US5425848A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of providing a patterned relief of cured photoresist on a flat substrate surface and device for carrying out such a method
Assignee: US Philips Corp
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Filing: 1994-03-15
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Granted: 1995-06-20
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Expires: 2014-03-15
Abstract
Abstract A description is given of a method and a device (1) for providing (replicating) a patterned resyntetic resin relief (37) on the surface (25) of a glass substrate (27). For this purpose, a UV-curable acrylate lacquer (33) is applied to the surface (25), after which a transparent mould (3) having a relief (13) is rolled-off over the surface (25). By means of a UV light source (17) and an elliptic mirror (21), the lacquer is cured at the location of the focal line (23), thereby forming said relief (37). The relief (13) of the mould (3) is replicated on the glass substrate (27). The method described enables a relief of small dimensions (10×10 μm) to be seamlessly provided on a large fiat surface (1×1 m), without being hindered by large release forces.
Inventors
- 👤 Jan Haisma
- 👤 Martinus Verheijen
- 👤 Johannes T. Schrama
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 13:58
CPC Classifications
B; B29; B29C; B29C43/00; B29C43/003; B29C35/00; B29C35/02; B29C35/08; B29C35/0888; B29C35/10; B29C39/00; B29C39/14; B29C39/148; G; G03; G03F; G03F7/00; G03F7/0002; G03F7/20; G03F7/2002; G03F7/2012; B29C35/0805; B29C2035/0827; B29C43/02; B29C43/021; B29C2043/023; B29C2043/025
Claims Analysis
Total Claims: 26
Claim 1
Independent Claim
215 words
A method of providing a patterned relief of cured photoresist on a flat substrate surface, the substrate surface being provided with a layer of a UV-light curable liquid photoresist, after which the photoresist is brought into contact with a UV light-transparent mould having a relief which is complementary to the patterned relief to be provided and which is subsequently cured by exposure to a UV light source, thereby forming the patterned relief, after which the mould of the cured relief is removed, characterized in that a hollow circular-cylindrical mould which rotates about its cylinder axis is used as the mould, the outside of the cylinder surface being provided with the relief and the cylinder axis extending parallel to the substrate surface, the interior of the mould being provided with an elliptic mirror having a first and a second focal line, said focal lines extending parallel to the substrate surface and the first focal line coincided with the longitudinal axis of the UV light source, and the second focal line coinciding with a tangent of the mould to the substrate surface, so that the photoresist is cured at the location of the second focal line, thereby forming a part of the patterned relief, while the substrate surface is kept in non-slip contact with the rotating mould.
Claim 2
Independent Claim
215 words
A method of providing a patterned relief of cured photoresist on a flat substrate surface, the substrate surface being provided with a layer of a UV-light curable liquid photoresist, after which the photoresist is brought into contact with a UV light-transparent mould having a relief which is complementary to the patterned relief to be provided and which is subsequently cured by exposure to a UV light source, thereby forming the patterned relief, after which the mould of the cured relief is removed, characterized in that a hollow circular-cylindrical mould which rotates about its cylinder axis is used as the mould, the outside of the cylinder surface being provided with the relief and the cylinder axis extending parallel to the substrate surface, the interior of the mould being provided with an elliptic mirror having a first and a second focal line, said focal lines extending parallel to the substrate surface and the first focal line coincided with the longitudinal axis of the UV light source, and the second focal line coinciding with a tangent of the mould to the substrate surface, so that the photoresist is cured at the location of the second focal line, thereby forming a part of the patterned relief, while the substrate surface is kept in non-slip contact with the rotating mould.
Claim 3
Dependent Claim
29 words
A method as claimed in claim 1, characterized in that the mould is formed from material having a linear coefficient of thermal expansion of maximally 10 -6 /° C.
Claim 4
Dependent Claim
31 words
A method as claimed in claim 2, characterized in that the material of the mould is formed from fused silica, a glass ceramic or glass having a low coefficient of expansion.
Claim 5
Dependent Claim
16 words
A method as claimed in claim 1, characterized in that the mould makes one complete rotation.
Claim 6
Dependent Claim
18 words
A method as claimed in claim 1, characterized in that the mould is provided with a release agent.
Claim 7
Dependent Claim
20 words
A method as claimed in claim 1, characterized in that the substrate is provided with an adhesion promotor for photoresist.
Claim 8
Dependent Claim
23 words
A method as claimed in claim 1, characterized in that a passive plate of a liquid-crystal display device is used as the substrate.
Claim 9
Independent Claim
138 words
A device for providing a patterned relief of cured photoresist on a flat surface of a substrate, comprising a hollow circle-cylindrical, UV-light-transparent mould which can be rotated about its cylinder axis, the outside of the cylinder surface being provided with a relief which is complementary to the patterned relief to be provided, the interior of the mould being provided with at least one UV light source as well as means for focusing the UV light to a line extending parallel to the cylinder axis and coinciding with the relief, and the device also comprising a substrate carrier having means for securing the substrate and the closely contacting, at least during exposure, the substrate surface and the rotatable mould, in such a manner that the substrate surface and the mould can be rolled off with respect to each other.
Claim 10
Independent Claim
138 words
A device for providing a patterned relief of cured photoresist on a flat surface of a substrate, comprising a hollow circle-cylindrical, UV-light-transparent mould which can be rotated about its cylinder axis, the outside of the cylinder surface being provided with a relief which is complementary to the patterned relief to be provided, the interior of the mould being provided with at least one UV light source as well as means for focusing the UV light to a line extending parallel to the cylinder axis and coinciding with the relief, and the device also comprising a substrate carrier having means for securing the substrate and the closely contacting, at least during exposure, the substrate surface and the rotatable mould, in such a manner that the substrate surface and the mould can be rolled off with respect to each other.
Claim 11
Dependent Claim
19 words
A device as claimed in claim 8, in which the means for focusing UV light comprise an elliptic mirror.
Claim 12
Dependent Claim
32 words
A device as claimed in claim 8, in which the means for securing the substrate consists of channel-formed apertures in the substrate carrier, which apertures are in communication with a vacuum pomp.
Claim 13
Dependent Claim
16 words
A method as claimed in claim 2, characterized in that the mould makes one complete rotation.
Claim 14
Dependent Claim
16 words
A method as claimed in claim 3, characterized in that the mould makes one complete rotation.
Claim 15
Dependent Claim
18 words
A method as claimed in claim 2, characterized in that the mould is provided with a release agent.
Claim 16
Dependent Claim
18 words
A method as claimed in claim 3, characterized in that the mould is provided with a release agent.
Claim 17
Dependent Claim
18 words
A method as claimed in claim 4, characterized in that the mould is provided with a release agent.
Claim 18
Dependent Claim
20 words
A method as claimed in claim 2, characterized in that the substrate is provided with an adhesion promotor for photoresist.
Claim 19
Dependent Claim
20 words
A method as claimed in claim 3, characterized in that the substrate is provided with an adhesion promotor for photoresist.
Claim 20
Dependent Claim
20 words
A method as claimed in claim 4, characterized in that the substrate is provided with an adhesion promotor for photoresist.
Claim 21
Dependent Claim
20 words
A method as claimed in claim 5, characterized in that the substrate is provided with an adhesion promotor for photoresist.
Claim 22
Dependent Claim
24 words
A method as claimed in any claim 2, characterized in that a passive plate of a liquid-crystal display device is used as the substrate.
Claim 23
Dependent Claim
24 words
A method as claimed in any claim 3, characterized in that a passive plate of a liquid-crystal display device is used as the substrate.
Claim 24
Dependent Claim
24 words
A method as claimed in any claim 4, characterized in that a passive plate of a liquid-crystal display device is used as the substrate.
Claim 25
Dependent Claim
24 words
A method as claimed in any claim 5, characterized in that a passive plate of a liquid-crystal display device is used as the substrate.
Claim 26
Dependent Claim
24 words
A method as claimed in any claim 6, characterized in that a passive plate of a liquid-crystal display device is used as the substrate.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1998-06-19 | 1998-12-19 | 1999-06-20 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-06-19 | 2002-12-19 | 2003-06-20 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-06-19 | 2006-12-19 | 2007-06-20 | $7700.00 | Window Closed / Lapsed |