Method for fabricating a magneto-optical recording element

Claim 1

A method for the fabrication of a magneto-optical recording element, which comprises maintaining a substrate on which a film is to be formed, a first target composed of a sintered composition comprising (a) silicon nitride and (b) at least one additive selected from the group consisting of single elements, oxides, nitrides, sulfides and silicides of elements of the groups IIIa, IVa, VIa, IIb, IIIb, IVb and VIb of the Periodic Table and a second target composed of a magnetic layer-forming metal in an inert gas atmosphere maintained at 1×10 -3 to 50×10 -3 Torr and forming a magnetic layer and a dielectric layer alternately on the substrate by sputtering, wherein at least the substrate and first target are exposed to a vacuum of less than 1×10 -5 Torr, prior to maintaining said substrate, first target and second target in an inert gas atmosphere.

Claim 2

A method for the fabrication of a magneto-optical recording element, which comprises maintaining a substrate on which a film is to be formed, a first target composed of a sintered composition comprising (a) silicon nitride and (b) at least one additive selected from the group consisting of single elements, oxides, nitrides, sulfides and silicides of elements of the groups IIIa, IVa, VIa, IIb, IIIb, IVb and VIb of the Periodic Table and a second target composed of a magnetic layer-forming metal in an inert gas atmosphere maintained at 1×10 -3 to 50×10 -3 Torr and forming a magnetic layer and a dielectric layer alternately on the substrate by sputtering, wherein at least the substrate and first target are exposed to a vacuum of less than 1×10 -5 Torr, prior to maintaining said substrate, first target and second target in an inert gas atmosphere.

Claim 10

A method for fabrication of a magneto-optical recording element, the sequential steps of the method comprising: (a) providing a substrate on which a film is to be formed, a first target composed of a sintered composition comprising (i) silicon nitride and (ii) at least one additive selected from the group consisting of single elements, oxides, nitrides, sulfides, and silicides of elements of the groups IIIa, IVa, VIa, IIb, IIIb, IVb, and VIb of the Periodic Table and a second target composed of a magnetic layer-forming metal; (b) exposing at least said substrate and said first target to a vacuum of less than 1×10 -5 Torr; (c) maintaining the substrate, the first target and the second target in an inert gas atmosphere maintained at 1×10 -3 to 50×10 -3 Torr; (d) applying a high-frequency electric power or direct current between the first target and the substrate to form a first dielectric layer; and (e) applying a high-frequency or direct current electric power between the second target and the substrate to form a magnetic layer.

Claim 11

A method for fabrication of a magneto-optical recording element, the sequential steps of the method comprising: (a) providing a substrate on which a film is to be formed, a first target composed of a sintered composition comprising (i) silicon nitride and (ii) at least one additive selected from the group consisting of single elements, oxides, nitrides, sulfides, and silicides of elements of the groups IIIa, IVa, VIa, IIb, IIIb, IVb, and VIb of the Periodic Table and a second target composed of a magnetic layer-forming metal; (b) exposing at least said substrate and said first target to a vacuum of less than 1×10 -5 Torr; (c) maintaining the substrate, the first target and the second target in an inert gas atmosphere maintained at 1×10 -3 to 50×10 -3 Torr; (d) applying a high-frequency electric power or direct current between the first target and the substrate to form a first dielectric layer; and (e) applying a high-frequency or direct current electric power between the second target and the substrate to form a magnetic layer.