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US4891332A Expired / Lapsed US ⏱️ 0.0 years remaining

Method of manufacturing a semiconductor device comprising a circuit element formed of carbon doped polycrystalline silicon

Assignee: US Philips Corp
•
Filing: 1986-04-11
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Granted: 1990-01-02
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Expires: 2006-04-11
📄 Original PDF 🌐 Google Patents

Abstract

Abstract The invention relates to a semiconductor device having a semiconductor body which comprises a circuit element having doped polycrystalline silicon. The doping comprises carbon in a concentration higher than 1 ppm. Polysilicon thus doped has properties which are not influenced by temperature treatments of the semiconductor body. Dopant is gaseous unsaturated hydrocarbon, e.g. acetylene.

Inventors

  • 👤 Jan Bloem
  • 👤 Wilhelmus A. P. Claassen

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-06 06:49
CPC Classifications
H; H10; H10D; H10D64/00; H10D64/01; H10D64/013; H10D64/01302; H10D64/01304; H10D64/01306; H10D62/00; H10D62/40; H10D62/80; H10D62/83; H10D62/834; H10D64/01314; H10P; H10P14/00; H10P14/20; H10P14/34; H10P14/3402; H10P14/3404; H10P14/3408; H10P14/3411; H10P14/3438; H10P14/3441; H10P14/3442; H10P14/3444; H10P14/40; H10P14/416; Y; Y10; Y10S; Y10S438/00; Y10S438/914; Y10S438/918

Claims Analysis

Total Claims: 3
Claim 1
Independent Claim 61 words
A method of manufacturing a semiconductor device having a semiconductor body comprising a circuit element formed of polycrystalline silicon doped with carbon in a concentration higher than 1 part per million, said method comprising forming said carbon doped polycrystalline silicon by heating a mixture of a gaseous silicon compound and a gaseous unsaturated hydrocarbon compound to a temperature above 700° C.
Claim 2
Independent Claim 61 words
A method of manufacturing a semiconductor device having a semiconductor body comprising a circuit element formed of polycrystalline silicon doped with carbon in a concentration higher than 1 part per million, said method comprising forming said carbon doped polycrystalline silicon by heating a mixture of a gaseous silicon compound and a gaseous unsaturated hydrocarbon compound to a temperature above 700° C.
Claim 3
Dependent Claim 15 words
A method as claimed in claim 1, characterized in that the carbon compound is acetylene.

References Cited (Backward Citations)

US3497773A Cited
US3750268A Cited
US4004950A Cited
US4189826A Cited
US4362766A Cited
US4329699A Cited
US4403239A Cited
US4439463A Cited
US4523369A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1993-01-01 1993-07-03 1994-01-02 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1997-01-01 1997-07-03 1998-01-02 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2001-01-01 2001-07-03 2002-01-02 $7700.00 Window Closed / Lapsed

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