US4906552A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Two layer dye photoresist process for sub-half micrometer resolution photolithography
Assignee: Raytheon Co
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Filing: 1988-02-22
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Granted: 1990-03-06
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Expires: 2008-02-22
Abstract
Abstract Well-defined metal lines of 0.5 micrometers and less in width are produced on a substrate by photolithography, using a two layer photoresist process. The first resist layer, adjacent the substrate, is poly(methylmethacrylate) from about 0.5 to about 1 micrometer thick, having a sufficient amount of an ultraviolet absorbing dye to prevent positive interference of light reflected from the surface of the substrate during exposure. The second resist layer is a polymer of naphthoquinone diazide, in a thickness of about 0.5 to about 1.1 micrometers. To achieve 0.5 micrometer resolution of the metal line, the total thickness of the two resist layers is about 1.5 micrometers; to achieve less than 0.5 micrometer resolution, the total thickness of the two resist layers is about 1.0 micrometer.
Inventors
- 👤 Catherine M. Ngo
- 👤 Leroy H. Hackett
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-27 21:32
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/09; G03F7/091; G03F7/095
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
284 words
A process for patterning a substrate, comprising the steps of: spin coating a first resist layer onto the substrate, the first resist layer comprising a solution of from about 6 to about 9 percent by volume of poly(methylmethacrylate) and a dye having an absorbance of at least about 1.2 at 436 nanometers light wavelength, the dye being present in a ratio of about 1 part dye to 4 parts poly(methylmethacrylate), by volume; baking the first resist layer, the amount of material deposited in said step of spin coating a first resist layer being sufficient that the thickness of the first resist layer after baking is from about 0.5 micrometers for about 6 percent poly(methylmethacrylate) to about 1.1 micrometers for about 9 percent poly(methylmethacrylate); spin coating a second resist layer overlying the first resist layer, the second resist layer being a positive photoresist material including a naphthoquinone diazide; baking the second resist layer, the amount of the material added in said step of spin coating a second resist layer being sufficient that the thickness of the second resist layer after baking is from about 0.4 at about 0.5 micrometers; exposing a pattern on the second resist layer with ultraviolet light having a wavelength of greater than about 300 nanometers, and developing the pattern to form an opening through the second resist layer; and exposing a pattern on the first resist layer with ultraviolet light having a wavelength of less than about 300 nanometers, through the opening in the second resist layer, removing the second resist layer, and developing the pattern to form an opening through the first resist layer, the width of the opening in the first layer being no greater than about 0.5 micrometers.
Claim 2
Dependent Claim
284 words
A process for patterning a substrate, comprising the steps of: spin coating a first resist layer onto the substrate, the first resist layer comprising a solution of from about 6 to about 9 percent by volume of poly(methylmethacrylate) and a dye having an absorbance of at least about 1.2 at 436 nanometers light wavelength, the dye being present in a ratio of about 1 part dye to 4 parts poly(methylmethacrylate), by volume; baking the first resist layer, the amount of material deposited in said step of spin coating a first resist layer being sufficient that the thickness of the first resist layer after baking is from about 0.5 micrometers for about 6 percent poly(methylmethacrylate) to about 1.1 micrometers for about 9 percent poly(methylmethacrylate); spin coating a second resist layer overlying the first resist layer, the second resist layer being a positive photoresist material including a naphthoquinone diazide; baking the second resist layer, the amount of the material added in said step of spin coating a second resist layer being sufficient that the thickness of the second resist layer after baking is from about 0.4 at about 0.5 micrometers; exposing a pattern on the second resist layer with ultraviolet light having a wavelength of greater than about 300 nanometers, and developing the pattern to form an opening through the second resist layer; and exposing a pattern on the first resist layer with ultraviolet light having a wavelength of less than about 300 nanometers, through the opening in the second resist layer, removing the second resist layer, and developing the pattern to form an opening through the first resist layer, the width of the opening in the first layer being no greater than about 0.5 micrometers.
Claim 3
Dependent Claim
40 words
The process of claim 1, including the further step, after said step of exposing a pattern on the first resist layer, of depositing metal onto the structure and thence onto the substrate through the opening in the first resist layer.
Claim 4
Dependent Claim
21 words
The process of claim 2, including the further step, after said step of depositing metal, of removing the first resist layer.
Claim 5
Dependent Claim
52 words
The process of claim 1, wherein the thickness of the second resist layer, after baking, is about 0.46 micrometers, the second resist layer is exposed with ultraviolet light having a wavelength of about 436 nanometers, and the first resist layer is exposed with ultraviolet light having a wavelength of about 220 nanometers.
Claim 6
Dependent Claim
50 words
The process of claim 4, wherein the solution used in spin coating the first resist layer has about 9 percent poly(methylmethacrylate) and about 2.2 percent dye, the thickness of the first resist layer, after baking, is about 1.1 micrometers, the minimum width of the metal line is about 0.5 micrometers.
Claim 7
Dependent Claim
53 words
The process of claim 4, wherein the solution used in spin coating the first resist layer has about 6 percent poly(methylmethacrylate) and about 1.5 percent dye, the thickness of the first resist layer, after baking, is about 0.5 micrometers, and the minimum width of the metal line is less than about 0.5 micrometers.
References Cited (Backward Citations)
US4362809A
Cited
US4668606A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1993-03-05 | 1993-09-04 | 1994-03-06 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-03-05 | 1997-09-04 | 1998-03-06 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-03-05 | 2001-09-04 | 2002-03-06 | $7700.00 | Window Closed / Lapsed |