US4952275A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Copper etching solution and method
Assignee: Rateze Remote Mgmt LLC
•
Filing: 1989-12-15
•
Granted: 1990-08-28
•
Expires: 2009-12-15
Abstract
Abstract A process and solution for selectively etching copper. The etching is effected by a nonaqueous solution of dimethyl sulfoxide and a halocarbon compound.
Inventors
- 👤 Charles W. C. Lin
- 👤 Ian Y. K. Yee
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 05:32
CPC Classifications
C; C23; C23F; C23F1/00; C23F1/10
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
12 words
A nonaqueous copper etching solution, comprising: dimethyl sulfoxide; and a halocarbon compound.
Claim 2
Dependent Claim
12 words
A nonaqueous copper etching solution, comprising: dimethyl sulfoxide; and a halocarbon compound.
Claim 3
Dependent Claim
28 words
A nonaqueous copper etching solution as claimed in claim 1, wherein said halocarbon compound is a mono- or multi- haloalkylacetate, a haloalkane, a haloalkene, or a halocarboxylic acid.
Claim 4
Dependent Claim
30 words
A nonaqueous copper etching solution as claimed in claim 1, wherein said halocarbon compound is a dihaloalkylacetate, a trihaloalkylacetate, carbon tetrachloride, dihaloalkene, trihaloalkene, a dihaloacetic acid or a trihaloacetic acid.
Claim 5
Dependent Claim
18 words
A nonaqueous copper etching solution as claimed in claim 3, wherein said halocarbon compound is a trichloroalkly acetate.
Claim 6
Dependent Claim
17 words
A nonaqueous copper etching solution as claimed in claim 4, wherein said trichloroalkyl acetate is trichloromethyl acetate.
Claim 7
Dependent Claim
17 words
A nonaqueous copper etching solution as claimed in claim 4, wherein said trichloroalkyl acetate is trichloroethyl acetate.
Claim 8
Dependent Claim
17 words
A nonaqueous copper etching solution as claimed in claim 1, wherein said halocarbon compound is carbon tetrachloride.
Claim 9
Dependent Claim
16 words
A nonaqueous copper etching solution as claimed in claim 1, wherein said halocarbon compound is trichloroethylene.
Claim 10
Dependent Claim
17 words
A nonaqueous copper etching solution as claimed in claim 1, wherein said halocarbon compound is trichloroacetic acid.
Claim 11
Independent Claim
26 words
A method of etching copper comprising the step of contacting the copper to be etched with an nonaqueous solution comprising dimethyl sulfoxide and a halocarbon compound.
Claim 12
Independent Claim
26 words
A method of etching copper comprising the step of contacting the copper to be etched with an nonaqueous solution comprising dimethyl sulfoxide and a halocarbon compound.
References Cited (Backward Citations)
US2978301A
Cited
US2982625A
Cited
US3231503A
Cited
US3514408A
Cited
US3466208A
Cited
US3717521A
Cited
US4311551A
Cited
US4319955A
Cited
US4459216A
Cited
US4401509A
Cited
US4419183A
Cited
US4497687A
Cited
US4437931A
Cited
US4462861A
Cited
US4510018A
Cited
US4545850A
Cited
US4586961A
Cited
US4636282A
Cited
US4632727A
Cited
US4604144A
Cited
US4810332A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1993-08-27 | 1994-02-26 | 1994-08-28 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-08-27 | 1998-02-26 | 1998-08-28 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-08-27 | 2002-02-26 | 2002-08-28 | $7700.00 | Window Closed / Lapsed |