Abstract A scanning electron microscope for observing and measuring a minute pattern of a sample comprising an electron lens for focusing an electron beam from an electron source onto the sample, wherein the electron beam scans on the sample, an inclining means for inclining the sample at an arbitrary angle α, and two secondary electron detectors are disposed at the position which are respectively turned at the same angle θ around the central axis of the electron beam from a plane which contains an axis of inclination of the sample and a central axis of the electron beam. As it is possible to measure the length of the minute pattern by detecting the secondary electron having a symmetrical wave-form while observing the minute pattern at the arbitrary angle, high measuring accuracy is attained.
Inventors
👤 Tadashi Otaka
Bibliographic Details
Application Number—
JurisdictionUS
Data Sourcegoogle_patents
Last Synchronized2026-10-27 13:33
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/26; H01J37/28
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
97 words
A scanning electron microscope for observing and measuring a minute pattern of a sample comprising, an electron lens for focusing an electron beam from an electron source onto the sample, wherein the electron beam scans on the sample, an inclining means for inclining the sample at an arbitrary angle α, and two secondary electron detectors are disposed at the positions which are respectively turned at the same angle θ around a central axis of the electron beam from a plane which contains an axis of inclination of the sample and the central axis of the electron beam.
Claim 2
Dependent Claim
97 words
A scanning electron microscope for observing and measuring a minute pattern of a sample comprising, an electron lens for focusing an electron beam from an electron source onto the sample, wherein the electron beam scans on the sample, an inclining means for inclining the sample at an arbitrary angle α, and two secondary electron detectors are disposed at the positions which are respectively turned at the same angle θ around a central axis of the electron beam from a plane which contains an axis of inclination of the sample and the central axis of the electron beam.
Claim 3
Dependent Claim
57 words
A scanning electron microscope for observing and measuring a minute pattern of a sample as defined in claim 1 further characterized by said two detectors are disposed at the position which are turned at the same angle between 5° and 30° around the central axis of the electron beam from the plane when the sample is inclined.
Claim 4
Dependent Claim
33 words
A scanning electron microscope for observing and measuring a minute pattern of a sample as defined in claim 2 further characterized by said sample is inclined at the angle between 0° and 60°.
Claim 5
Dependent Claim
36 words
A scanning electron microscope for observing and measuring a minute pattern of a sample as defined in claim 1 further characterized by said electron beam is perpendicularly irradiated to the axis of inclination of the sample.
Claim 6
Dependent Claim
38 words
A scanning electron microscope for observing and measuring a minute pattern of a sample as defined in claim 1 further characterized by said detectors are symmetrically disposed at the position of right and left of the electron beam.