US4871645A
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Positive-working photoresist composition
Assignee: Fujifilm Holdings Corp
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Filing: 1988-06-06
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Granted: 1989-10-03
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Expires: 2008-06-06
Abstract
Abstract A positive-working photoresist composition is disclosed. The composition comprises a light-sensitive compound represented by general formula (A) and an alkali-soluble novolak resin. ##STR1## wherein R a , R b , R c , R d , R e and R f , which may be the same or different, each represents H, --X--R 1 , ##STR2## provided that among the six substituents represented by R a to R f , the number of the substituents representing H is a real number of more than 0 and not more than 3 calculated in terms of average value per molecule of the light-sensitive compound, the number of the substituents representing --X--R 1 is a real number of not less than 0.3 calculated in terms of average value per molecule of the light-sensitive compound, and the number of the substituents representing ##STR3## is a real number of not less than 2.5 caluclated in terms of average value per molecule of the light-sensitive compound; X represents a simple bond, ##STR4## R 1 represents a substituted or unsubstituted aliphatic group or a substituted or unsubstituted aromatic group; and R 2 and R 3 , which may be the same or different, each represents H or a substituted or unsubstituted aliphatic group or a substituted or unsubstituted aromatic group. The positive-working photoresist composition is excellent in resolving power, speed, resist profile and heat resistance and is particularly suitable for forming a pattern of fine structure.
Inventors
- 👤 Kazuya Uenishi
- 👤 Tadayoshi Kokubo
- 👤 Yasumasa Kawabe
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 23:23
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/022; G03F7/075; G03F7/0755
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
208 words
A positive-working photoresist composition comprising a light-sensitive compound represented by general formula (A) and an alkali-soluble novolak resin ##STR19## wherein R a , R b , R c , R d , R e and R f , which may be the same or different, each represents H, --X--R 1 , ##STR20## provided that among the six substituents represented by R a to R f , the number of said substituents representing H is a real number of more than 0and not more than 3 calculated in terms of average value per molecule of said light-sensitive compound, the number of said substituents representing --X--R 1 is a real number of not less than 0.3 calculated in terms of average value per molecule of said light-sensitive compound, and the number of said substituents representing ##STR21## is a real number of not less than 2.5 calculated in terms of average value per molecule of said light-sensitive compound; X represents a simple bond, ##STR22## R 1 represents a substituted or unsubstituted aliphatic group or a substituted or unsubstituted aromatic group; and R 2 and R 3 , which may be the same or different, each represents H or a substituted or unsubstituted aliphatic group or a substituted or unsubstituted aromatic group.
Claim 2
Dependent Claim
208 words
A positive-working photoresist composition comprising a light-sensitive compound represented by general formula (A) and an alkali-soluble novolak resin ##STR19## wherein R a , R b , R c , R d , R e and R f , which may be the same or different, each represents H, --X--R 1 , ##STR20## provided that among the six substituents represented by R a to R f , the number of said substituents representing H is a real number of more than 0and not more than 3 calculated in terms of average value per molecule of said light-sensitive compound, the number of said substituents representing --X--R 1 is a real number of not less than 0.3 calculated in terms of average value per molecule of said light-sensitive compound, and the number of said substituents representing ##STR21## is a real number of not less than 2.5 calculated in terms of average value per molecule of said light-sensitive compound; X represents a simple bond, ##STR22## R 1 represents a substituted or unsubstituted aliphatic group or a substituted or unsubstituted aromatic group; and R 2 and R 3 , which may be the same or different, each represents H or a substituted or unsubstituted aliphatic group or a substituted or unsubstituted aromatic group.
Claim 3
Dependent Claim
37 words
A positive-working photoresist composition as claimed in claim 1, wherein said substituents are present in said light-sensitive compound in amounts as represented by the real numbers calculated in terms of average value per molecule as follows: ##STR23##
Claim 4
Dependent Claim
159 words
A positive-working photoresist composition as claimed in claim 1, wherein the group --X--R 1 in general formula (A) is a substituted or unsubstituted aliphatic group, a substituted or unsubstituted aromatic group, an acyl group represented by ##STR24## (wherein R 11 represents a substituted or unsubstituted aliphatic group or a substituted or unsubstituted aromatic group), a silyl group represented by ##STR25## (wherein R 12 and R 13 , which may be the same or different, each represents a hydrogen atom, a substituted or unsubstituted aliphatic group or a substituted or unsubstituted aromatic group; and R 14 represents a substituted or unsubstituted aliphatic group or a substituted or unsubstituted aromatic group), a sulfonyl group represented by --SO 2 --R 15 (wherein R 15 represents a substituted or unsubstituted aliphatic group or a substituted or unsubstituted aromatic group), or an amido group represented by ##STR26## (wherein R 16 represents a substituted or unsubstituted aliphatic group or a substituted or unsubstituted aromatic group).
Claim 5
Dependent Claim
33 words
A positive-working photoresist composition as claimed in claim 3, wherein the aliphatic group is an alkyl group or an alkenyl group, and the aromatic group is a phenyl group or a naphthyl group.
Claim 6
Dependent Claim
62 words
A positive-working photoresist composition as claimed in claim 3, wherein the substituted aliphatic group may be substituted by an alkoxy group, an aryloxy group, an aryl group, a hydroxy group, a carboxy group, a sulfo group, an amino group, a nitro group, a silyl group, a silyl ether group, a cyano group, an aldehyde group, a mercapto group, and a halogen atom.
Claim 7
Dependent Claim
65 words
A positive-working photoresist composition as claimed in claim 3, wherein the substituted aromatic group may be substituted by an aliphatic group, an alkoxy group, an aryloxy group, an aryl group, a hydroxy group, a carboxy group, a sulfo group, an amino group, a nitro group, a silyl group, a silyl ether group, a cyano group, an aldehyde group, a mercapto group, and a halogen atom.
Claim 8
Dependent Claim
40 words
A positive-working photoresist composition as claimed in claim 1, wherein R 1 is a substituted or unsubstituted aliphatic group having from 1 to 8 carbon atoms or a substituted or unsubstituted aromatic group having from 6 to 15 carbon atoms.
Claim 9
Dependent Claim
39 words
A positive-working photoresist composition as claimed in claim 1, wherein the alkali-soluble novolak resin is an acid catalyzed addition condensation product of a phenol with about 0.6 to about 1.0 mol of an aldehyde per mol of the phenol.
Claim 10
Dependent Claim
28 words
A positive-working photoresist composition as claimed in claim 8, wherein the phenol is a mixture of two or more phenols selected from phenol, o-cresol, m-cresol, p-cresol and xylenol.
Claim 11
Dependent Claim
24 words
A positive-working photoresist composition as claimed in claim 1, wherein the alkali-soluble novolak resin has a molecular weight of about 1,000 to about 50,000.
Claim 12
Dependent Claim
38 words
A positive-working photoresist composition as claimed in claim 1, wherein the light-sensitive compound is present in an amount of from about 5 to about 100 parts by weight per 100 parts by weight of the alkali-soluble novolak resin.
Claim 13
Dependent Claim
20 words
A positive-working photoresist composition as claimed in claim 1, wherein the positive-working photoresist composition is dissolved in an organic solvent.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1992-10-02 | 1993-04-03 | 1993-10-03 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1996-10-02 | 1997-04-03 | 1997-10-03 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2000-10-02 | 2001-04-03 | 2001-10-03 | $7700.00 | Window Closed / Lapsed |