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US5572464A Expired / Lapsed US ⏱️ 0.0 years remaining

Semiconductor memory device and method of using the same

Assignee: Intellectual Ventures I LLC
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Filing: 1995-04-03
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Granted: 1996-11-05
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Expires: 2015-04-03
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Abstract

Abstract In a semiconductor memory device and a method for using the semiconductor memory device, the semiconductor memory device includes a plurality of memory cells series-connected to each other, and each formed by a P-channel transistor in which a control gate electrode is stacked via an insulating film on a floating gate electrode. One end of the plural memory cells series-connected to each other is connected to one of a source and a drain of a first selecting transistor. The other of the source and the drain of the first selecting transistor are connected to a bit line. The other end of the plural memory cells series-connected to each other is connected to one of a source and a drain of a second selecting transistor. The other of the source and the drain of the second selecting transistor is connected to a power source line.

Inventors

  • 👤 Shoichi Iwasa

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-01 05:00
CPC Classifications
G; G11; G11C; G11C16/00; G11C16/02; G11C16/04; G11C16/0483; H; H10; H10B; H10B69/00

Claims Analysis

Total Claims: 6
Claim 1
Independent Claim 223 words
A method for using a semiconductor memory device having a plurality of memory cells series-connected to each other, each memory cell formed by a P-channel transistor in which a control gate electrode is stacked via an insulating film on a floating gate electrode; a first selecting transistor having a source and a drain, one of the source and the drain being connected to one end of said plural memory cells series-connected to each other; a bit line connected to the other of the source and the drain of said first selecting transistor; a second selecting transistor having a source and a drain, one of the source and the drain being connected to the other end of said plural memory cells series-connected to the other; and a power source line connected to the other of the source and the drain of said second selecting transistor; said method comprising the steps of: setting, to a positive value, a potential at a control gate electrode of a P-channel transistor forming a memory cell selected from said plurality of memory cells; producing an avalanche breakdown at a drain junction of said P-channel transistor forming said selected memory cell; and writing data into said selected memory cell by injecting electrons generated by the avalanche breakdown into a floating gate electrode of said P-channel transistor forming said selected memory.
Claim 2
Independent Claim 223 words
A method for using a semiconductor memory device having a plurality of memory cells series-connected to each other, each memory cell formed by a P-channel transistor in which a control gate electrode is stacked via an insulating film on a floating gate electrode; a first selecting transistor having a source and a drain, one of the source and the drain being connected to one end of said plural memory cells series-connected to each other; a bit line connected to the other of the source and the drain of said first selecting transistor; a second selecting transistor having a source and a drain, one of the source and the drain being connected to the other end of said plural memory cells series-connected to the other; and a power source line connected to the other of the source and the drain of said second selecting transistor; said method comprising the steps of: setting, to a positive value, a potential at a control gate electrode of a P-channel transistor forming a memory cell selected from said plurality of memory cells; producing an avalanche breakdown at a drain junction of said P-channel transistor forming said selected memory cell; and writing data into said selected memory cell by injecting electrons generated by the avalanche breakdown into a floating gate electrode of said P-channel transistor forming said selected memory.
Claim 3
Dependent Claim 28 words
A method for using a semiconductor memory device as claimed in claim 1, wherein said first selecting transistor and said second selecting transistor are constructed of P-channel transistors.
Claim 4
Dependent Claim 28 words
A method for using a semiconductor memory device as claimed in claim 1, wherein said P-channel transistors are fabricated within N-type wells formed in a P-type semiconductor substrate.
Claim 5
Independent Claim 360 words
A method for using a semiconductor memory device having a plurality of memory cells series-connected to each other, each memory cell formed by a P-channel transistor in which a control gate electrode is stacked via an insulating film on a floating gate electrode; a first selecting transistor having a source and a drain, one of the source and the drain being connected to one end of said plural memory cells series-connected to each other; a bit line connected to the other of the source and the drain of said first selecting transistor; a second selecting transistor having a source and a drain, one of the source and the drain being connected to the other end of said plural memory cells series-connected to each other; and a power source line connected to the other of the source and the drain of said second selecting transistor, said method comprising the steps of: writing data into a memory cell selected from said plurality of memory cells, said writing comprising the steps of: setting, to a positive value, a potential at a control gate electrode of a P-channel transistor forming said selected memory cell, producing an avalanche breakdown at a drain junction of said P-channel transistor forming said selected memory cell, and writing data into said selected memory cell by injecting electrons generated by the avalanche breakdown into a floating gate electrode of said P-channel transistor forming said selected memory cell; and reading data from the selected memory cell, said reading comprising the steps of: producing a voltage difference between said one end of said plural memory cells and said other end of said plural memory cells, bringing all P-channel transistors forming memory cells not selected from said plural memory cells, said first selecting transistor, and said second selecting transistor into conductive conditions, selecting a potential at a control gate electrode of a P-channel transistor forming said selected memory cell to be an intermediate voltage between a threshold voltage under a data writing condition and a threshold voltage under a data non-writing condition, and reading data written into said selected memory cell by determining whether or not a current flows through said bit line.
Claim 6
Independent Claim 360 words
A method for using a semiconductor memory device having a plurality of memory cells series-connected to each other, each memory cell formed by a P-channel transistor in which a control gate electrode is stacked via an insulating film on a floating gate electrode; a first selecting transistor having a source and a drain, one of the source and the drain being connected to one end of said plural memory cells series-connected to each other; a bit line connected to the other of the source and the drain of said first selecting transistor; a second selecting transistor having a source and a drain, one of the source and the drain being connected to the other end of said plural memory cells series-connected to each other; and a power source line connected to the other of the source and the drain of said second selecting transistor, said method comprising the steps of: writing data into a memory cell selected from said plurality of memory cells, said writing comprising the steps of: setting, to a positive value, a potential at a control gate electrode of a P-channel transistor forming said selected memory cell, producing an avalanche breakdown at a drain junction of said P-channel transistor forming said selected memory cell, and writing data into said selected memory cell by injecting electrons generated by the avalanche breakdown into a floating gate electrode of said P-channel transistor forming said selected memory cell; and reading data from the selected memory cell, said reading comprising the steps of: producing a voltage difference between said one end of said plural memory cells and said other end of said plural memory cells, bringing all P-channel transistors forming memory cells not selected from said plural memory cells, said first selecting transistor, and said second selecting transistor into conductive conditions, selecting a potential at a control gate electrode of a P-channel transistor forming said selected memory cell to be an intermediate voltage between a threshold voltage under a data writing condition and a threshold voltage under a data non-writing condition, and reading data written into said selected memory cell by determining whether or not a current flows through said bit line.

References Cited (Backward Citations)

US4959812A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1999-11-05 2000-05-06 2000-11-05 $2000.00 Window Closed / Lapsed
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