US5503676A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Apparatus and method for magnetron in-situ cleaning of plasma reaction chamber
Assignee: Lam Research Corp
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Filing: 1995-02-08
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Granted: 1996-04-02
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Expires: 2015-02-08
Abstract
Abstract A method and apparatus for removing extraneous deposits from particle control surfaces in a microwave plasma generating device. An annular magnetron plasma is formed in contact with a particle control surface having a shape which intersects 200-500 G lines of magnetic induction. The magnetron plasma is scanned across particle control surfaces on a horn and chuck by increasing the current to the main coil and/or mirror coil of the apparatus. As the magnetron plasma moves across the particle control surfaces, the plasma reacts with the extraneous deposits and etches the deposits off of the particle control surfaces.
Inventors
- 👤 Paul K. Shufflebotham
- 👤 Larry D. Hartsough
- 👤 Dean R. Denison
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 21:47
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H01J37/32798; H01J37/32853; H01J37/32862; Y; Y10; Y10S; Y10S156/00; Y10S156/916; Y10S438/00; Y10S438/905
Claims Analysis
Total Claims: 26
Claim 1
Independent Claim
164 words
A plasma generating device capable of in-situ removal of residues in a plasma reaction chamber in the device, comprising: a reaction chamber having a specimen stage on which a specimen can be treated with the plasma; gas supply means for supplying gas to the reaction chamber; electromagnet means comprising at least one electromagnet coil for generating a magnetic field in the reaction chamber, the magnetic field being capable of producing a magnetron plasma; at least one particle control surface having a shape which intersects lines of magnetic induction created by the electromagnet means sufficient to create a localized magnetron plasma; means for applying an electrical bias to the particle control surface; and current supply means for supplying the electromagnet means with an adjustable amount of direct electrical current so that an annular magnetron plasma is formed in contact with the particle control surface and the annular magnetron plasma can be swept across the particle control surface to remove deposits from the particle control surface.
Claim 2
Dependent Claim
164 words
A plasma generating device capable of in-situ removal of residues in a plasma reaction chamber in the device, comprising: a reaction chamber having a specimen stage on which a specimen can be treated with the plasma; gas supply means for supplying gas to the reaction chamber; electromagnet means comprising at least one electromagnet coil for generating a magnetic field in the reaction chamber, the magnetic field being capable of producing a magnetron plasma; at least one particle control surface having a shape which intersects lines of magnetic induction created by the electromagnet means sufficient to create a localized magnetron plasma; means for applying an electrical bias to the particle control surface; and current supply means for supplying the electromagnet means with an adjustable amount of direct electrical current so that an annular magnetron plasma is formed in contact with the particle control surface and the annular magnetron plasma can be swept across the particle control surface to remove deposits from the particle control surface.
Claim 3
Dependent Claim
27 words
The plasma generating device according to claim 1, further comprising a plasma generating chamber and means for generating a microwave electric field in the plasma generating chamber.
Claim 4
Dependent Claim
32 words
The plasma generating device according to claim 1, wherein the at least one particle control surface has a shape which intersects 200-500 G lines of magnetic induction created by the electromagnet means.
Claim 5
Dependent Claim
21 words
The plasma generating device according to claim 1, wherein said particle control surface is on a horn in the reaction chamber.
Claim 6
Dependent Claim
22 words
The plasma generating device according to claim 1, wherein said particle control surface is on a specimen support in the reaction chamber.
Claim 7
Dependent Claim
31 words
The plasma generating device according to claim 1, wherein the electromagnet means comprises a main coil surrounding a plasma chamber of the device and a mirror coil surrounding the reaction chamber.
Claim 8
Dependent Claim
22 words
The plasma generating device according to claim 6, wherein the mirror coil includes inner and outer coils and an iron core therebetween.
Claim 9
Dependent Claim
30 words
The plasma generating device of claim 7, wherein the current supply means provides an independently adjustable amount of current to the main coil, the inner coil and the outer coil.
Claim 10
Dependent Claim
16 words
A plasma generating device of claim 1, wherein the particle control surface comprises a conical surface.
Claim 11
Dependent Claim
19 words
A plasma generating device of claim 1, wherein the particle control surface is planar and surrounds the specimen stage.
Claim 12
Dependent Claim
65 words
The plasma generating device of claim 1, wherein the device includes a plasma generating chamber and means for generating a microwave electric field in the plasma chamber, the at least one particle control surface comprising a surface of a horn extending from an outlet of the plasma chamber into the reaction chamber and a surface of a chuck on which the specimen stage is located.
Claim 13
Independent Claim
199 words
A method for removing extraneous deposits from a plasma generating device, the device including a reaction chamber, a substrate holder in the reaction chamber for supporting a specimen to be treated by plasma, electromagnet means comprising at least one electromagnet, at least one particle control surface having a shape which intersects lines of magnetic induction created by the electromagnet means, a current supply means for supplying the electromagnet means with an adjustable amount of direct electrical current so that an annular magnetron plasma is formed in contact with the particle control surface and the annular magnetron plasma can be swept across the particle control surface, and a means for applying an electrical bias to the particle control surface to be swept by the magnetron plasma, the method comprising the steps of: introducing reactant gas into the reaction chamber; applying an electrical bias to the particle control surface; supplying a first amount of direct current to the electromagnet so as to form an annular magnetron plasma in contact with the particle control surface; and varying the amount of direct current supplied to the electromagnet such that the annular magnetron plasma moves across and removes deposits on the particle control surface.
Claim 14
Independent Claim
199 words
A method for removing extraneous deposits from a plasma generating device, the device including a reaction chamber, a substrate holder in the reaction chamber for supporting a specimen to be treated by plasma, electromagnet means comprising at least one electromagnet, at least one particle control surface having a shape which intersects lines of magnetic induction created by the electromagnet means, a current supply means for supplying the electromagnet means with an adjustable amount of direct electrical current so that an annular magnetron plasma is formed in contact with the particle control surface and the annular magnetron plasma can be swept across the particle control surface, and a means for applying an electrical bias to the particle control surface to be swept by the magnetron plasma, the method comprising the steps of: introducing reactant gas into the reaction chamber; applying an electrical bias to the particle control surface; supplying a first amount of direct current to the electromagnet so as to form an annular magnetron plasma in contact with the particle control surface; and varying the amount of direct current supplied to the electromagnet such that the annular magnetron plasma moves across and removes deposits on the particle control surface.
Claim 15
Dependent Claim
33 words
The method according to claim 12, wherein the step of biasing the particle control surface is carried out by applying direct current to the particle control surface and forming a DC magnetron plasma.
Claim 16
Dependent Claim
17 words
The method according to claim 13, wherein the extraneous deposits include at least one electrically conductive metal.
Claim 17
Dependent Claim
33 words
The method according to claim 12, wherein the step of biasing the particle control surface is carried out by applying radiofrequency current to the particle control surface and forming a RF magnetron plasma.
Claim 18
Dependent Claim
21 words
The method according to claim 15, wherein the extraneous deposit includes SiO x and the reactant gas comprises a fluorine-containing gas.
Claim 19
Dependent Claim
14 words
The method according to claim 16, wherein the reactant gas comprises NF 3 .
Claim 20
Dependent Claim
27 words
The method according to claim 12, wherein the device includes a plasma generating chamber and means for generating a microwave electric field in the plasma generating chamber.
Claim 21
Dependent Claim
29 words
The method according to claim 12, wherein at least one particle control surface has a shape which intersects 200-500 G lines of magnetic induction created by the electromagnet means.
Claim 22
Dependent Claim
16 words
The method according to claim 12, wherein the particle control surface comprises a generally conical surface.
Claim 23
Dependent Claim
20 words
The method according to claim 12, wherein the particle control surface is generally coplanar with, and surrounds, the specimen stage.
Claim 24
Dependent Claim
33 words
The method according to claim 12, wherein the device includes a plasma generating chamber, the electromagnet means comprising a main coil surrounding the plasma chamber and a mirror coil surrounding the reaction chamber.
Claim 25
Dependent Claim
20 words
The method according to claim 12, wherein the mirror coil includes inner and outer coils and an iron core therebetween.
Claim 26
Dependent Claim
45 words
The method according to claim 12, wherein during the step of varying the current to the electromagnet the amount of current supplied to the main coil by current supply means is increased and the annular magnetron plasma moves radially outwardly along the particle control surface.
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