US5060039A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Permanent magnet force rebalance micro accelerometer
Assignee: Charles Stark Draper Laboratory Inc
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Filing: 1989-02-22
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Granted: 1991-10-22
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Expires: 2009-02-22
Abstract
Abstract An accelerometer fabricated by micromachining techniques from a crystaline precursor. The accelerometer is formed in a body of a semiconductor crystal such as silicon by doping portions to an etch resistant condition and etching a cavity around them to release a resiliently suspended multi legged member. A conductor is formed in one of the legs. A permanent magnet is placed with opposite polarity poles on either side of the leg and the acceleration displacement of the member sensed from which a current is developed through the leg conductor to restore the member position and provide an output indication of acceleration.
Inventors
- 👤 Marc S. Weinberg
- 👤 Paul Greiff
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 01:11
CPC Classifications
G; G01; G01P; G01P15/00; G01P15/02; G01P15/08; G01P15/13; G01P15/132; G01C; G01C19/00; G01C19/56; G01C19/5719; G01P15/125
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
255 words
A micromachined monolithic structure adapted for use in inertial acceleration sensing comprising: a monolithic body of an etchable structural material and having an etched cavity with a bottom therein; said monolithic body including a resiliently supported element suspended in said cavity above said bottom and having attachments to said body forming resilient supports for said element which permits said element to rotate about a first axis which passes through said supports; said resiliently supported element including an opening between first and second segments coupled to said resilient supports, said first and second segments of said resiliently supported element coupled by a crosspiece extending parallel to and laterally displaced from said first axis; said element and supports having etch resistant dopants therein, and formed in the same structural material as said monolithic body by selectively etching portions of said body; an electrical conductor extending in a direction parallel to said axis across a portion of a surface of said crosspiece of said element; a permanent magnet including first and second pole portions disposed on either side of said crosspiece of said element, said first and second pole portions supported to direct magnetic field lines orthogonal to the direction of said conductor where it crosses a portion of said surface of said crosspiece of said element such that rotation of said crosspiece of said element about said axis will cause said conductor to pass through a maximum of magnetic field lines from said permanent magnet; and means for imparting electrical conductivity to said bottom of said body.
Claim 2
Dependent Claim
255 words
A micromachined monolithic structure adapted for use in inertial acceleration sensing comprising: a monolithic body of an etchable structural material and having an etched cavity with a bottom therein; said monolithic body including a resiliently supported element suspended in said cavity above said bottom and having attachments to said body forming resilient supports for said element which permits said element to rotate about a first axis which passes through said supports; said resiliently supported element including an opening between first and second segments coupled to said resilient supports, said first and second segments of said resiliently supported element coupled by a crosspiece extending parallel to and laterally displaced from said first axis; said element and supports having etch resistant dopants therein, and formed in the same structural material as said monolithic body by selectively etching portions of said body; an electrical conductor extending in a direction parallel to said axis across a portion of a surface of said crosspiece of said element; a permanent magnet including first and second pole portions disposed on either side of said crosspiece of said element, said first and second pole portions supported to direct magnetic field lines orthogonal to the direction of said conductor where it crosses a portion of said surface of said crosspiece of said element such that rotation of said crosspiece of said element about said axis will cause said conductor to pass through a maximum of magnetic field lines from said permanent magnet; and means for imparting electrical conductivity to said bottom of said body.
Claim 3
Dependent Claim
13 words
The structure of claim 1 wherein said structural material is a crystalline material.
Claim 4
Dependent Claim
11 words
The structure of claim 2 wherein said structural material is silicon.
Claim 5
Dependent Claim
18 words
The structure of claim 3 wherein said structural material is epitaxial silicon grown over a doped silicon substrate.
Claim 6
Dependent Claim
12 words
The structure of claim 4 wherein said substrate forms said cavity bottom.
Claim 7
Dependent Claim
12 words
The structure of claim 1 wherein said element is a semiconductor material.
Claim 8
Dependent Claim
19 words
The structure of claim 4 wherein said epitaxial silicon has the <100> crystal orientation parallel to said element surface.
Claim 9
Dependent Claim
11 words
The structure of claim 6 wherein said element is doped silicon.
Claim 10
Dependent Claim
11 words
The structure of claim 8 wherein said supports are doped silicon.
Claim 11
Dependent Claim
51 words
The structure of claim 1 further including: means for sensing capacitance between said element and said bottom as an indication of acceleration applied to said element; and means for applying current through said conductor to torque said element about said axis so as to restore said element to a nominal position.
Claim 12
Dependent Claim
22 words
The structure of claim 10 further including means for sensing current through said conductor as an indication of acceleration on said element.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-10-21 | 1995-04-22 | 1995-10-22 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-10-21 | 1999-04-22 | 1999-10-22 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-10-21 | 2003-04-22 | 2003-10-22 | $7700.00 | Window Closed / Lapsed |