US4878995A
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Method of dry etching and apparatus for use in such method
Assignee: Toshiba Corp
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Filing: 1988-07-01
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Granted: 1989-11-07
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Expires: 2008-07-01
Abstract
Abstract This invention provides a method of dry etching and an apparatus for use with such method capable of producing a multi-layered structure having substantially a vertical wall and high selectivity. There is provided a method of the dry etching that disposing an object having a first film and second film thereon in a vacuum chamber, introducing an activated reactive gas, and cooling the object in the temperature or less being deposited a film including at least the first film material on the first film.
Inventors
- 👤 Tsunetoshi Arikado
- 👤 Makoto Sekine
- 👤 Haruo Okano
- 👤 Yasuhiro Horiike
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 10:52
CPC Classifications
H; H10; H10P; H10P50/00; H10P50/20; H10P50/26; H10P50/264; H10P50/266; H10P50/267; H10P50/268; H10P50/28; H10P50/282; H10P50/283
Claims Analysis
Total Claims: 36
Claim 1
Independent Claim
75 words
A method of dry etching, comprising the steps of: disposing an object to be etched in a vacuum chamber, the object having a first film thereon and a second film over the first film; introducing an activated reactive gas into the chamber for selectively etching the second film; and cooling the object to a temperature at which a thin film including at least an element of the first film deposits on the first film selectively.
Claim 2
Independent Claim
75 words
A method of dry etching, comprising the steps of: disposing an object to be etched in a vacuum chamber, the object having a first film thereon and a second film over the first film; introducing an activated reactive gas into the chamber for selectively etching the second film; and cooling the object to a temperature at which a thin film including at least an element of the first film deposits on the first film selectively.
Claim 3
Dependent Claim
39 words
The method of claim 1 wherein the step of disposing includes the step of forming the first film of a material having two different etching rate characteristics which varies with respect to variations in temperature over a specified range.
Claim 4
Dependent Claim
22 words
The method of claim 1 wherein the step of introducing includes the step of simultanuously exposing the gas to a magnetic field.
Claim 5
Dependent Claim
42 words
The method of claim 1, wherein the cooling temperature is the temperature or less being near an inflection point changed the inclination of the negative characteristic of the relation of the etching rate to the reciprocal of the temperature of the object.
Claim 6
Dependent Claim
16 words
The method of claim 1, wherein the reactive gas includes at least one of halogenous gases.
Claim 7
Dependent Claim
16 words
The method of claim 3, wherein the reactive gas includes at least one of halogenous gases.
Claim 8
Dependent Claim
19 words
The method of claim 1, wherein the second film is polycrystalline silicon and the first film is silicon oxide.
Claim 9
Dependent Claim
19 words
The method of claim 1, wherein the second film is polycrystalline silicon and the first film is silicon nitride.
Claim 10
Dependent Claim
21 words
The method of claim 1, wherein the second film is phosphorous doped polycrystalline silicon and the first film is silicon oxide.
Claim 11
Dependent Claim
21 words
The method of claim 1, wherein the second film is phosphorous doped polycrystalline silicon and the first film is silicon nitride.
Claim 12
Dependent Claim
19 words
The method of claim 1, wherein the second film is silicon nitride and the first film is silicon oxide.
Claim 13
Dependent Claim
18 words
The method of claim 1, wherein the second film is tungsten and the first film is silicon oxide.
Claim 14
Dependent Claim
18 words
The method of claim 1, wherein the second film is tungsten and the first film is silicon nitride.
Claim 15
Dependent Claim
18 words
The method of claim 1, wherein the second film is molybdenum and the first film is silicon oxide.
Claim 16
Dependent Claim
18 words
The method of claim 1, wherein the second film is molybdenum and the first film is silicon nitride.
Claim 17
Dependent Claim
18 words
The method of claim 1, wherein the second film is titanium and the first film is silicon oxide.
Claim 18
Dependent Claim
18 words
The method of claim 1, wherein the second film is titanium and the first film is silicon nitride.
Claim 19
Dependent Claim
19 words
The method of claim 1, wherein the second film is tungsten silicide and the first film is silicon oxide.
Claim 20
Dependent Claim
19 words
The method of claim 1, wherein the second film is tungsten silicide and the first film is silicon nitride.
Claim 21
Dependent Claim
19 words
The method of claim 1, wherein the second film is molybdenum silicide and the first film is silicon oxide.
Claim 22
Dependent Claim
19 words
The method of claim 1, wherein the second film is molybdenum silicide and the first film is silicon nitride.
Claim 23
Dependent Claim
18 words
The method of claim 1, wherein the second film is titanium silicide and first film is silicon oxide.
Claim 24
Dependent Claim
18 words
The method of claim 1, wherein the second film is titanium silicide and first film is silicon nitride.
Claim 25
Dependent Claim
21 words
The method of claim 1, wherein the second film is impurity doped polycrystalline silicon and the first film is silicon oxide.
Claim 26
Dependent Claim
19 words
The method of claim 24, wherein reactive gas is chlorine and the cooling temperature is 0° C. or less.
Claim 27
Dependent Claim
18 words
The method of claim 1, wherein the pressure of the reactive gas is 10 -4 Torr or more.
Claim 28
Dependent Claim
22 words
The method of claim 1, wherein the object is disposed in the separated portion from the activated portion of the reactive gas.
Claim 29
Dependent Claim
14 words
The method of claim 1, wherein the reactive gas is activated by ultraviolet rays.
Claim 30
Dependent Claim
14 words
The method of claim 1, wherein the reactive gas is activated by SOR rays.
Claim 31
Dependent Claim
78 words
The dry etching apparatus for eching an object having first and second films successively formed thereon by a reactive gas, comprising; a vacuum chamber, including means for supporting the object therein; means for introducing the reactive gas into the chamber; means for activating the gas for selectivity etching the second film; means for cooling the object to a temperature at which a thin film including at least an element of the first element deposits on the first film.
Claim 32
Dependent Claim
78 words
The dry etching apparatus for eching an object having first and second films successively formed thereon by a reactive gas, comprising; a vacuum chamber, including means for supporting the object therein; means for introducing the reactive gas into the chamber; means for activating the gas for selectivity etching the second film; means for cooling the object to a temperature at which a thin film including at least an element of the first element deposits on the first film.
Claim 33
Dependent Claim
22 words
The apparatus of claim 30, wherein the means for supporting the object includes means for flowing a coolant to cool the object.
Claim 34
Dependent Claim
15 words
The apparatus of claim 30, wherein the cooling means includes means for preventing the congelation.
Claim 35
Dependent Claim
18 words
The apparatus of claim 32, wherein the preventing means includes a heat insulating material covering the cooling means.
Claim 36
Dependent Claim
20 words
The apparatus of claim 30, wherein the cooling means includes means to cool the object to 0° C. or less.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1992-11-06 | 1993-05-08 | 1993-11-07 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1996-11-06 | 1997-05-08 | 1997-11-07 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2000-11-06 | 2001-05-08 | 2001-11-07 | $7700.00 | Window Closed / Lapsed |