US5155331A
Expired / Lapsed
US
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Method for cooling a plasma electrode system for an etching apparatus
Assignee: Tokyo Electron Ltd
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Filing: 1990-07-17
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Granted: 1992-10-13
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Expires: 2010-07-17
Abstract
Abstract An etching method comprises the steps of setting a substrate to be processed above the surface of a first electrode opposed to a second electrode within a vacuum container, with a clearance formed between the surface of the first electrode and the substrate, supplying a cooling gas to the electrodes with a predetermined flow rate and a pressure, supplying a process gas into the vacuum container, changing the process gas to a plasma, by applying a predetermined electric power across the electrodes, and etching the substrate by means of the plasma of the process gas.
Inventors
- 👤 Takao Horiuchi
- 👤 Izumi Arai
- 👤 Yoshifumi Tahara
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 15:44
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H01J37/32532; H10; H10P; H10P72/00; H10P72/04; H10P72/0402; H10P72/0418; H10P72/0421; H01J37/32715; H01J37/32724; H01J37/32917; H01J37/32935; H10P50/00; H10P50/20; H10P50/24; H10P50/242
Claims Analysis
Total Claims: 15
Claim 1
Independent Claim
147 words
A method for cooling a plasma electrode system for an etching apparatus, comprising the steps of: holding an object to be processed, above a lower electrode opposed to an upper electrode within a vacuum container, to form a clearance between the lower electrode and the object; attaching said upper electrode to exchange heat with a block electrode; supplying a cooling gas to said clearance formed between the lower electrode and the object; supplying a coolant into said block electrode; controlling at least one of a flow rate or supply pressure of said cooling gas; supplying a process gas into said vacuum container, in order to generate a plasma; and controlling at least one of a flow rate or supply pressure of said coolant in order to detect the change in temperature of said coolant during the process and to decrease the amount of deformation caused by heat.
Claim 2
Independent Claim
147 words
A method for cooling a plasma electrode system for an etching apparatus, comprising the steps of: holding an object to be processed, above a lower electrode opposed to an upper electrode within a vacuum container, to form a clearance between the lower electrode and the object; attaching said upper electrode to exchange heat with a block electrode; supplying a cooling gas to said clearance formed between the lower electrode and the object; supplying a coolant into said block electrode; controlling at least one of a flow rate or supply pressure of said cooling gas; supplying a process gas into said vacuum container, in order to generate a plasma; and controlling at least one of a flow rate or supply pressure of said coolant in order to detect the change in temperature of said coolant during the process and to decrease the amount of deformation caused by heat.
Claim 3
Dependent Claim
38 words
The method according to claim 1, wherein means for holding the object above the lower-electrode with the clearance is a support gas gushed from the inside of the lower electrode towards the vacuum container with a predetermined pressure.
Claim 4
Dependent Claim
26 words
The method according to claim 2, wherein the pressure of the gushed support gas is a little higher than a clamp-driving pressure for clamping the object.
Claim 5
Dependent Claim
23 words
The method according to claim 2, wherein said support gas is gushed only into said clearance between the object and the lower electrode.
Claim 6
Dependent Claim
40 words
The method according to claim 1, further comprising means for controlling the temperature of the further comprising said block electrode, said temperature-controlling means controlling the temperature of said block electrode in accordance with the change in temperature of said coolant.
Claim 7
Dependent Claim
19 words
The method according to claim 1, wherein a flow rate of the cooling gas to said clearance is controlled.
Claim 8
Dependent Claim
25 words
The method according to claim 1, wherein said upper electrode is made of amorphous carbon, and said electrode is made of Al or Al alloy.
Claim 9
Dependent Claim
27 words
The method according to claim 1 wherein said upper electrode is made of the material whose thermal expansion coefficient is different from that of said block electrode.
Claim 10
Dependent Claim
16 words
The method according to claim 1, wherein said upper electrode is screwed on said block electrode.
Claim 11
Dependent Claim
13 words
The method according to claim 1, wherein said cooling gas is helium gas.
Claim 12
Dependent Claim
31 words
The method according to claim 1, wherein said coolant is supplied to a region which is in the vicinity of a connection member between said upper electrode and said block electrode.
Claim 13
Dependent Claim
34 words
The method according to claim 1, wherein said upper electrode has a large number of gas holes in the center thereof, and the periphery of said upper electrode is fixed to said block electrode.
Claim 14
Independent Claim
143 words
A method for cooling a plasma electrode system for an etching apparatus, comprising the steps of: holding an object to be pressed, above a lower electrode opposed to an upper electron within a vacuum container, to form as clearance between the lower electrode and the object; attaching said upper electrode to exchange heat with a block electrode; supplying a cooling gas to said clearance formed between the lower electrode and the object; supplying a coolant into said block electrode; controlling a flow rate or supply pressure of at least one of said cooling gas and said coolant; supplying a process gas into said vacuum container, in order to generate a plasma; and controlling the operation of plasma etching process in order to detect the change in temperature of said coolant during the process and to decrease the amount of deformation caused by heat.
Claim 15
Independent Claim
143 words
A method for cooling a plasma electrode system for an etching apparatus, comprising the steps of: holding an object to be pressed, above a lower electrode opposed to an upper electron within a vacuum container, to form as clearance between the lower electrode and the object; attaching said upper electrode to exchange heat with a block electrode; supplying a cooling gas to said clearance formed between the lower electrode and the object; supplying a coolant into said block electrode; controlling a flow rate or supply pressure of at least one of said cooling gas and said coolant; supplying a process gas into said vacuum container, in order to generate a plasma; and controlling the operation of plasma etching process in order to detect the change in temperature of said coolant during the process and to decrease the amount of deformation caused by heat.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-10-13 | 1996-04-13 | 1996-10-13 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-10-13 | 2000-04-13 | 2000-10-13 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-10-13 | 2004-04-13 | 2004-10-13 | $7700.00 | Window Closed / Lapsed |