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US5159946A Expired / Lapsed US ⏱️ 0.0 years remaining

Over-flow tank for a semiconductor wafer washing apparatus

Assignee: Individual
•
Filing: 1990-05-02
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Granted: 1992-11-03
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Expires: 2010-05-02
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Abstract

Abstract An over-flow tank for a semiconductor wafer washing apparatus includes a pair of opposed extensions integrally formed on a pair of opposed side walls of the tank. One of the extensions is provided with pipes and/or other devices. This form of attachment prevents formation of a stepped portion on which dust may accumulate. The extensions also act to guide the flow of clean air over the tanks, so that vapor formed in a chemical liquid tank in one row of such tanks is prevented from entering a pure water tank in an adjacent row.

Inventors

  • 👤 Aigo Seiichiro

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-06 14:10
CPC Classifications
H; H10; H10P; H10P70/00; H10P72/00; H10P72/04; H10P72/0402; H10P72/0406; H10P72/0411; H10P72/0416; Y; Y10; Y10S; Y10S134/00; Y10S134/902; Y10T; Y10T137/00; Y10T137/8593; Y10T137/86187; Y10T137/86212; Y10T137/86348; Y10T137/86372

Claims Analysis

Total Claims: 9
Claim 1
Independent Claim 161 words
An over-flow tank for use in a semiconductor wafer washing apparatus wherein clean air is forced over the tank to remove vapor formed therein, said over-flow tank comprising: a bottom surface; a first pair of opposed side walls having a first height; a second pair of opposed side walls having the first height, wherein said bottom surface, said first pair of opposed side walls, and said second pair of opposed side walls define a cavity; means for guiding the clean air over the over-flow tank in a direction parallel to said first pair of opposed side walls, said means comprising a pair of vertical extensions formed integrally and coplanar with said first pair of opposed side walls and each extending to a height greater than said first height; and at least one washing tank disposed within said cavity and formed integrally with said bottom surface, wherein said at least one washing tank has a height no greater than said first height.
Claim 2
Dependent Claim 161 words
An over-flow tank for use in a semiconductor wafer washing apparatus wherein clean air is forced over the tank to remove vapor formed therein, said over-flow tank comprising: a bottom surface; a first pair of opposed side walls having a first height; a second pair of opposed side walls having the first height, wherein said bottom surface, said first pair of opposed side walls, and said second pair of opposed side walls define a cavity; means for guiding the clean air over the over-flow tank in a direction parallel to said first pair of opposed side walls, said means comprising a pair of vertical extensions formed integrally and coplanar with said first pair of opposed side walls and each extending to a height greater than said first height; and at least one washing tank disposed within said cavity and formed integrally with said bottom surface, wherein said at least one washing tank has a height no greater than said first height.
Claim 3
Dependent Claim 24 words
An over-flow tank as claimed in claim 1, wherein said pair of vertical extensions both have a second height greater than said first height.
Claim 4
Dependent Claim 28 words
An over-flow tank as claimed in claim 1, wherein one of said pair of vertical extensions is adapted to be provided with hardware including pipes and monitoring devices.
Claim 5
Dependent Claim 16 words
An over-flow tank as claimed in claim 1, wherein said washing tank is made of fluororesin.
Claim 6
Dependent Claim 16 words
An over-flow tank as claimed in claim 1, wherein said washing tank is made of quartz.
Claim 7
Dependent Claim 181 words
A semiconductor wafer washing apparatus adapted to be placed in a clean room having means for forcing clean air onto the washing apparatus, said washing apparatus comprising a plurality of overflow tanks disposed in plural rows, wherein each of the overflow tanks comprises: a bottom surface; a first pair of opposed side walls having a first height; a second pair of opposed side walls having the first height, wherein said bottom surface, said first pair of opposed side walls, and said second pair of opposed side walls define a cavity adapted to hold a washing tank; and means for guiding the clean air over the over-flow tank in a direction parallel to said first pair of opposed side walls, said means comprising a pair of vertical extensions formed integrally and coplanar with said first pair of opposed side walls and each extending to a height greater than said first height; wherein the means for guiding the clean air of each over-flow tank in one of said plural rows are aligned so as to guide the clean air in a single direction.
Claim 8
Dependent Claim 181 words
A semiconductor wafer washing apparatus adapted to be placed in a clean room having means for forcing clean air onto the washing apparatus, said washing apparatus comprising a plurality of overflow tanks disposed in plural rows, wherein each of the overflow tanks comprises: a bottom surface; a first pair of opposed side walls having a first height; a second pair of opposed side walls having the first height, wherein said bottom surface, said first pair of opposed side walls, and said second pair of opposed side walls define a cavity adapted to hold a washing tank; and means for guiding the clean air over the over-flow tank in a direction parallel to said first pair of opposed side walls, said means comprising a pair of vertical extensions formed integrally and coplanar with said first pair of opposed side walls and each extending to a height greater than said first height; wherein the means for guiding the clean air of each over-flow tank in one of said plural rows are aligned so as to guide the clean air in a single direction.
Claim 9
Dependent Claim 19 words
An over-flow tank as claimed in claim 1, including a pair of said washing tanks disposed within said cavity.

References Cited (Backward Citations)

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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1995-11-03 1996-05-04 1996-11-03 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1999-11-03 2000-05-04 2000-11-03 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2003-11-03 2004-05-04 2004-11-03 $7700.00 Window Closed / Lapsed

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