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US4844775A Expired / Lapsed US ⏱️ 0.0 years remaining

Ion etching and chemical vapour deposition

Assignee: NationsBank of Texas NA
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Filing: 1987-12-11
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Granted: 1989-07-04
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Expires: 2007-12-11
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Abstract

Abstract Apparatus for use in treating semiconductor wafers or other work pieces by an active ion technique or by chemical vapour deposition, comprising a "vacuum" chamber having means for connection to an evacuating pump and to a source of the selected gas, an induction coil surrounding part of the chamber and connected to an alternating current supply to create a plasma within the chamber containing ionised elements of the gas, a support for the work piece within the chamber, and means for creating an electric field between the support and part of the chamber where the plasma exists.

Inventors

  • 👤 Frank Keeble

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-27 05:12
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32082; H01J37/321; H01J37/32431; H01J37/32697; H01J37/32706

Claims Analysis

Total Claims: 8
Claim 1
Independent Claim 84 words
An apparatus for use in treating work pieces, comprising a "vacuum" chamber having means for connection to an evacuating pump and to a source of the selected gas, an induction coil surrounding part of the chamber and connected to an alternating current supply to create a plasma within the chamber containing ionised elements of the gas, a support for the work piece within the chamber, and means for creating an electric field between the support and part of the chamber where the plasma exists.
Claim 2
Independent Claim 84 words
An apparatus for use in treating work pieces, comprising a "vacuum" chamber having means for connection to an evacuating pump and to a source of the selected gas, an induction coil surrounding part of the chamber and connected to an alternating current supply to create a plasma within the chamber containing ionised elements of the gas, a support for the work piece within the chamber, and means for creating an electric field between the support and part of the chamber where the plasma exists.
Claim 3
Dependent Claim 13 words
An apparatus according to claim 1, including means for controlling the electric field.
Claim 4
Dependent Claim 19 words
An apparatus according to claim 1 including means for controlling or adjusting the electric supply to the induction coil.
Claim 5
Dependent Claim 22 words
An invention as in claim 1 including means for controlling independently the electric field and the electric supply to the induction coil.
Claim 6
Independent Claim 85 words
A method of treating work piece in which the work piece is placed in a "vacuum" chamber which is evacuated to a low pressure, a selected gas is introduced under control, a gas plasma is created within the chamber by means of an external induction coil, the plasma intensity is controlled by controlling the supply to the coil, and ionised particles are caused to move onto the work piece by creating an electric field within the chamber between the plasma zone and the work piece.
Claim 7
Independent Claim 85 words
A method of treating work piece in which the work piece is placed in a "vacuum" chamber which is evacuated to a low pressure, a selected gas is introduced under control, a gas plasma is created within the chamber by means of an external induction coil, the plasma intensity is controlled by controlling the supply to the coil, and ionised particles are caused to move onto the work piece by creating an electric field within the chamber between the plasma zone and the work piece.
Claim 8
Dependent Claim 18 words
A method according to claim 5, in which the electric field is controlled independently of the electric supply.

References Cited (Backward Citations)

US4362632A Cited
US4233109A Cited
US4543465A Cited
US4668365A Cited
US4668338A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1992-07-03 1993-01-02 1993-07-04 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1996-07-03 1997-01-02 1997-07-04 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2000-07-03 2001-01-02 2001-07-04 $7700.00 Window Closed / Lapsed

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