US5365342A
Expired / Lapsed
US
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Alignment and exposure apparatus and method for manufacture of integrated circuits
Assignee: Canon Inc
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Filing: 1993-03-10
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Granted: 1994-11-15
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Expires: 2013-03-10
Abstract
Abstract An alignment apparatus includes a first off-axis alignment optical system having a magnification, and a second off-axis alignment optical system having a magnification higher than that of the first off-axis alignment optical system, wherein the apparatus is operable in a global alignment mode using the second off-axis alignment optical system. In another aspect, an alignment apparatus which includes a first off-axis alignment optical system having a magnification, a second off-axis alignment optical system having a magnification higher than that of the first off-axis alignment optical system, and a TTL alignment optical system, wherein the alignment apparatus is operable in a global alignment mode using the second off-axis alignment optical system and is operable in another global alignment mode using the TTL optical alignment system.
Inventors
- 👤 Naoki Ayata
- 👤 Mitsugu Yamamura
- 👤 Bunei Hamasaki
- 👤 Masao Kosugi
- 👤 Kazuo Takahashi
- 👤 Mitsuaki Seki
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 03:21
CPC Classifications
G; G03; G03F; G03F9/00; G03F9/70; G03F9/7088; G03F7/00; G03F7/70; G03F7/70058; G03F7/70691; G03F7/70716; G03F7/70725; G03F9/7003; G03F9/7023; G03F9/7049; G03F9/7053; G03F9/7057; H; H10; H10P; H10P95/00
Claims Analysis
Total Claims: 27
Claim 1
Independent Claim
185 words
An exposure apparatus for exposing different zones of a workpiece to a pattern of an original with radiation, in a predetermined sequence, said apparatus comprising: first driving means for moving the workpiece along two orthogonal directions, relative to the original, to allow sequential exposures of the zones of the workpiece to the pattern of the original; detecting means for detecting an alignment mark of the original and for detecting alignment marks of particular zones of the workpiece through the original to determine a positional relationship of the workpiece with respect to the original, wherein said detecting means is effective to determine an overall rotational error of the workpiece with respect to the original; second driving means for moving the workpiece relative to the original in a rotational direction in accordance with the determined overall rotational error of the workpiece; and control means for controlling said first driving means when said first driving means moves the workpiece in said two orthogonal directions for the sequential exposure of the different zones of the workpiece, to substantially eliminate any remainder of the overall rotational error of the workpiece.
Claim 2
Dependent Claim
185 words
An exposure apparatus for exposing different zones of a workpiece to a pattern of an original with radiation, in a predetermined sequence, said apparatus comprising: first driving means for moving the workpiece along two orthogonal directions, relative to the original, to allow sequential exposures of the zones of the workpiece to the pattern of the original; detecting means for detecting an alignment mark of the original and for detecting alignment marks of particular zones of the workpiece through the original to determine a positional relationship of the workpiece with respect to the original, wherein said detecting means is effective to determine an overall rotational error of the workpiece with respect to the original; second driving means for moving the workpiece relative to the original in a rotational direction in accordance with the determined overall rotational error of the workpiece; and control means for controlling said first driving means when said first driving means moves the workpiece in said two orthogonal directions for the sequential exposure of the different zones of the workpiece, to substantially eliminate any remainder of the overall rotational error of the workpiece.
Claim 3
Dependent Claim
46 words
An apparatus according to claim 1, further comprising a projection optical system for projecting the pattern of the original onto the workpiece, wherein said detecting means detects the alignment mark of the original and the alignment marks of the workpiece by using said projection optical system.
Claim 4
Dependent Claim
202 words
An alignment method usable in an exposure apparatus for exposing different zones of a workpiece to a pattern of an original with radiation, in a predetermined sequence, while moving the workpiece along two orthogonal directions, relative to the original, to allow sequential exposure of the zones of the workpiece to the pattern of the original, said method comprising the steps of: detecting an alignment mark of the original and detecting alignment marks of particular zones of the workpiece through the original to determine a positional error of each of the particular zones of the workpiece with respect to the original and also to determine an overall rotational error of the workpiece with respect to the original; moving the workpiece relative to the original in a rotational direction in accordance with the determined overall rotational error of the workpiece; and controlling, when the workpiece is moved in the two orthogonal directions for the sequential exposure of the different zones of the workpiece, the movement of the workpiece in the two orthogonal directions so as to substantially eliminate the positional error of each of the particular zones of the workpiece and to substantially eliminate any remainder of the overall rotational error of the workpiece.
Claim 5
Dependent Claim
202 words
An alignment method usable in an exposure apparatus for exposing different zones of a workpiece to a pattern of an original with radiation, in a predetermined sequence, while moving the workpiece along two orthogonal directions, relative to the original, to allow sequential exposure of the zones of the workpiece to the pattern of the original, said method comprising the steps of: detecting an alignment mark of the original and detecting alignment marks of particular zones of the workpiece through the original to determine a positional error of each of the particular zones of the workpiece with respect to the original and also to determine an overall rotational error of the workpiece with respect to the original; moving the workpiece relative to the original in a rotational direction in accordance with the determined overall rotational error of the workpiece; and controlling, when the workpiece is moved in the two orthogonal directions for the sequential exposure of the different zones of the workpiece, the movement of the workpiece in the two orthogonal directions so as to substantially eliminate the positional error of each of the particular zones of the workpiece and to substantially eliminate any remainder of the overall rotational error of the workpiece.
Claim 6
Dependent Claim
231 words
An alignment method usable in an exposure apparatus for exposing different zones of a workpiece to a pattern of an original with radiation, in a predetermined sequence, while moving the workpiece along two orthogonal directions, relative to the original, to allow sequential exposure of the zones of the workpiece to the pattern of the original, said method comprising the steps of: setting the original on a first stage of the exposure apparatus, by using a setting mark provided on the original; setting the workpiece on a second stage of the exposure apparatus, by using a pre-alignment mark provided on the workpiece; detecting an alignment mark of the original and detecting alignment marks of particular zones of the workpiece through the original to determine a positional error of each of the particular zones of the workpiece with respect to the original and also to determine an overall rotational error of the workpiece with respect to the original; moving the workpiece relative to the original in a rotational direction in accordance with the determined overall rotational error of the workpiece; and moving the second stage in the two orthogonal directions for the sequential exposure of the different zones of the workpiece so as to substantially eliminate the positional error of each of the particular zones of the workpiece and also to substantially eliminate any remainder of the overall rotational error of the workpiece.
Claim 7
Dependent Claim
231 words
An alignment method usable in an exposure apparatus for exposing different zones of a workpiece to a pattern of an original with radiation, in a predetermined sequence, while moving the workpiece along two orthogonal directions, relative to the original, to allow sequential exposure of the zones of the workpiece to the pattern of the original, said method comprising the steps of: setting the original on a first stage of the exposure apparatus, by using a setting mark provided on the original; setting the workpiece on a second stage of the exposure apparatus, by using a pre-alignment mark provided on the workpiece; detecting an alignment mark of the original and detecting alignment marks of particular zones of the workpiece through the original to determine a positional error of each of the particular zones of the workpiece with respect to the original and also to determine an overall rotational error of the workpiece with respect to the original; moving the workpiece relative to the original in a rotational direction in accordance with the determined overall rotational error of the workpiece; and moving the second stage in the two orthogonal directions for the sequential exposure of the different zones of the workpiece so as to substantially eliminate the positional error of each of the particular zones of the workpiece and also to substantially eliminate any remainder of the overall rotational error of the workpiece.
Claim 8
Dependent Claim
86 words
A method according to claim 4, wherein the exposure apparatus includes a projection lens system for projecting the pattern of the original to the workpiece, and wherein said original setting step comprises the step of setting the original while using the projection lens system as a reference, and wherein said detecting step comprises the step of detecting the alignment mark of the original and the alignment marks of the workpiece through the projection lens system for a determination of the overall rotational error of the workpiece.
Claim 9
Dependent Claim
47 words
A method according to claim 5, wherein the exposure apparatus further includes an off-axis optical system, and wherein said method further comprises the step of detecting the pre-alignment mark of the workpiece through the off-axis optical system for the setting of the workpiece on the second stage.
Claim 10
Dependent Claim
49 words
A method according to claim 6, wherein the exposure apparatus includes a laser interferometer for measuring the position of the second stage in the orthogonal directions, and wherein said second stage moving step comprises the step of controlling the movement of the second stage by using the laser interferometer.
Claim 11
Dependent Claim
118 words
A semiconductor device manufacturing method usable with a workpiece having different zones, comprising the steps of: detecting positional errors of at least two zones, respectively, with respect to a reference mark, by using respective alignment marks of said at least two zones; calculating an overall rotational error of the workpiece in a θ direction, by using the detected positional errors; rotationally moving the workpiece in the θ direction to substantially correct the overall rotational error; and printing, after said rotational moving step, a pattern of an original on each zone of the workpiece while controlling movement of the workpiece in X and Y directions so as to correct any remainder of the overall rotational error of the workpiece.
Claim 12
Dependent Claim
118 words
A semiconductor device manufacturing method usable with a workpiece having different zones, comprising the steps of: detecting positional errors of at least two zones, respectively, with respect to a reference mark, by using respective alignment marks of said at least two zones; calculating an overall rotational error of the workpiece in a θ direction, by using the detected positional errors; rotationally moving the workpiece in the θ direction to substantially correct the overall rotational error; and printing, after said rotational moving step, a pattern of an original on each zone of the workpiece while controlling movement of the workpiece in X and Y directions so as to correct any remainder of the overall rotational error of the workpiece.
Claim 13
Dependent Claim
51 words
A method according to claim 8, wherein said method further comprises the step, prior to said detecting step, of adjusting the position of the original by using a set mark provided on the original while the position of the workpiece is adjusted by using a prealignment mark provided on the workpiece.
Claim 14
Dependent Claim
45 words
A method according to claim 9, wherein said printing step comprises the step of printing the pattern of the original on each zone of the workpiece through a projection lens system and, with respect to the projection lens system, adjusting the position of the original.
Claim 15
Dependent Claim
29 words
A method according to claim 10, further comprising the step of detecting the prealignment mark of the workpiece through a detection optical system different from the projection lens system.
Claim 16
Dependent Claim
39 words
A method according to claim 11, wherein said controlling movement of the workpiece step comprises the step of controlling the movement of the workpiece in the X and Y directions on the basis of measurement through a laser interferometer.
Claim 17
Dependent Claim
120 words
An exposure apparatus usable with a workpiece having different zones, comprising: detecting means for detecting positional errors of at least two zones, respectively, with respect to a reference mark, by using respective alignment marks provided in these zones; processing means for determining an overall rotational error of the workpiece in a θ direction, by using the detected positional errors; driving means for rotationally moving the workpiece in the θ direction to substantially correct the overall rotational error; and X-Y stage means for moving the workpiece in X and Y directions, when a pattern of an original is to be printed on each zone of the workpiece, so as to correct any remainder of the overall rotational error of the workpiece.
Claim 18
Dependent Claim
120 words
An exposure apparatus usable with a workpiece having different zones, comprising: detecting means for detecting positional errors of at least two zones, respectively, with respect to a reference mark, by using respective alignment marks provided in these zones; processing means for determining an overall rotational error of the workpiece in a θ direction, by using the detected positional errors; driving means for rotationally moving the workpiece in the θ direction to substantially correct the overall rotational error; and X-Y stage means for moving the workpiece in X and Y directions, when a pattern of an original is to be printed on each zone of the workpiece, so as to correct any remainder of the overall rotational error of the workpiece.
Claim 19
Dependent Claim
37 words
An apparatus according to claim 13, further comprising a projection lens system for projecting the pattern of the original on the workpiece, wherein the position of the original is adjusted with respect to said projection lens system.
Claim 20
Dependent Claim
27 words
An apparatus according to claim 14, further comprising an off-axis optical system different from said projection lens system, for detecting a prealignment mark provided on the workpiece.
Claim 21
Dependent Claim
50 words
An apparatus according to claim 15, further comprising a laser interferometer for measuring the position of the workpiece with respect to the X and Y directions, wherein the movement of the workpiece in the X and Y directions is controlled on the basis of the measurement through said laser interferometer.
Claim 22
Dependent Claim
115 words
An exposure method for exposing a workpiece having different zones, comprising the steps of: detecting positional errors of at least two zones, respectively, with respect to a reference mark, by using respective alignment marks of at least two zones; determining an overall rotational error of the workpiece in a θ direction, by using the detected positional errors; rotationally moving the workpiece in the θ direction to substantially correct the overall rotational error; and printing, after said rotational moving step, a pattern of an original on each zone of the workpiece while controlling movement of the workpiece in X and Y directions so as to correct any remainder of the overall rotational error of the workpiece.
Claim 23
Dependent Claim
115 words
An exposure method for exposing a workpiece having different zones, comprising the steps of: detecting positional errors of at least two zones, respectively, with respect to a reference mark, by using respective alignment marks of at least two zones; determining an overall rotational error of the workpiece in a θ direction, by using the detected positional errors; rotationally moving the workpiece in the θ direction to substantially correct the overall rotational error; and printing, after said rotational moving step, a pattern of an original on each zone of the workpiece while controlling movement of the workpiece in X and Y directions so as to correct any remainder of the overall rotational error of the workpiece.
Claim 24
Dependent Claim
51 words
A method according to claim 17, wherein said method further comprises the step of adjusting, prior to said detecting step, the position of the original by using a set mark provided on the original while the position of the workpiece is adjusted by using a prealignment mark provided on the workpiece.
Claim 25
Dependent Claim
46 words
A method according to claim 18, wherein said printing step comprises the step of printing the pattern of the original on each zone of the workpiece through a projection lens system and wherein, with respect to the projection lens system, adjusting the position of the original.
Claim 26
Dependent Claim
29 words
A method according to claim 19, further comprising the step of detecting the prealignment mark of the workpiece through a detection optical system different from the projection lens system.
Claim 27
Dependent Claim
39 words
A method according to claim 20, wherein said controlling movement of the workpiece step comprises the step of controlling the movement of the workpiece in the X and Y directions on the basis of measurement through a laser interferometer.
References Cited (Backward Citations)
US4153371A
Cited
US4629313A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 1997-11-14 | 1998-05-16 | 1998-11-15 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-11-14 | 2002-05-16 | 2002-11-15 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-11-14 | 2006-05-16 | 2006-11-15 | $7700.00 | Window Closed / Lapsed |