable transmitting the focused light; (d) at least one spot illumination sub-system focusing the transmitted light on a mask; (e) means for rotating the optical fiber cable and the spot illumination sub-system together in scanning movement; (f) an optical projection sub-system applying the light, which passed through the mask, to a substrate; (g) means for producing scanning movement of the mask and the substrate; and (h) means for holding relative positions of the mask and the substrate fixed during the scanning movement of the mask and the substrate.
Claim 11
Dependent Claim 22 words
The system of claim 8 wherein the projection sub-system comprises a trapezoidal mirror, a concave mirror, and a convex mirror connected optically.
Claim 12
Dependent Claim 141 words
A scanning type projection exposure system comprising: (a) means for concentrating light on a portion of a mask and thereby forming an illumination spot at said portion of the mask, the mask having a preset pattern; (b) means for focusing the light, which passed through the mask, on a portion of a substrate and thereby imaging a portion of the mask pattern in said portion of the substrate, wherein said portion of the mask pattern corresponds to said portion of the mask exposed to the illumination spot; (c) means for moving the illumination spot relative to the mask and thereby scanning the mask with the illumination spot along a first direction; and (d) means for moving the illumination spot relative to the mask and thereby scanning the mask with the illumination spot along a second direction different from the first direction.
Claim 13
Dependent Claim 141 words
A scanning type projection exposure system comprising: (a) means for concentrating light on a portion of a mask and thereby forming an illumination spot at said portion of the mask, the mask having a preset pattern; (b) means for focusing the light, which passed through the mask, on a portion of a substrate and thereby imaging a portion of the mask pattern in said portion of the substrate, wherein said portion of the mask pattern corresponds to said portion of the mask exposed to the illumination spot; (c) means for moving the illumination spot relative to the mask and thereby scanning the mask with the illumination spot along a first direction; and (d) means for moving the illumination spot relative to the mask and thereby scanning the mask with the illumination spot along a second direction different from the first direction.

References Cited (Backward Citations)

US4057347A Cited
US4514858A Cited
US4707609A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1992-07-03 1993-01-02 1993-07-04 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1996-07-03 1997-01-02 1997-07-04 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2000-07-03 2001-01-02 2001-07-04 $7700.00 Window Closed / Lapsed

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