Perfluoroalkyl group-containing copolymers
Abstract
Abstract Copolymers comprising perfluoroalkyl groups, reproduction layers containing these copolymers and use thereof for waterless offset printing. The novel perfluoroalkyl group-containing copolymers are prepared from at least two different monomers, monomer (a) comprising acryloyl or methacryloyl groups and phenolic OH groups and monomer (b) comprising acryloyloxy, methacryloyloxy or vinyl groups and a perfluoroalkyl group. Monomer component (a) can, for example, be prepared from a hydroxybenzoic acid by esterification with a hydroxyalkyl-acrylate. The novel copolymers are, in particular, used as binders in radiation-sensitive reproduction layers which additionally contain at least one radiation-sensitive compound. Reproduction layers of this kind are used as radiation-sensitive coatings of support materials for printing plates used in waterless offset printing.
Inventors
- 👤 Werner H. Muller
- 👤 Arnold Schneller
Bibliographic Details
Claims Analysis
Total Claims: 6References Cited (Backward Citations)
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