← Back to Patent Explorer
US5221450A Expired / Lapsed US ⏱️ 0.0 years remaining

Electrostatic chucking method

Assignee: Toshiba Corp
•
Filing: 1991-08-06
•
Granted: 1993-06-22
•
Expires: 2011-08-06
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract Disclosed is an electrostatic chucking method, comprising the steps of: (a) placing a substrate to be chucked electrostatically on a chucking material containing an electrode; (b) chucking the substrate to the chucking material by supplying a predetermined electrical potential to the electrode in the chucking material; (c) removing the substrate from the chucking material; and (d) eliminating residual charges on the chucking material by sputtering it with a plasma gas for a predetermined period. Further, the plasma gas may be capable of etching the chucking material.

Inventors

  • 👤 Kei Hattori
  • 👤 Makoto Sekine

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-29 18:34
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H01J37/32798; H01J37/32853; H01J37/32862; H10; H10P; H10P72/00; H10P72/70; H10P72/72; H10P72/722; H01J2237/00; H01J2237/004; H01J2237/0041; H01J2237/0044; H01J2237/0047; H01J2237/20; H01J2237/2007

Claims Analysis

Total Claims: 6
Claim 1
Independent Claim 73 words
An electrostatic chucking method, comprising the steps of: (a) placing a substrate to be chucked electrostatically on a chucking material containing an electrode therein; (b) chucking the substrate to the chucking material by supplying a predetermined electrical potential to the electrode in the chucking material; (c) removing the substrate from the chucking material; and (d) eliminating residual charges on the chucking material by sputtering it with a plasma gas for a predetermined period.
Claim 2
Dependent Claim 73 words
An electrostatic chucking method, comprising the steps of: (a) placing a substrate to be chucked electrostatically on a chucking material containing an electrode therein; (b) chucking the substrate to the chucking material by supplying a predetermined electrical potential to the electrode in the chucking material; (c) removing the substrate from the chucking material; and (d) eliminating residual charges on the chucking material by sputtering it with a plasma gas for a predetermined period.
Claim 3
Dependent Claim 23 words
An electrostatic chucking method according to claim 1, wherein the chucking material is an insulator, and the plasma gas is N 2 gas.
Claim 4
Dependent Claim 80 words
An electrostatic chucking method, comprising the steps of: (a) placing a substrate to be chucked on a chucking material containing an electrode therein; (b) chucking the substrate to the chucking material by supplying a predetermined electrical potential to the electrode in the chucking material; (c) removing the substrate from the chucking material; and (d) eliminating residual charges on the chucking material by sputtering it for a predetermined period with a plasma gas which is capable of etching the chucking material.
Claim 5
Dependent Claim 80 words
An electrostatic chucking method, comprising the steps of: (a) placing a substrate to be chucked on a chucking material containing an electrode therein; (b) chucking the substrate to the chucking material by supplying a predetermined electrical potential to the electrode in the chucking material; (c) removing the substrate from the chucking material; and (d) eliminating residual charges on the chucking material by sputtering it for a predetermined period with a plasma gas which is capable of etching the chucking material.
Claim 6
Dependent Claim 24 words
An electrostatic chucking method according to claim 3, wherein the chucking material is an insulator, and the plasma gas is a halogen containing gas.

References Cited (Backward Citations)

US4384918A Cited
US4399016A Cited
JPS59181622A Cited
EP0260150A2 Cited
US5092729A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1996-06-21 1996-12-21 1997-06-22 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2000-06-21 2000-12-21 2001-06-22 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2004-06-21 2004-12-21 2005-06-22 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag