Aliasing sampler for plasma probe detection

Claim 2

In a plasma arrangement in which an RF power generator produces an RF electrical wave at a predetermined RF frequency and containing harmonic information which affects the form of the RF wave, said electrical wave being supplied through an RF matching network to a power input of a plasma chamber within which said electrical wave produces a plasma, and in which detection means samples the RF electrical wave at the input to said plasma chamber to determine a measurement of the RF electrical power applied to said plasma chamber; the improvement wherein said detection means includes sampling means for sampling the amplitude of said RF wave at a predetermined sampling rate lower than said predetermined RF frequency, and means for synthesizing the sampled amplitude to produce an aliasing waveform at a predetermined aliasing frequency significantly lower than said predetermined RF frequency, in which said aliasing waveform preserves the harmonic information of said RF wave.

Claim 3

In a plasma arrangement in which an RF power generator produces an RF electrical wave at a predetermined RF frequency, said electrical wave being supplied through an RF matching network to a power input of a plasma chamber within which said electrical wave produces a plasma, and in which detection means samples the RF electrical wave at the input to said plasma chamber to determine a measurement of the RF electrical power applied to said plasma chamber; the improvement wherein said detection means includes sampling means for sampling the amplitude of said RF wave at a predetermined sampling rate lower than said predetermined RF frequency, and means for synthesizing the sampled amplitude to produce an aliasing waveform at a predetermined aliasing frequency significantly lower than said predetermined RF frequency; wherein said RF power generator produces said RF electrical wave at said predetermined RF frequency F, said predetermining aliasing frequency is selected at f a , and said sampling rate f s is selected as f.sub.s =F/N±f.sub.a /N where N is a whole integer greater than one.

Claim 4

In a plasma arrangement in which an RF power generator produces an RF electrical wave at a predetermined RF frequency, said electrical wave being supplied through an RF matching network to a power input of a plasma chamber within which said electrical wave produces a plasma, and in which detection means samples the RF electrical wave at the input to said plasma chamber to determine a measurement of the RF electrical power applied to said plasma chamber; the improvement wherein said detection means includes sampling means for sampling the amplitude of said RF wave at a predetermined sampling rate lower than said predetermined RF frequency, and means for synthesizing the sampled amplitude to produce an aliasing waveform at a predetermined aliasing frequency significantly lower than said predetermined RF frequency; wherein said RF power generator produces said RF electrical wave at said predetermined RF frequency F, said predetermining aliasing frequency is selected at f a , and said sampling rate f s is selected as f.sub.s =F/N±f.sub.a /N where N is a whole integer greater than one.

Claim 5

The improvement of claim 2, wherein said predetermined frequency F is 13.56 MHz, said aliasing frequency f a is on the order of 50 KHz to 250 KHz.

Claim 6

The improvement of claim 2, wherein said integer N is at least five.

Claim 7

In a plasma arrangement in which an RF power generator produces an RF electrical wave at a predetermined RF frequency, said electrical wave being supplied through an RF matching network to a power input of a plasma chamber within which said electrical wave produces a plasma, and in which detection means samples the RF electrical wave at the input to said plasma chamber to determine a measurement of the RF electrical power applied to said plasma chamber; the improvement wherein said detection means includes sampling means for sampling the amplitude of said RF wave at a predetermined sampling rate lower than said predetermined RF frequency, and means for synthesizing the sampled amplitude to produce an aliasing waveform at a predetermined aliasing frequency significantly lower than said predetermined RF frequency; wherein said sampling means includes a sampling clock operating at said sampling rate, a first high speed sample and hold means operated by said sampling clock for sampling the voltage of said RF wave, a second high speed sample and hold means operated by said sampling clock for sampling the current of said RF wave, and said means for synthesizing includes means for generating an aliasing voltage waveform and for generating an aliasing current waveform.

Claim 8

In a plasma arrangement in which an RF power generator produces an RF electrical wave at a predetermined RF frequency, said electrical wave being supplied through an RF matching network to a power input of a plasma chamber within which said electrical wave produces a plasma, and in which detection means samples the RF electrical wave at the input to said plasma chamber to determine a measurement of the RF electrical power applied to said plasma chamber; the improvement wherein said detection means includes sampling means for sampling the amplitude of said RF wave at a predetermined sampling rate lower than said predetermined RF frequency, and means for synthesizing the sampled amplitude to produce an aliasing waveform at a predetermined aliasing frequency significantly lower than said predetermined RF frequency; wherein said sampling means includes a sampling clock operating at said sampling rate, a first high speed sample and hold means operated by said sampling clock for sampling the voltage of said RF wave, a second high speed sample and hold means operated by said sampling clock for sampling the current of said RF wave, and said means for synthesizing includes means for generating an aliasing voltage waveform and for generating an aliasing current waveform.

Claim 9

The improvement of claim 5, wherein said first and second sample and hold means each include an A/D converter producing a digital sample with a width of at least 12 bits.

Claim 10

The improvement of claim 6, wherein said first and second sample and hold means sample the associated voltage and current waveforms simultaneously.

Claim 11

The improvement of claim 6, wherein said sampling means includes first and second digital latches respectively coupled between said first and said second sample and hold means and respective inputs to a digital signal processor.