Method of evaluating characteristics of superconductors and process and apparatus for forming superconductor film by using the method

Claim 3

A method according to claim 1, wherein said calculation comprises: comparing an observed spectrum of the transmitted light with a theoretical spectrum T defined by the following formula (1); and calculating said ratio by using the following formula (2). ##EQU12## where R: reflectance, n: real part of complex refractive index, k: imaginary part of complex refractive index, α: absorption coefficient, d: thickness of sample. ε=ε.sup.∞ +f.sub.n ε.sub.d +(1-f.sub.n)ε.sub.s ( 2) where ε: complex dielectric constant, ε.sup.∞ : high frequency term not contributing to conduction, ε d : term due to normal conduction electrons (or free electron gas), which conforms to Drude's formula and defined as; ε.sub.d =ε.sub.1d -iε.sub.2d, provided ##EQU13## where τ: relaxation time of carrier ω p : plasma frequency N: electron density m*: effective mass of electron ε s : term due to superconduction electrons and defined as; ε.sub.s =ε.sub.1s -iε.sub.2s where ε 0 ε 2s =σ 1s /ω and ε 0 ε 1s =-σ 2s /ω, σ 1S and σ 2S being the real part and the imaginary part of the optical conductivity spectrum of a superconductor which conforms to Mattis-Bardeen's rule, and f n : ratio of the number of normal conduction electrons to the total numbers of electrons contributing to conduction.

Claim 4

A method according to claim 1, wherein said calculation comprises: comparing an observed spectrum of the transmitted light with a theoretical spectrum T defined by the following formula (1A); and calculating said ratio by using the following formula (2). T=T.sub.0,j =t.sub.o,j ·t.sub.o,j * (1A) wherein ##EQU14## where r k ,l represents the phase and amplitude of light once reflected through the k-th to the l-th layers in a multiple-layered film composed of j layers, t k ,l represents the phase and amplitude of light once transmitted through the k-th to the l-th layers in a multiple-layered film composed of j layers, and e - Δ.sbsp.n represents the phase shift and damping in the material of the n-th layer, in which Δ n =(d n /λ)/2π+i e - α.sbsp.n d .sbsp.n, d n being the thickness of the n-th layer and α n being the damping of the n-th layer, ε=ε.sup.∞ +f.sub.n ε.sub.d +(1-f.sub.n)ε.sub.s ( 2) where ε: complex dielectric constant, ε.sup.∞ : high frequency term not contributing to conduction, ε d : term due to normal conduction electrons (or free electron gas), which conforms to Drude's formula and defined as; ε.sub.d =ε.sub.1d -iε.sub.2d, provided ##EQU15## where τ: relaxation time of carrier ω p : plasma frequency N: electron density m*: effective mass of electron ε s : term due to superconduction electrons and defined as; ε.sub.s =ε.sub.1s -iε.sub.2s where ε 0 ε 2s =σ 1s /ω and ε 0 ε 1s =-σ 2s /ω, σ 1S and σ 2S being the real part and the imaginary part of the optical conductivity spectrum of a superconductor which conform to Mattis-Bardeen's rule, and f n : ratio of the number of normal conduction electrons to the total numbers of electrons contributing to conduction.

Claim 5

A method according to claim 2 or 3, wherein said real part σ 1S and said imaginary part σ 2S of the optical conductivity spectrum of a superconductor conform to Leplae's theory, as defined by the following formule: ##EQU16## with ε, ε': energy of a single particle electron measured from Fermi surface, ε' being the energy under an excited state, (E): (EE'-Δ 2 )/|ε ε'|, Δ: energy gap, σ 1d : σ 0 /(1+ω 2 τ 2 ) [derived from Drude's equation], ##EQU17## σ.sub. : direct current electric conductivity, and V F : Fermi velocity.

Claim 6

A method according to claim 1, wherein said irradiation is effected with an infrared or far-infrared ray.

Claim 7

A process for forming a superconductor film on a substrate, comprising: using the method according to claim 1, evaluating characteristics of a superconductor during a growth thereof on a substrate; and controlling a process condition based on a result of the evaluation.

Claim 8

A process according to claim 6, wherein said forming of the superconductor film on the substrate is carried out by a chemical vapor deposition (CVD), a molecular beam epitaxy (MBE), a sputtering, or a vapor deposition.

Claim 11

An apparatus according to claim 8, wherein said means for measuring a light transmittance of a superconductor film comprises: a portion for generating light; a portion for detecting light; a light pipe for communicating the light generating portion with the light detecting portion; and a means, inserted in the light pipe, for supporting the substrate with the film in the path of light passing through the light pipe: and wherein said mechanism for transferring the substrate with the film is able to transfer the substrate and the film between the growth chamber and the substrate supporting portion of the means for measuring a light transmittance.

Claim 12

An apparatus according to claim 9, wherein an intermediate space is provided between the growth chamber and the substrate supporting means, for temporarily containing the substrate and the film when moved between the growth chamber and the substrate supporting means.

Claim 13

An apparatus according to claim 10, which further comprises a temperature regulator and a pressure regulator for maintaining a temperature and a pressure in the intermediate space at a value between those of the growth chamber and those of the substrate supporting means.

Claim 14

An apparatus according to claim 9, 10, or 11, wherein said growth chamber is a growth chamber of a chemical vapor deposition apparatus, a molecular beam epitaxy apparatus, a sputtering apparatus, or a vapor deposition apparatus.