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US4873115A
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Method of sythesizing carbon film and carbon particles in a vapor phase
Assignee: Tonen General Sekiyu KK
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Filing: 1985-08-14
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Granted: 1989-10-10
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Expires: 2005-08-14
Abstract
Abstract A vapor phase synthesis of carbon film and carbon particles using a single or a mixed gas capable of supplying halogen, hydrogen and carbon atoms is disclosed. Halogen radicals can suppress the desorption of carbon atoms from the substrate, and the carbon layer is obtained easily. Especially chlorine and fluorine atoms are effective. An electron beam diffraction pattern illustrated that diamond film can be obtained in this method.
Inventors
- 👤 Mitsuo Matsumura
- 👤 Toshihiko Yoshida
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 13:20
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/22; C23C16/26; C23C16/27; C23C16/272; C23C16/277
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
113 words
A method of synthesizing a carbon film consisting essentially of carbon and carbon particles consisting essentially of carbon on a heated substrate in a vapor phase which comprises using a single gas or a mixed gas capable of supplying halogen, hydrogen and carbon atoms as a starting material and carrying out the process by having the gas in a plasma state with the temperature of the substrate being from about 100° to 900° C. and with process being carried out under a pressure of from about 10 mm Torr to several tens of Torr until said carbon film and carbon particles deposit on the substrate while heated to about 100° to 900° C.
Claim 2
Independent Claim
113 words
A method of synthesizing a carbon film consisting essentially of carbon and carbon particles consisting essentially of carbon on a heated substrate in a vapor phase which comprises using a single gas or a mixed gas capable of supplying halogen, hydrogen and carbon atoms as a starting material and carrying out the process by having the gas in a plasma state with the temperature of the substrate being from about 100° to 900° C. and with process being carried out under a pressure of from about 10 mm Torr to several tens of Torr until said carbon film and carbon particles deposit on the substrate while heated to about 100° to 900° C.
Claim 3
Dependent Claim
26 words
A method of synthesizing carbon film and carbon particles as set forth in claim 1 wherein the halogen atom is a fluorine atom and/or chlorine atom.
Claim 4
Dependent Claim
26 words
A method of synthesizing carbon film and carbon particles in a vapor phase as set forth in claim 2, wherein the halogen atom is fluorine atom.
Claim 5
Dependent Claim
31 words
A method of synthesizing carbon film and carbon particles in a vapor phase as set forth in claim 1, wherein the starting gas is diluted with a hydrogen and/or inert gas.
Claim 6
Dependent Claim
44 words
A method of synthesizing carbon film and carbon particles in a vapor phase as set forth in claim 1, wherein the sum of the hydrogen and the halogen contents in the carbon film and in carbon particles formed is less than 15 atom %.
Claim 7
Dependent Claim
28 words
A method of synthesizing carbon film and carbon particles in a vapor phase as set forth in claim 1, wherein the carbon film formed is a diamond film.
Claim 8
Dependent Claim
27 words
A method of synthesizing carbon film and carbon particles in a vapor phase as set forth in claim 1, wherein the carbon particles formed are diamond particles.
Claim 9
Dependent Claim
28 words
A method of synthesizing carbon film and carbon particles in a vapor phase as set forth in claim 5, wherein the carbon film formed is a diamond film.
Claim 10
Dependent Claim
27 words
A method of synthesizing carbon film and carbon particles in a vapor phase as set forth in claim 5, wherein the carbon particles formed are diamond particles.
Claim 11
Dependent Claim
22 words
A method of synthesizing carbon film and carbon particles as set forth in claim 3 wherein the starting material is a fluorohydrocarbon.
Claim 12
Independent Claim
45 words
A method of synthesizing carbon film and carbon particles as set forth in any one of claims 3, 4, 1, 2 or 10 wherein the plasma state is generated by means selected from the group consisting of glow discharge, arc discharge and plasma jet methods.
Claim 13
Independent Claim
127 words
A method of synthesizing a material selected from the group consisting of a carbon film consisting essentially of carbon and carbon particles consisting essentially of carbon on a heated substrate in a vapor phase which comprises using a single gas or mixed gas capable of supplying halogen, hydrogen and carbon atoms as a starting material and carrying out the process by having the gas in a plasma state with the temperature of the substrate being from about 100° to 900° C. and with process being carried out under a pressure of from about 10 mm Torr to several tens of Torr until said material selected from the group consisting of carbon film and carbon particles deposits on the substrate being heated to about 100° to 900° C.
Claim 14
Independent Claim
127 words
A method of synthesizing a material selected from the group consisting of a carbon film consisting essentially of carbon and carbon particles consisting essentially of carbon on a heated substrate in a vapor phase which comprises using a single gas or mixed gas capable of supplying halogen, hydrogen and carbon atoms as a starting material and carrying out the process by having the gas in a plasma state with the temperature of the substrate being from about 100° to 900° C. and with process being carried out under a pressure of from about 10 mm Torr to several tens of Torr until said material selected from the group consisting of carbon film and carbon particles deposits on the substrate being heated to about 100° to 900° C.
References Cited (Backward Citations)
US3335345A
Cited
US3138435A
Cited
US3684585A
Cited
US3771976A
Cited
US4040870A
Cited
US4434188A
Cited
US4439463A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1992-10-09 | 1993-04-10 | 1993-10-10 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1996-10-09 | 1997-04-10 | 1997-10-10 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2000-10-09 | 2001-04-10 | 2001-10-10 | $7700.00 | Window Closed / Lapsed |