US5048094A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method and apparatus for checking pattern
Assignee: NSK Ltd
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Filing: 1989-10-24
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Granted: 1991-09-10
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Expires: 2009-10-24
Abstract
Abstract A pattern formed on an object under check such as a mask, printed substrate, etc., is scanned by a CCD camera, and check pattern data for one scanning line obtained from the CCD camera is divided into a plurality of pixel groups and stored in shift register groups. The check pattern data is compared with a master pattern data representing the external shape of a master pattern to calculate an inclination of the check pattern (pattern to be checked) with respect to the master pattern. The order of reading addresses of the shift register groups is changed in accordance with the inclination so that the check pattern data matches the master pattern data. Thereafter, the check pattern data is compared with the master pattern data to detect a defect in the check pattern to thereby avoid erroneous judgment due to an angular deviation between the check pattern and the master pattern.
Inventors
- 👤 Yoshiyuki Aoyama
- 👤 Takahiro Nakano
- 👤 Osamu Kanasashi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 04:27
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70483; G03F7/70605; G03F7/70616; G03F7/70633; G01; G01R; G01R31/00; G01R31/28; G01R31/302; G01R31/308; G06; G06T; G06T7/00; G06T7/0002; G06T7/0004; G06T2207/00; G06T2207/30; G06T2207/30108; G06T2207/30141
Claims Analysis
Total Claims: 18
Claim 1
Independent Claim
167 words
In a method for checking a pattern wherein an object under check having a pattern to be checked formed thereon is scanned two-dimensionally relative to an imaging device to obtain check pattern data, and the check pattern data is compared with previously stored master pattern data to check for a defect in the pattern to be checked, the improvement comprising the steps of: dividing check pattern data for each one scanning line from the imaging device into a plurality of pixel groups and storing the check pattern data in a memory means; calculating an inclination of the pattern to be checked by comparing the store check pattern data with the master pattern data; matching the check pattern data and the master pattern data with each other by changing the order of reading of one of the check pattern data and the master pattern data in accordance with the inclination of the pattern data to be checked; and comparing the check pattern data with the master pattern data.
Claim 2
Dependent Claim
167 words
In a method for checking a pattern wherein an object under check having a pattern to be checked formed thereon is scanned two-dimensionally relative to an imaging device to obtain check pattern data, and the check pattern data is compared with previously stored master pattern data to check for a defect in the pattern to be checked, the improvement comprising the steps of: dividing check pattern data for each one scanning line from the imaging device into a plurality of pixel groups and storing the check pattern data in a memory means; calculating an inclination of the pattern to be checked by comparing the store check pattern data with the master pattern data; matching the check pattern data and the master pattern data with each other by changing the order of reading of one of the check pattern data and the master pattern data in accordance with the inclination of the pattern data to be checked; and comparing the check pattern data with the master pattern data.
Claim 3
Dependent Claim
48 words
The improvement in a method for checking a pattern according to claim 1 wherein the comparison between the comparison pattern data or the master pattern data and the check pattern data is performed by taking the exclusive OR of the check pattern data and the master pattern data.
Claim 4
Dependent Claim
173 words
In an apparatus for checking a pattern wherein an object under check having a pattern to be checked formed thereon is scanned two-dimensionally relative to an imaging device to obtain check pattern data, and the check pattern data is compared with previously stored master pattern data to check for a defect in the pattern to be checked, the improvement comprising: means for dividing the check pattern data for each one scanning line from the imaging device into a plurality of pixel groups and for storing the check pattern data in a memory means; means for detecting an inclination of the pattern to be checked by comparing the stored check pattern data with the master pattern data; means for matching the check pattern data and the master pattern data with each other by changing the order of reading of one of the check pattern data and the master pattern data in accordance with a detected result of the inclination detection means; and means for comparing the check pattern data with the master pattern data.
Claim 5
Dependent Claim
173 words
In an apparatus for checking a pattern wherein an object under check having a pattern to be checked formed thereon is scanned two-dimensionally relative to an imaging device to obtain check pattern data, and the check pattern data is compared with previously stored master pattern data to check for a defect in the pattern to be checked, the improvement comprising: means for dividing the check pattern data for each one scanning line from the imaging device into a plurality of pixel groups and for storing the check pattern data in a memory means; means for detecting an inclination of the pattern to be checked by comparing the stored check pattern data with the master pattern data; means for matching the check pattern data and the master pattern data with each other by changing the order of reading of one of the check pattern data and the master pattern data in accordance with a detected result of the inclination detection means; and means for comparing the check pattern data with the master pattern data.
Claim 6
Dependent Claim
48 words
The improvement in an apparatus for checking a pattern according to claim 3 wherein the means for extracting a defective portion extracts the defective portion by taking the exclusive OR of one of the comparison master pattern data and the master pattern data, and the check pattern data.
Claim 7
Dependent Claim
149 words
In a method for checking a pattern wherein an object under check having a pattern to be checked is scanned two-dimensionally relative to an imaging device to obtain check pattern data, and the check pattern data is compared with previously stored master pattern data to check for a defect in the pattern to be checked, the improvement comprising the steps of: forming a deviation quantity corresponding to a pattern portion whose accuracy in a defect recognition in the master pattern data is low; forming comparison master pattern data based on the deviation allowing pattern data and the master pattern data; forming contour data of the comparison master pattern data; extracting a defective portion by comparing the comparison pattern data with the check pattern data; and judging the absence or presence of a defect in the pattern to be checked by masking the extracted defective portion with the contour data.
Claim 8
Dependent Claim
149 words
In a method for checking a pattern wherein an object under check having a pattern to be checked is scanned two-dimensionally relative to an imaging device to obtain check pattern data, and the check pattern data is compared with previously stored master pattern data to check for a defect in the pattern to be checked, the improvement comprising the steps of: forming a deviation quantity corresponding to a pattern portion whose accuracy in a defect recognition in the master pattern data is low; forming comparison master pattern data based on the deviation allowing pattern data and the master pattern data; forming contour data of the comparison master pattern data; extracting a defective portion by comparing the comparison pattern data with the check pattern data; and judging the absence or presence of a defect in the pattern to be checked by masking the extracted defective portion with the contour data.
Claim 9
Dependent Claim
48 words
The improvement in a method for checking a pattern according to claim 5 wherein the comparison between the comparison pattern data or the master pattern data and the check pattern data is performed by taking the exclusive OR of the check pattern data and the master pattern data.
Claim 10
Dependent Claim
136 words
In the apparatus for checking a pattern wherein an object under check having a pattern to be checked formed thereon is scanned two-dimensionally relative to an imaging device to obtain check pattern data, and the check pattern data is compared with previously stored master pattern data to check for a defect in the pattern to be checked, the improvement comprising: means for forming a deviation allowing pattern which is set to a predetermined deviation quantity corresponding to a pattern portion whose accuracy in a defect recognition in the master pattern data is low; means for forming contour pattern data of the comparison master pattern data; means for extracting a defective portion by comparing the comparison master pattern data with the check pattern data; and means for masking the extracted defective portion with the contour pattern data.
Claim 11
Dependent Claim
136 words
In the apparatus for checking a pattern wherein an object under check having a pattern to be checked formed thereon is scanned two-dimensionally relative to an imaging device to obtain check pattern data, and the check pattern data is compared with previously stored master pattern data to check for a defect in the pattern to be checked, the improvement comprising: means for forming a deviation allowing pattern which is set to a predetermined deviation quantity corresponding to a pattern portion whose accuracy in a defect recognition in the master pattern data is low; means for forming contour pattern data of the comparison master pattern data; means for extracting a defective portion by comparing the comparison master pattern data with the check pattern data; and means for masking the extracted defective portion with the contour pattern data.
Claim 12
Dependent Claim
44 words
The improvement in an apparatus for checking a patter according to claim 7 wherein the means for extracting a defective portion by taking the exclusive OR of one of the comparison master pattern data and the master pattern data, and the check pattern data.
Claim 13
Dependent Claim
233 words
In a method for checking a pattern wherein an object under check having a pattern to be checked is scanned two-dimensionally relative to an imaging device to obtain a check pattern data, and the check pattern data is compared with a previously stored master pattern data to check for a defect of the pattern to be checked, the improvement comprising the steps of: dividing the check pattern data for each one scanning line from the imaging device into a plurality of pixel groups and storing the check pattern data in a memory means; calculating an inclination of the pattern data to be checked by comparing the stored check pattern data with the master pattern data; matching the check pattern data and the master pattern data in accordance with the inclination of the pattern to be checked; forming a deviation allowing pattern which is set to a predetermined deviation quantity corresponding to a pattern portion whose accuracy in a defect recognition in the master pattern data is low; forming comparison master pattern data based on the deviation allowing pattern data and the master pattern data; forming contour pattern data of the comparison master pattern data; extracting a defective portion by comparing the comparison master pattern data with the check pattern data; and judging the absence or presence of the check pattern defective portion by masking the extracted defective portion with the contour pattern data.
Claim 14
Dependent Claim
233 words
In a method for checking a pattern wherein an object under check having a pattern to be checked is scanned two-dimensionally relative to an imaging device to obtain a check pattern data, and the check pattern data is compared with a previously stored master pattern data to check for a defect of the pattern to be checked, the improvement comprising the steps of: dividing the check pattern data for each one scanning line from the imaging device into a plurality of pixel groups and storing the check pattern data in a memory means; calculating an inclination of the pattern data to be checked by comparing the stored check pattern data with the master pattern data; matching the check pattern data and the master pattern data in accordance with the inclination of the pattern to be checked; forming a deviation allowing pattern which is set to a predetermined deviation quantity corresponding to a pattern portion whose accuracy in a defect recognition in the master pattern data is low; forming comparison master pattern data based on the deviation allowing pattern data and the master pattern data; forming contour pattern data of the comparison master pattern data; extracting a defective portion by comparing the comparison master pattern data with the check pattern data; and judging the absence or presence of the check pattern defective portion by masking the extracted defective portion with the contour pattern data.
Claim 15
Dependent Claim
48 words
The improvement in a method for checking a pattern according to claim 9 wherein the comparison between the comparison pattern data or the master pattern data and the check pattern data is performed by taking the exclusive OR of the check pattern data and the master pattern data.
Claim 16
Dependent Claim
219 words
In ana apparatus for checking pattern wherein an object under check having a pattern to be checked is scanned two-dimensionally relative to an imaging device to obtain a check pattern data, and the check pattern data is compared with a previously stored master pattern data to check for a defect of the pattern to be checked, the improvement comprising: means for dividing check pattern data for each one scanning line from the imaging device into a plurality of pixel groups and for detecting an inclination of the check pattern by comparing the stored check pattern data with the master pattern data; means for matching the check pattern data and the master pattern data in accordance with a check result of the inclination detection means; means for forming a deviation allowing pattern which is set to a predetermined deviation quantity corresponding to a pattern portion whose accuracy in a defect recognition in the master pattern data is low; means for forming comparison master pattern data based on the deviation allowing pattern data and the master pattern data; means for forming contour pattern data of the comparison master pattern data; means for extracting a defective portion by comparing the comparison master pattern data with the check pattern data; and means for masking defective portion extracting data with the contour pattern data.
Claim 17
Dependent Claim
219 words
In ana apparatus for checking pattern wherein an object under check having a pattern to be checked is scanned two-dimensionally relative to an imaging device to obtain a check pattern data, and the check pattern data is compared with a previously stored master pattern data to check for a defect of the pattern to be checked, the improvement comprising: means for dividing check pattern data for each one scanning line from the imaging device into a plurality of pixel groups and for detecting an inclination of the check pattern by comparing the stored check pattern data with the master pattern data; means for matching the check pattern data and the master pattern data in accordance with a check result of the inclination detection means; means for forming a deviation allowing pattern which is set to a predetermined deviation quantity corresponding to a pattern portion whose accuracy in a defect recognition in the master pattern data is low; means for forming comparison master pattern data based on the deviation allowing pattern data and the master pattern data; means for forming contour pattern data of the comparison master pattern data; means for extracting a defective portion by comparing the comparison master pattern data with the check pattern data; and means for masking defective portion extracting data with the contour pattern data.
Claim 18
Dependent Claim
44 words
The improvement in an apparatus for checking a patter according to claim 11 wherein the means for extracting a defective portion by taking the exclusive OR of one of the comparison master pattern data and the master pattern data, and the check pattern data.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-09-09 | 1995-03-11 | 1995-09-10 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-09-09 | 1999-03-11 | 1999-09-10 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-09-09 | 2003-03-11 | 2003-09-10 | $7700.00 | Window Closed / Lapsed |