Patent US2530982A successfully refreshed from Google Patents.
US4909183A
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US
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Apparatus for plasma CVD
Assignee: Canon Inc
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Filing: 1989-05-30
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Granted: 1990-03-20
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Expires: 2009-05-30
Abstract
Abstract An apparatus for Plasma CVD process comprises a vacuum chamber in which a plural number of substrates being placed along a circle and separately from each other, and means for passing a starting gas or an evacuating gas through gaps between the adjacent substrates.
Inventors
- 👤 Osamu Kamiya
- 👤 Yasutomo Fujiyama
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 05:12
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/455; C23C16/50; C23C16/505; C23C16/509; H; H10; H10P; H10P14/00; H10P14/20; H10P14/24; H10P14/29; H10P14/2901; H10P14/2923; H10P14/34; H10P14/3402; H10P14/3404; H10P14/3411
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
100 words
An apparatus for a plasma CVD process which comprises: (a) a vacuum chamber; (b) a central electrode for use as a gas collection port in said vacuum chamber; (c) means for holding a plurality of substrates in said vacuum chamber circumferentially surrounding said central electrode with gaps between adjacent substrates; and (d) means for passing a starting gas through said gaps in a direction radially along a path from the periphery of said vacuum chamber to a central point at said central electrode, said vacuum chamber being capable of generating a plasma atmosphere within the space circumscribed by said substrates.
Claim 2
Independent Claim
100 words
An apparatus for a plasma CVD process which comprises: (a) a vacuum chamber; (b) a central electrode for use as a gas collection port in said vacuum chamber; (c) means for holding a plurality of substrates in said vacuum chamber circumferentially surrounding said central electrode with gaps between adjacent substrates; and (d) means for passing a starting gas through said gaps in a direction radially along a path from the periphery of said vacuum chamber to a central point at said central electrode, said vacuum chamber being capable of generating a plasma atmosphere within the space circumscribed by said substrates.
Claim 3
Dependent Claim
15 words
An apparatus according to claim 1, wherein each substrate is placed on a rotating means.
Claim 4
Dependent Claim
14 words
An apparatus according to claim 1, wherein the substrate is in a cylinder type.
Claim 5
Dependent Claim
16 words
An apparatus according to claim 1, wherein a heating means is provided for heating the substrate.
Claim 6
Dependent Claim
13 words
An apparatus according to claim 1, wherein the substrates are used as electrodes.
Claim 7
Dependent Claim
33 words
The apparatus according to claim 1 wherein the electrode which generates the plasma atmosphere is hollow and foraminous and constitutes the means for passing a starting gas through gaps between the adjacent substrates.
References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1993-03-19 | 1993-09-18 | 1994-03-20 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-03-19 | 1997-09-18 | 1998-03-20 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-03-19 | 2001-09-18 | 2002-03-20 | $7700.00 | Window Closed / Lapsed |