US4987284A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Downstream microwave plasma processing apparatus having an improved coupling structure between microwave plasma
Assignee: Fujitsu Ltd
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Filing: 1990-01-08
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Granted: 1991-01-22
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Expires: 2010-01-08
Abstract
Abstract A downstream microwave plasma processing apparatus useful in fabricating an integrated circuit semiconductor device includes a waveguide, a microwave transmitting window perpendicular to a microwave electric field in the waveguide, a plasma generating chamber below the window and a reaction chamber separated from the plasma generating region by a gas-porous microwave shield. The microwave energy is transmitted into the plasma generating chamber through the microwave transmitting window, and generates a plasma which is confined therein by the shield. Radicals of a short-lived reactive gas, generated in the plasma, pass through the shield and impinge onto a workpiece placed in the reaction chamber. Uniform and effective downstream plasma etching or ashing is produced.
Inventors
- 👤 Shuzo Fujimura
- 👤 Satoru Mihara
- 👤 Toshimasa Kisa
- 👤 Yasunari Motoki
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 15:33
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H01J37/32623; H01J37/32009; H01J37/32357; H01J37/32715; H10; H10P; H10P72/00; H10P72/04; H10P72/0402
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
301 words
A plasma processing apparatus receiving microwave energy and processing a workpiece, comprising: a reaction gas source for supplying reaction gas; a waveguide substantially shaped as a rectangular tube, having a longitudinal axis and side-walls extending in parallel with the longitudinal axis of said waveguide, for receiving the microwave energy propagating in a first direction parallel to the walls of and transferring the microwave energy along the longitudinal axis of said waveguide; a dielectric window formed in one of the side-walls of said waveguide for transmitting the microwave energy therethrough to an exterior surface thereof; a plasma generating chamber, formed adjacent to the one of the side-walls of said waveguide to entirely enclose the exterior surface of said dielectric window, said plasma generating chamber offset on the exterior of said waveguide from the one of the side-walls of said waveguide in a direction perpendicular to the longitudinal axis of said waveguide and connected to said reaction gas source, said plasma generating chamber receiving the microwave energy transmitted through said dielectric window and the reaction gas supplied from said reaction gas source and generating a plasma, containing chemical radicals and ions, within said plasma generating chamber; a reaction chamber coupled to said plasma generating chamber, having a perforated metal plate separating said reaction chamber from said plasma generating chamber, the perforated metal plate formed substantially in parallel with said dielectric window, said reaction chamber receiving the chemical radicals from said plasma generating chamber through the perforated metal plate and protected from the ions by the perforated metal plate; and a holding stage for mounting the workpiece thereon, said holding stage disposed in said reaction chamber with a top surface of said holding stage substantially in parallel with the perforated metal sheet and reciprocally movable in a direction perpendicular to the perforated metal plate.
Claim 2
Dependent Claim
301 words
A plasma processing apparatus receiving microwave energy and processing a workpiece, comprising: a reaction gas source for supplying reaction gas; a waveguide substantially shaped as a rectangular tube, having a longitudinal axis and side-walls extending in parallel with the longitudinal axis of said waveguide, for receiving the microwave energy propagating in a first direction parallel to the walls of and transferring the microwave energy along the longitudinal axis of said waveguide; a dielectric window formed in one of the side-walls of said waveguide for transmitting the microwave energy therethrough to an exterior surface thereof; a plasma generating chamber, formed adjacent to the one of the side-walls of said waveguide to entirely enclose the exterior surface of said dielectric window, said plasma generating chamber offset on the exterior of said waveguide from the one of the side-walls of said waveguide in a direction perpendicular to the longitudinal axis of said waveguide and connected to said reaction gas source, said plasma generating chamber receiving the microwave energy transmitted through said dielectric window and the reaction gas supplied from said reaction gas source and generating a plasma, containing chemical radicals and ions, within said plasma generating chamber; a reaction chamber coupled to said plasma generating chamber, having a perforated metal plate separating said reaction chamber from said plasma generating chamber, the perforated metal plate formed substantially in parallel with said dielectric window, said reaction chamber receiving the chemical radicals from said plasma generating chamber through the perforated metal plate and protected from the ions by the perforated metal plate; and a holding stage for mounting the workpiece thereon, said holding stage disposed in said reaction chamber with a top surface of said holding stage substantially in parallel with the perforated metal sheet and reciprocally movable in a direction perpendicular to the perforated metal plate.
Claim 3
Dependent Claim
234 words
A plasma processing apparatus, receiving microwaves from a microwave energy source, for processing a workpiece, said plasma processing apparatus comprising: a waveguide, having walls, for transmitting the microwaves in a propagation direction along said waveguide parallel to the walls; a microwave transmitting window in one of the walls, disposed parallel to the propagation direction of adjacent microwaves, said microwave transmitting window preventing passage of gas therethrough while permitting microwave energy to be transmitted therethrough without changing the propagation direction; gas supply means for supplying a reactive gas; a vacuum processing vessel, coupled to said gas supply means to receive the reactive gas and having one side coupled to said waveguide by said microwave transmitting window; vacuum generating means, coupled to said vacuum processing vessel, for generating a partial vacuum therein; support means for supporting the workpiece within said vacuum processing vessel; and a shield, disposed between said support means and said microwave transmitting window and separating said processing vessel into a reaction chamber containing said support means and a plasma generating chamber bounded on a side opposite said shield by said microwave transmitting window, said gas supply means supplying the reactive gas to the plasma generating chamber to form a plasma when microwave energy is received, said shield member being gas porous and permitting at least a portion of the reactive gas to pass into said reaction chamber, while containing the plasma generating chamber.
Claim 4
Dependent Claim
234 words
A plasma processing apparatus, receiving microwaves from a microwave energy source, for processing a workpiece, said plasma processing apparatus comprising: a waveguide, having walls, for transmitting the microwaves in a propagation direction along said waveguide parallel to the walls; a microwave transmitting window in one of the walls, disposed parallel to the propagation direction of adjacent microwaves, said microwave transmitting window preventing passage of gas therethrough while permitting microwave energy to be transmitted therethrough without changing the propagation direction; gas supply means for supplying a reactive gas; a vacuum processing vessel, coupled to said gas supply means to receive the reactive gas and having one side coupled to said waveguide by said microwave transmitting window; vacuum generating means, coupled to said vacuum processing vessel, for generating a partial vacuum therein; support means for supporting the workpiece within said vacuum processing vessel; and a shield, disposed between said support means and said microwave transmitting window and separating said processing vessel into a reaction chamber containing said support means and a plasma generating chamber bounded on a side opposite said shield by said microwave transmitting window, said gas supply means supplying the reactive gas to the plasma generating chamber to form a plasma when microwave energy is received, said shield member being gas porous and permitting at least a portion of the reactive gas to pass into said reaction chamber, while containing the plasma generating chamber.
Claim 5
Dependent Claim
49 words
A plasma processing apparatus as recited in claim 2, wherein said shield is a metal member, substantially parallel to said microwave transmitting window, having a plurality of openings to permit at least the portion of the reactive gas to pass from the plasma generating chamber to the reaction chamber.
Claim 6
Dependent Claim
16 words
A plasma processing apparatus as recited in claim 3, wherein said shield comprises a metallic mesh.
Claim 7
Dependent Claim
17 words
A plasma processing apparatus as recited in claim 3, wherein said shield comprises a perforated metallic plate.
Claim 8
Dependent Claim
18 words
A plasma processing apparatus as recited in claim 2, wherein said microwave transmitting window comprises a dielectric material.
Claim 9
Dependent Claim
15 words
A plasma processing apparatus as recited in claim 6, wherein said dielectric material comprises silica.
Claim 10
Dependent Claim
17 words
A plasma processing apparatus as recited in claim 6, wherein said dielectric material comprises a ceramic material.
Claim 11
Dependent Claim
21 words
A plasma processing apparatus as recited in claim 2, wherein the reactive gas supplied by said gas supply means includes oxygen.
Claim 12
Dependent Claim
26 words
A plasma processing apparatus as recited in claim 2, wherein said support means comprises a stage reciprocably movable in a direction substantially perpendicular to said shield.
Claim 13
Dependent Claim
63 words
A plasma processing apparatus according to claim 2, wherein the workpiece and said microwave transmitting window each have a length measured substantially parallel to the propagation direction and a width measured substantially perpendicular to both the propagation direction and the microwave electric field, the length and width of the workpiece being respectively smaller than the length: and width of said microwave transmitting window.
Claim 14
Dependent Claim
35 words
A plasma processing apparatus as recited in claim 2, wherein said vacuum processing vessel includes an evacuation outlet disposed opposite said shield, and gas in said vacuum processing vessel is evacuated through said evacuation outlet.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-01-21 | 1994-07-23 | 1995-01-22 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-01-21 | 1998-07-23 | 1999-01-22 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-01-21 | 2002-07-23 | 2003-01-22 | $7700.00 | Window Closed / Lapsed |