US5033407A
Expired / Lapsed
US
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Low pressure vapor phase growth apparatus
Assignee: Canon Anelva Corp
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Filing: 1990-02-07
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Granted: 1991-07-23
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Expires: 2010-02-07
Abstract
Abstract A low pressure vapor phase growth apparatus is disclosed. The apparatus comprises a window made of a light-transmissive material, a gas feeder for feeding a reactive gas, an exhauster for pumping gases out after a chemical reaction, a lamp for effecting radiant heating of a substrate with a radiation emitted therefrom and transmitted through said light-transmissive window, and a cooling mechanism for forcibly cooling said light-transmissive window. The substrate and the light-transmissive window are maintained in no mutual contact with a gap therebetween having a width of at most the mean free path of a gas existing in the gap. The reactive gas fed through the gas feeder undergoes the chemical reaction on the obverse surface of the substrate to form a thin film thereon.
Inventors
- 👤 Shigeru Mizuno
- 👤 Isamu Morisako
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 15:08
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/46; C23C16/48; C23C16/481
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
151 words
A low pressure vapor phase growth apparatus comprising a window made of a light-transmissive, energy-conductive material, a gas feeder for feeding a reactive gas, an exhauster for pumping gases out after a chemical reaction, a lamp for effecting radiant heating of a substrate with radiation emitted therefrom and transmitted through the light-transmissive, energy-conductive window, and a cooling mechanism for forcibly cooling said light-transmissive, energy-conductive window; wherein said substrate and said light-transmissive, energy-conductive window are spaced apart with a gap therebetween having a width of at most the mean free path of an inert gas existing in said gap; wherein said gas feeder is positioned so that reactive gas fed through said gas feeder undergoes said chemical reaction on the obverse surface of said substrate to form a thin film thereon; and wherein said cooling mechanism comprises a liquid which flows across the gap between said substrate and said light-transmissive, energy-conductive window.
Claim 2
Dependent Claim
151 words
A low pressure vapor phase growth apparatus comprising a window made of a light-transmissive, energy-conductive material, a gas feeder for feeding a reactive gas, an exhauster for pumping gases out after a chemical reaction, a lamp for effecting radiant heating of a substrate with radiation emitted therefrom and transmitted through the light-transmissive, energy-conductive window, and a cooling mechanism for forcibly cooling said light-transmissive, energy-conductive window; wherein said substrate and said light-transmissive, energy-conductive window are spaced apart with a gap therebetween having a width of at most the mean free path of an inert gas existing in said gap; wherein said gas feeder is positioned so that reactive gas fed through said gas feeder undergoes said chemical reaction on the obverse surface of said substrate to form a thin film thereon; and wherein said cooling mechanism comprises a liquid which flows across the gap between said substrate and said light-transmissive, energy-conductive window.
Claim 3
Dependent Claim
25 words
A low pressure vapor phase growth apparatus as claimed in claim 1, wherein an inert gas is used as said gas existing in said gap.
Claim 4
Dependent Claim
178 words
A low pressure vapor phase growth apparatus comprising a chamber for processing a substrate on which a thin film is to be established comprising; (a) a window comprising a high-transmissive material to permit radiant energy to pass therethrough and onto the reverse surface of said substrate; (b) a fixing tool comprising a light transmissive material for supporting said substrate; (c) a gas feeder for feeding a reactive gas into said chamber; (d) an exhauster for pumping gases out of said chamber; (e) a source directing radiation through said window onto said reverse surface of substrate; (f) a cooling mechanism for forcibly cooling said window; and (g) a gas feed inlet for feeding therethrough a purge gas into a gap between said substrate and said window as well as said fixing tool; wherein said substrate and said window do not contact each other in order not to form a thin film on the reverse surface of said substrate; and wherein a thin film is formed on the obverse surface of said substrate by said reactive gas reacting chemically thereon.
Claim 5
Dependent Claim
178 words
A low pressure vapor phase growth apparatus comprising a chamber for processing a substrate on which a thin film is to be established comprising; (a) a window comprising a high-transmissive material to permit radiant energy to pass therethrough and onto the reverse surface of said substrate; (b) a fixing tool comprising a light transmissive material for supporting said substrate; (c) a gas feeder for feeding a reactive gas into said chamber; (d) an exhauster for pumping gases out of said chamber; (e) a source directing radiation through said window onto said reverse surface of substrate; (f) a cooling mechanism for forcibly cooling said window; and (g) a gas feed inlet for feeding therethrough a purge gas into a gap between said substrate and said window as well as said fixing tool; wherein said substrate and said window do not contact each other in order not to form a thin film on the reverse surface of said substrate; and wherein a thin film is formed on the obverse surface of said substrate by said reactive gas reacting chemically thereon.
Claim 6
Dependent Claim
24 words
The apparatus of claim 3 wherein said purge gas is a member of the group consisting of He, Ar, Ne and N 2 .
Claim 7
Dependent Claim
13 words
The apparatus of claim 3 wherein said light transmissive material is transparent quartz.
Claim 8
Dependent Claim
23 words
The apparatus of claim 3 wherein said gap does not exceed the mean free path of said purge gas located with said gap.
References Cited (Backward Citations)
US4913929A
Cited
EP0299244A1
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-07-22 | 1995-01-21 | 1995-07-23 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-07-22 | 1999-01-21 | 1999-07-23 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-07-22 | 2003-01-21 | 2003-07-23 | $7700.00 | Window Closed / Lapsed |