US5501739A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Apparatus and method for forming thin film
Assignee: Panasonic Holdings Corp
•
Filing: 1993-11-29
•
Granted: 1996-03-26
•
Expires: 2013-11-29
Abstract
Abstract A forming apparatus of a thin film includes a processing chamber where a predetermined process is carried out on a surface of a supplied substrate. A feeding device is provided in the processing chamber for feeding material to form an organic molecular layer including silicon or germanium on the surface of the substrate. A forming method of a thin film includes the steps of forming the thin film on the surface of the supplied substrate in the processing chamber, and feeding material for forming the organic molecular layer, including silicon or germanium, on the formed thin film on the surface of the substrate through a feeding device in the processing chamber, and then forming the organic molecular layer on the surface of the substrate.
Inventors
- 👤 Yuichiro Yamada
- 👤 Naoki Suzuki
- 👤 Ryuzo Houchin
- 👤 Noboru Nomura
- 👤 Kousaku Yano
- 👤 Yuka Terai
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 22:54
CPC Classifications
B; B05; B05D; B05D1/00; B05D1/18; B05D1/185; B05D1/60; B82; B82Y; B82Y30/00; B82Y40/00; C; C23; C23C; C23C16/00; C23C16/44; C23C16/54
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
210 words
An apparatus comprising: a vacuum chamber for forming a thin film on a substrate, said vacuum chamber having a gas blow-out plate therein for blowing gas into said vacuum chamber; an organic molecular layer forming chamber located adjacent to said vacuum chamber for forming an organic layer on the substrate, said forming chamber comprising a substrate carrying device therein, said substrate carrying device comprising a transfer arm movable between one position in said vacuum chamber and another position in said forming chamber for transferring the substrate between said vacuum chamber and said forming chamber, and an organic material gas blow-out plate; and a feeding device connected with said organic material gas blow-out plate for feeding material to said forming chamber for forming an organic molecular layer that includes one of silicon and germanium on the surface of the substrate; wherein said gas blow-out plate of said vacuum chamber has a plurality of blow-holes therein for blowing gas located opposite to said transfer arm when said transfer arm is in said one position in said vacuum chamber and said organic material gas blow-out plate has a plurality of blow-holes therein for blowing gas located opposite to said transfer arm when said transfer arm in said another position in said forming chamber.
Claim 2
Independent Claim
210 words
An apparatus comprising: a vacuum chamber for forming a thin film on a substrate, said vacuum chamber having a gas blow-out plate therein for blowing gas into said vacuum chamber; an organic molecular layer forming chamber located adjacent to said vacuum chamber for forming an organic layer on the substrate, said forming chamber comprising a substrate carrying device therein, said substrate carrying device comprising a transfer arm movable between one position in said vacuum chamber and another position in said forming chamber for transferring the substrate between said vacuum chamber and said forming chamber, and an organic material gas blow-out plate; and a feeding device connected with said organic material gas blow-out plate for feeding material to said forming chamber for forming an organic molecular layer that includes one of silicon and germanium on the surface of the substrate; wherein said gas blow-out plate of said vacuum chamber has a plurality of blow-holes therein for blowing gas located opposite to said transfer arm when said transfer arm is in said one position in said vacuum chamber and said organic material gas blow-out plate has a plurality of blow-holes therein for blowing gas located opposite to said transfer arm when said transfer arm in said another position in said forming chamber.
Claim 3
Dependent Claim
34 words
The apparatus of claim 1, wherein said vacuum chamber and said forming chamber are connected to each other through a gate valve through which said transfer arm of said substrate carrying device can move.
Claim 4
Dependent Claim
27 words
The apparatus of claim 1, wherein said feeding device comprises a vaporizer for heating and vaporizing an organic liquid material that includes one of silicon and germanium.
Claim 5
Dependent Claim
48 words
The apparatus of claim 3, wherein said vaporizer is connected to a container having said organic liquid material therein, said organic liquid material being selected from the group consisting of a compound comprising silane, silozane, disilazine, trisilazane, siloxysilane, and piperazine, and a compound comprising germanium halogen and aminogermanium.
Claim 6
Dependent Claim
25 words
The apparatus of claim 1, wherein said vacuum chamber further comprises a discharge port and a gas introduction port connected with said gas blow-out plate.
Claim 7
Dependent Claim
32 words
The apparatus of claim 1, wherein said vacuum chamber further comprises a high frequency power source connected with an impressing electrode, said impressing electrode being connected with said gas blow-out plate thereof.
Claim 8
Dependent Claim
27 words
The apparatus of claim 1, wherein said vacuum chamber further comprises a susceptor for supporting the substrate thereon and a push-up pin movable up through said susceptor.
Claim 9
Dependent Claim
34 words
The apparatus of claim 1, wherein said forming chamber further comprises a heater plate, said heater plate and said organic material gas blow-out plate having said transfer arm therebetween in said another position thereof.
Claim 10
Dependent Claim
37 words
The apparatus of claim 1, wherein a plurality of said vacuum chamber are connected to said forming chamber by respective gate valves, said transfer arm being movable through said respective gate valves into the respective vacuum chambers.
References Cited (Backward Citations)
US4048955A
Cited
US4628006A
Cited
US4847469A
Cited
US4947789A
Cited
EP0435088A1
Cited
US5286296A
Cited
US5203925A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1999-03-26 | 1999-09-25 | 2000-03-26 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2003-03-26 | 2003-09-25 | 2004-03-26 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2007-03-26 | 2007-09-25 | 2008-03-26 | $7700.00 | Window Closed / Lapsed |