US5147497A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Plasma apparatus, and method and system for extracting electrical signal of member to which high-frequency wave is applied
Assignee: Toshiba Corp
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Filing: 1991-07-17
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Granted: 1992-09-15
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Expires: 2011-07-17
Abstract
Abstract A system for measuring a temperature of a high-frequency electrode of a plasma etching apparatus has a temperature detecting element for detecting a temperature, a metal sheath member in which the temperature detecting element is provided to be insulated from it and which is kept in a DC floating state, an insulating member for insulating the sheath member from the high-frequency electrode, and a filter for removing a high-frequency component of an electrical signal sent from the temperature detecting element.
Inventors
- 👤 Toshihisa Nozawa
- 👤 Osamu Kamikanda
- 👤 Yukimasa Yoshida
- 👤 Haruo Okano
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 07:46
CPC Classifications
H; H05; H05H; H05H1/00; H05H1/02; H01; H01J; H01J37/00; H01J37/32; H01J37/32917; H01J37/32935
Claims Analysis
Total Claims: 18
Claim 1
Independent Claim
124 words
A plasma apparatus for performing plasma treatment to an object to be processed, comprising: a vacuum chamber; a supporting table, for supporting said object, provided in said chamber; plasma generating means for generating plasma by means of applying high frequency power to said supporting table; temperature detecting means, for detecting temperature of said supporting table, provided in said supporting table; a metal container in which said temperature detecting means is arranged to be insulated therefrom and which is kept in a DC floating state; filter means for filtering a output signal from said temperature detecting means to remove a high-frequency component of the signal; and temperature measuring means for measuring temperature of said supporting table based on said signal output from said filter means.
Claim 2
Dependent Claim
124 words
A plasma apparatus for performing plasma treatment to an object to be processed, comprising: a vacuum chamber; a supporting table, for supporting said object, provided in said chamber; plasma generating means for generating plasma by means of applying high frequency power to said supporting table; temperature detecting means, for detecting temperature of said supporting table, provided in said supporting table; a metal container in which said temperature detecting means is arranged to be insulated therefrom and which is kept in a DC floating state; filter means for filtering a output signal from said temperature detecting means to remove a high-frequency component of the signal; and temperature measuring means for measuring temperature of said supporting table based on said signal output from said filter means.
Claim 3
Dependent Claim
19 words
An apparatus according to claim 1, further comprising temperature controlling means for controlling the temperature of said supporting table.
Claim 4
Independent Claim
96 words
A method of extracting an electrical signal which is sent from a member applied with a high-frequency wave and which has a lower frequency than the high-frequency power, comprising the steps of: arranging a transmitting medium of an electrical signal to be extracted, inside a metal container to be insulated therefrom; arranging said metal container to be insulated from the member to which the high frequency power is applied; keeping said metal container in a DC floating state; and causing filter means to remove a high-frequency component of the electrical signal sent from said transmitting medium.
Claim 5
Independent Claim
96 words
A method of extracting an electrical signal which is sent from a member applied with a high-frequency wave and which has a lower frequency than the high-frequency power, comprising the steps of: arranging a transmitting medium of an electrical signal to be extracted, inside a metal container to be insulated therefrom; arranging said metal container to be insulated from the member to which the high frequency power is applied; keeping said metal container in a DC floating state; and causing filter means to remove a high-frequency component of the electrical signal sent from said transmitting medium.
Claim 6
Dependent Claim
26 words
A method according to claim 3, wherein said signal transmitting medium comprises a temperature detecting element for the member to which the high-frequency power is applied.
Claim 7
Dependent Claim
15 words
A method according to claim 4, wherein said signal transmitting medium comprises a platinum resistor.
Claim 8
Dependent Claim
20 words
A method according to claim 3, wherein the member to which the high-frequency power is applied is a high-frequency electrode.
Claim 9
Independent Claim
96 words
A system for extracting an electrical signal which is sent from a member applied with a high-frequency wave and which has a lower frequency than the high-frequency power, comprising: a metal container in which a transmitting medium of an electrical signal to be extracted is arranged to be insulated therefrom and which is kept in a DC floating state; insulating means for insulating said metal container from the member to which the high-frequency power is applied; and filter means filtering the electrical signal sent from said transmitting medium to remove a high-frequency component of the signal.
Claim 10
Independent Claim
96 words
A system for extracting an electrical signal which is sent from a member applied with a high-frequency wave and which has a lower frequency than the high-frequency power, comprising: a metal container in which a transmitting medium of an electrical signal to be extracted is arranged to be insulated therefrom and which is kept in a DC floating state; insulating means for insulating said metal container from the member to which the high-frequency power is applied; and filter means filtering the electrical signal sent from said transmitting medium to remove a high-frequency component of the signal.
Claim 11
Dependent Claim
26 words
A system according to claim 7, wherein said signal transmitting medium comprises a temperature detecting element for the member to which the high-frequency power is applied.
Claim 12
Dependent Claim
15 words
A system according to claim 8, wherein said signal transmitting medium comprises a platinum resistor.
Claim 13
Dependent Claim
20 words
A system according to claim 7, wherein the member to which the high-frequency power is applied is a high-frequency electrode.
Claim 14
Independent Claim
81 words
A system for measuring a temperature of a high-frequency electrode of a plasma etching apparatus, comprising: a temperature detecting element for measuring the temperature; a metal container in which said temperature detecting element is arranged to be insulated therefrom and which is kept in a DC floating state; insulating means for insulating said metal container from said high-frequency electrode; and filter means for filtering an electrical signal sent from said temperature detecting element to remove a high-frequency component of the signal.
Claim 15
Independent Claim
81 words
A system for measuring a temperature of a high-frequency electrode of a plasma etching apparatus, comprising: a temperature detecting element for measuring the temperature; a metal container in which said temperature detecting element is arranged to be insulated therefrom and which is kept in a DC floating state; insulating means for insulating said metal container from said high-frequency electrode; and filter means for filtering an electrical signal sent from said temperature detecting element to remove a high-frequency component of the signal.
Claim 16
Dependent Claim
15 words
A system according to claim 11, wherein said temperature detecting element comprises a platinum resistor.
Claim 17
Dependent Claim
22 words
A system according to claim 11, wherein said plasma etching apparatus comprises a magnetron for applying a magnetic field to a plasma.
Claim 18
Dependent Claim
18 words
A system according to claim 11, further comprising temperature controlling means for controlling the temperature of said electrode.
References Cited (Backward Citations)
GB1558470A
Cited
FR2566905A1
Cited
JPS63229716A
Cited
US4956043A
Cited
JPS6425018A
Cited
US4913790A
Cited
US4971653A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-09-15 | 1996-03-16 | 1996-09-15 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-09-15 | 2000-03-16 | 2000-09-15 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-09-15 | 2004-03-16 | 2004-09-15 | $7700.00 | Window Closed / Lapsed |