US5255153A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Electrostatic chuck and plasma apparatus equipped therewith
Assignee: Toshiba Corp
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Filing: 1991-07-17
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Granted: 1993-10-19
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Expires: 2011-07-17
Abstract
Abstract An electrostatic chuck having an electrostatic holding member arranged on an upper surface of the chuck main body for holding a semiconductor device during a plasma etching process. The electrostatic holding member includes a pair of insulating polyimide members and a conductive member interposed between the polyimide members. In operation, a voltage is applied to the first conductive member in order to generate static electricity to be applied to the electrostatic holding member for holding the semiconductor device.
Inventors
- 👤 Toshihisa Nozawa
- 👤 Junichi Arami
- 👤 Isahiro Hasegawa
- 👤 Katsuya Okumura
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 05:33
CPC Classifications
H; H05; H05H; H05H1/00; H05H1/02; H05H1/03; H10; H10P; H10P72/00; H10P72/70; H10P72/72; H10P72/722; H02; H02N; H02N13/00
Claims Analysis
Total Claims: 18
Claim 1
Independent Claim
91 words
An electrostatic chuck comprising: a chuck main body; an electrostatic adsorption member arranged on an upper surface of the chuck main body, and having a first conductive member and a first insulating member covering the first conductive member; a power supply member arranged through the chuck main body, and having a second conductive member electrically connected to the first conductive member, and a second insulating member covering the second conductive member; and means for applying a voltage to the first conductive member via the second conductive member, thereby generating static electricity.
Claim 2
Dependent Claim
91 words
An electrostatic chuck comprising: a chuck main body; an electrostatic adsorption member arranged on an upper surface of the chuck main body, and having a first conductive member and a first insulating member covering the first conductive member; a power supply member arranged through the chuck main body, and having a second conductive member electrically connected to the first conductive member, and a second insulating member covering the second conductive member; and means for applying a voltage to the first conductive member via the second conductive member, thereby generating static electricity.
Claim 3
Dependent Claim
81 words
The electrostatic chuck according to claim 1, wherein the power supply member has a bent end portion, and the chuck main body has a depression receiving the bent end portion such that the bent end portion is in the same level as that of the upper surface of the chuck main body, and a slit opening continuous with the depression, extending through the chuck main body in a thickness direction thereof, and receiving a central of portion the power supply member.
Claim 4
Dependent Claim
17 words
The electrostatic chuck according to claim 1, wherein the electrostatic adsorption member has gas inlets formed therethrough.
Claim 5
Dependent Claim
27 words
The electrostatic chuck according to claim 3, wherein the chuck main body has a gas supply hole for guiding a heat transfer gas to the gas inlets.
Claim 6
Dependent Claim
26 words
The electrostatic chuck according to claim 1, wherein the electrostatic adsorption member has an annular groove formed in a peripheral portion of an upper surface thereof.
Claim 7
Dependent Claim
24 words
The electrostatic chuck according to claim 5, wherein the annular groove is formed 10-15 mm inside of the edge of the electrostatic adsorption member.
Claim 8
Dependent Claim
20 words
The electrostatic chuck according to claim 1, wherein the insulating member of the electrostatic adsorption member is made of polyimide.
Claim 9
Dependent Claim
20 words
The electrostatic chuck according to claim 1, wherein the insulating member of the electrostatic adsorption member is made of ceramic.
Claim 10
Dependent Claim
131 words
A plasma apparatus comprising: a chamber having a first electrode; means for reducing the pressure in the chamber; means for supplying a gas into that portion of the chamber in which plasma occurs; an electrostatic chuck including a second electrode for cooperating with the first electrode to create plasma, an electrostatic adsorption member arranged on an upper surface of the second electrode and having a first conductive member and a first insulating member covering the first conductive member, and a power supply member arranged through the second electrode and having a second conductive member electrically connected to the first conductive member and a second insulating member covering the second conductive member; and means for applying a voltage to the first conductive member via the second conductive member, thereby generating static electricity.
Claim 11
Dependent Claim
131 words
A plasma apparatus comprising: a chamber having a first electrode; means for reducing the pressure in the chamber; means for supplying a gas into that portion of the chamber in which plasma occurs; an electrostatic chuck including a second electrode for cooperating with the first electrode to create plasma, an electrostatic adsorption member arranged on an upper surface of the second electrode and having a first conductive member and a first insulating member covering the first conductive member, and a power supply member arranged through the second electrode and having a second conductive member electrically connected to the first conductive member and a second insulating member covering the second conductive member; and means for applying a voltage to the first conductive member via the second conductive member, thereby generating static electricity.
Claim 12
Dependent Claim
80 words
The plasma apparatus according to claim 9, wherein the second electrode has a depression receiving an end portion of the power supply member such that the end portion is in the same level as that of the surface of the second electrode, and a slit opening in the upper surface of the second electrode in a manner continuous with the depression, extending through the second electrode in a thickness direction thereof, and receiving a central portion of the second electrode.
Claim 13
Dependent Claim
17 words
The plasma apparatus according to claim 9, wherein the electrostatic adsorption member has gas inlets formed therethrough.
Claim 14
Dependent Claim
20 words
The plasma apparatus according to claim 11, further comprising means for guiding a heat transfer gas to the gas inlets.
Claim 15
Dependent Claim
26 words
The plasma apparatus according to claim 9, wherein the electrostatic adsorption member has an annular groove formed in a peripheral portion of an upper surface thereof.
Claim 16
Dependent Claim
24 words
The plasma apparatus according to claim 13, wherein the annular groove is formed 10-15 mm inside of the edge of the electrostatic adsorption member.
Claim 17
Dependent Claim
20 words
The plasma apparatus according to claim 9, wherein the insulating member of the electrostatic adsorption member is made of polyimide.
Claim 18
Dependent Claim
20 words
The plasma apparatus according to claim 9, wherein the insulating member of the electrostatic adsorption member is made of ceramic.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1996-10-18 | 1997-04-19 | 1997-10-19 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2000-10-18 | 2001-04-19 | 2001-10-19 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2004-10-18 | 2005-04-19 | 2005-10-19 | $7700.00 | Window Closed / Lapsed |