Claims Analysis
Total Claims: 20
Claim 1
Independent Claim
174 words
A method for making a VCSEL with an integrated heat sink comprising the steps of: providing a substrate having a surface with a first stack of distributed Bragg reflectors, a first cladding region, an active region, a second cladding region, a second stack of distributed Bragg reflectors, and a contact region; forming a mesa with a surface and a trench, wherein said trench extends from said contact region into a portion of said second stack of distributed Bragg reflectors, and wherein said trench is adjacent to a portion of said mesa; forming a first dielectric layer overlying said substrate and covering a portion of said trench with a portion of said contact region being exposed; forming a conductive layer overlying said substrate; forming a seed layer having a pattern, said pattern of said seed layer having an opening on said mesa exposing a portion of said conductive layer; and plating a metal selectively on said seed layer generating a layer on said seed layer for removal of heat, thereby generating an integrated heat sink.
Claim 2
Independent Claim
174 words
A method for making a VCSEL with an integrated heat sink comprising the steps of: providing a substrate having a surface with a first stack of distributed Bragg reflectors, a first cladding region, an active region, a second cladding region, a second stack of distributed Bragg reflectors, and a contact region; forming a mesa with a surface and a trench, wherein said trench extends from said contact region into a portion of said second stack of distributed Bragg reflectors, and wherein said trench is adjacent to a portion of said mesa; forming a first dielectric layer overlying said substrate and covering a portion of said trench with a portion of said contact region being exposed; forming a conductive layer overlying said substrate; forming a seed layer having a pattern, said pattern of said seed layer having an opening on said mesa exposing a portion of said conductive layer; and plating a metal selectively on said seed layer generating a layer on said seed layer for removal of heat, thereby generating an integrated heat sink.
Claim 3
Dependent Claim
70 words
A method for making a VCSEL with an integrated heat sink as claimed in claim 1 where, in the step of providing a substrate having a surface with a first stack of distributed Bragg reflectors, a first cladding region, an active region, a second cladding region, a second stack of distributed Bragg reflectors, and a contact region disposed thereon, the contact region is provided by including depositing a titanium/tungsten layer.
Claim 4
Dependent Claim
45 words
A method for making a VCSEL with an integrated heat sink as claimed in claim 1 where, in the step of forming a mesa with a surface and a trench, said mesa with said surface and said trench are formed by a dry etch process.
Claim 5
Dependent Claim
34 words
A method for making a VCSEL with an integrated heat sink as claimed in claim 1 where, in the step of forming a seed layer, the seed layer is formed by a deposition process.
Claim 6
Dependent Claim
50 words
A method for making a VCSEL with an integrated heat sink as claimed in claim 1 where, prior to the step of forming a first dielectric layer overlying said substrate and cover a portion of said trench, the step of forming a current confinement region in said trench is performed.
Claim 7
Dependent Claim
48 words
A method for making a VCSEL with an integrated heat sink as claimed in claim 5 where, in the step of forming a current confinement region, the current confinement region is fabricated by changing structural integrity of a portion of the second stack of the distributed Bragg reflectors.
Claim 8
Dependent Claim
35 words
A method for making a VCSEL with an integrated heat sink as claimed in claim 5 where, in the step of forming a current confinement region, the current confinement region is fabricated by ion implantation.
Claim 9
Independent Claim
233 words
A method for making a VCSEL having a heat sink comprising the steps of: providing a substrate having a surface with a first stack of distributed Bragg reflectors, a first cladding region, an active region, a second cladding region, a second stack of distributed Bragg reflectors, and a contact region having a ohmic metal layer disposed thereon; forming a masking layer with a pattern on the ohmic metal layer, wherein the pattern exposes portions of the ohmic metal layer while covering other portions of the ohmic metal layer; transferring the pattern into the ohmic metal layer and into the second stack of distributed Bragg reflectors to form a mesa having a surface; forming a dielectric layer on the substrate covering the surface of the mesa and the masking layer; forming a layer on the dielectric layer, the layer exposing the dielectric layer on the mesa; etching the dielectric layer exposed on the mesa, thereby removing the dielectric layer on the mesa and exposing the ohmic metal layer on the mesa; forming a second dielectric layer on the surface of the mesa; forming a metal layer on the dielectric layer and on the second dielectric layer; forming a seed layer having a pattern, the pattern of the seed layer forming an opening on a portion of the second dielectric layer; and plating a second metal selectively on the seed layer, thereby generating a VCSEL.
Claim 10
Independent Claim
233 words
A method for making a VCSEL having a heat sink comprising the steps of: providing a substrate having a surface with a first stack of distributed Bragg reflectors, a first cladding region, an active region, a second cladding region, a second stack of distributed Bragg reflectors, and a contact region having a ohmic metal layer disposed thereon; forming a masking layer with a pattern on the ohmic metal layer, wherein the pattern exposes portions of the ohmic metal layer while covering other portions of the ohmic metal layer; transferring the pattern into the ohmic metal layer and into the second stack of distributed Bragg reflectors to form a mesa having a surface; forming a dielectric layer on the substrate covering the surface of the mesa and the masking layer; forming a layer on the dielectric layer, the layer exposing the dielectric layer on the mesa; etching the dielectric layer exposed on the mesa, thereby removing the dielectric layer on the mesa and exposing the ohmic metal layer on the mesa; forming a second dielectric layer on the surface of the mesa; forming a metal layer on the dielectric layer and on the second dielectric layer; forming a seed layer having a pattern, the pattern of the seed layer forming an opening on a portion of the second dielectric layer; and plating a second metal selectively on the seed layer, thereby generating a VCSEL.
Claim 11
Dependent Claim
74 words
A method for making a VCSEL having a heat sink as claimed in claim 8 where, in the step of providing a substrate having a surface with a first stack of distributed Bragg reflectors, a first cladding region, an active region, a second cladding region, a second stack of distributed Bragg reflectors, and a contact region having a ohmic metal layer disposed thereon, the ohmic metal layer is provided by depositing a titanium/tungsten layer.
Claim 12
Dependent Claim
43 words
A method for making a VCSEL having a heat sink as claimed in claim 8 where, in the step of forming a masking layer with a pattern on the ohmic metal layer, the masking layer is formed by depositing a layer of nitride.
Claim 13
Dependent Claim
68 words
A method for making a VCSEL having a heat sink as claimed in claim 8 where, in the step of transferring the pattern into the ohmic metal layer and into the second stack of distributed Bragg reflectors to form a mesa having a surface, the transferring of the pattern into the ohmic metal layer and into the second stack of distributed Bragg reflectors is achieved by plasma etching.
Claim 14
Dependent Claim
49 words
A method for making a VCSEL having a heat sink as claimed in claim 8 where, in prior to the step of forming a dielectric layer on the substrate covering the surface of the mesa and the masking layer, the step of forming a current confinement region is fabricated.
Claim 15
Dependent Claim
47 words
A method for making a VCSEL having a heat sink as claimed in claim 12 where, in the step of forming a current confinement region, the current confinement region is fabricated by changing structural integrity of a portion of the second stack of the distributed Bragg reflectors.
Claim 16
Dependent Claim
34 words
A method for making a VCSEL having a heat sink as claimed in claim 12 where, in the step of forming a current confinement region, the current confinement region is fabricated by ion implantation.
Claim 17
Independent Claim
208 words
A method for making a VCSEL having auto-aligned heat sink comprising the steps of: providing a substrate having a surface with a first stack of distributed Bragg reflectors, a first cladding region, an active region, a second cladding region, a second stack of distributed Bragg reflectors, and a contact region having a ohmic metal layer disposed thereon; forming a masking layer having a pattern on the ohmic metal layer, the pattern of the masking layer exposes portions of the ohmic metal layer, while covering other portions of the ohmic metal layer; etching the exposed portions of the ohmic metal layer to expose portions of the contact region; etching the exposed portions of the contact region into a portion of the second stack of distributed Bragg reflectors to form a mesa, thereby exposing a portion of the second stack of distributed Bragg reflectors; forming a dielectric layer overlying portions of contact layer and covering a portion of the trench; forming a metal layer on the dielectric layer, the trench and the mesa; forming seed layer having a pattern, the pattern of the seed layer forming an opening on a portion of the metal layer; and plating a second metal selectively on the seed layer, thereby an auto-aligned heat sink.
Claim 18
Independent Claim
208 words
A method for making a VCSEL having auto-aligned heat sink comprising the steps of: providing a substrate having a surface with a first stack of distributed Bragg reflectors, a first cladding region, an active region, a second cladding region, a second stack of distributed Bragg reflectors, and a contact region having a ohmic metal layer disposed thereon; forming a masking layer having a pattern on the ohmic metal layer, the pattern of the masking layer exposes portions of the ohmic metal layer, while covering other portions of the ohmic metal layer; etching the exposed portions of the ohmic metal layer to expose portions of the contact region; etching the exposed portions of the contact region into a portion of the second stack of distributed Bragg reflectors to form a mesa, thereby exposing a portion of the second stack of distributed Bragg reflectors; forming a dielectric layer overlying portions of contact layer and covering a portion of the trench; forming a metal layer on the dielectric layer, the trench and the mesa; forming seed layer having a pattern, the pattern of the seed layer forming an opening on a portion of the metal layer; and plating a second metal selectively on the seed layer, thereby an auto-aligned heat sink.
Claim 19
Independent Claim
191 words
A method for controlling an aperture of a light emitting device comprising the steps of: providing a substrate having a surface with a first stack of distributed Bragg reflectors, a first cladding region, an active region, a second cladding region, a second stack of distributed Bragg reflectors, and a contact region; forming a mesa with a surface and a trench, wherein said trench extends from said contact region into a portion of said second stack of distributed Bragg reflectors, and wherein said trench is adjacent to a portion of said mesa; forming a first dielectric layer overlying said substrate and covering a portion of said trench with a portion of said contact region being exposed; forming a conductive layer overlying said substrate; forming a seed layer having a pattern, said pattern of said seed layer having an opening on said mesa exposing a portion of said conductive layer; and plating a metal selectively on said seed layer generating a metal layer on said seed layer, said metal of said metal layer encroaches on said surface of said mesa to form an orifice, thereby sizing said orifice of said light emitting device.
Claim 20
Independent Claim
191 words
A method for controlling an aperture of a light emitting device comprising the steps of: providing a substrate having a surface with a first stack of distributed Bragg reflectors, a first cladding region, an active region, a second cladding region, a second stack of distributed Bragg reflectors, and a contact region; forming a mesa with a surface and a trench, wherein said trench extends from said contact region into a portion of said second stack of distributed Bragg reflectors, and wherein said trench is adjacent to a portion of said mesa; forming a first dielectric layer overlying said substrate and covering a portion of said trench with a portion of said contact region being exposed; forming a conductive layer overlying said substrate; forming a seed layer having a pattern, said pattern of said seed layer having an opening on said mesa exposing a portion of said conductive layer; and plating a metal selectively on said seed layer generating a metal layer on said seed layer, said metal of said metal layer encroaches on said surface of said mesa to form an orifice, thereby sizing said orifice of said light emitting device.