US5580385A
Expired / Lapsed
US
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Structure and method for incorporating an inductively coupled plasma source in a plasma processing chamber
Assignee: Texas Instruments Inc
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Filing: 1994-06-30
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Granted: 1996-12-03
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Expires: 2014-06-30
Abstract
Abstract A plasma processing chamber 10 having an inductively coupled plasma (ICP) source 12 mounted therein. The ICP source 12 comprises an antenna 14 encapsulated in epoxy 16 and surrounded by housing 18. The antenna 14 and epoxy 16 are hermetically sealed from plasma formation region 30. The antenna 14 is powered by at least one RF power supply 40 through at least one RF matching network 42. Dielectric capping plate 28 separates ICP source 12 from the plasma formation region 30 and may have a plurality of holes therein to provide a uniform showerhead distribution of process gases.
Inventors
- 👤 Ajit P. Paranjpe
- 👤 Cecil J. Davis
- 👤 Robert T. Matthews
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 02:03
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32082; H01J37/321; H10; H10P; H10P50/00; H10P50/20; H10P50/24; H10P50/242; H05; H05H; H05H1/00; H05H1/24; H05H1/46
Claims Analysis
Total Claims: 31
Claim 1
Independent Claim
39 words
A plasma processing structure comprising: a processing chamber; an inductively coupled plasma source mounted within said processing chamber, said inductively coupled plasma source comprising an antenna encapsulated in an encapsulant, wherein said antenna and said encapsulant are hermetically sealed.
Claim 2
Dependent Claim
39 words
A plasma processing structure comprising: a processing chamber; an inductively coupled plasma source mounted within said processing chamber, said inductively coupled plasma source comprising an antenna encapsulated in an encapsulant, wherein said antenna and said encapsulant are hermetically sealed.
Claim 3
Dependent Claim
15 words
The structure of claim 1, further comprising a structurally rigid housing surrounding said encapsulated antenna.
Claim 4
Dependent Claim
28 words
The structure of claim 2, further comprising a conductive shield surrounding said housing except on a first side to prevent plasma formation behind and laterally adjacent said housing.
Claim 5
Dependent Claim
20 words
The structure of claim 2, further comprising at least one electrically conductive plate located on a side of said housing.
Claim 6
Dependent Claim
10 words
The structure of claim 1, wherein said antenna is planar.
Claim 7
Dependent Claim
10 words
The structure of claim 1, wherein said antenna is contoured.
Claim 8
Dependent Claim
18 words
The structure of claim 1, further comprising a dielectric capping plate of a side of said encapsulated antenna.
Claim 9
Dependent Claim
12 words
The structure of claim 7, wherein said dielectric capping plate is contoured.
Claim 10
Dependent Claim
37 words
The structure of claim 1, further comprising one or more matching networks connected to said encapsulated antenna and one or more RF power supplies connected to said matching networks for supplying RF power to said encapsulated antenna.
Claim 11
Dependent Claim
48 words
The structure of claim 9, wherein said at least one RF power supply comprises a master power supply and at least one slave power supply connected in a master-slave configuration having a phase shifter located between said master power supply and said at least one slave power supply.
Claim 12
Dependent Claim
55 words
The structure of claim 1, further comprising: a chuck for holding a wafer located within said processing chamber; a first RF power supply connected to said chuck through a matching network; and a phase shifter connected between said first RF power supply for said chuck and a second RF power supply connected to said antenna.
Claim 13
Dependent Claim
20 words
The structure of claim 1, further comprising a plurality of multi-polar magnets located on a sidewall of said processing chamber.
Claim 14
Dependent Claim
24 words
The structure of claim 1, wherein said antenna comprises a plurality of coil segments separated from each other by a capacitor and an insulator.
Claim 15
Dependent Claim
70 words
A plasma processing chamber comprising: an inductively coupled plasma source attached to an internal wall of said plasma processing chamber, said inductively coupled plasma source comprising: a spiral antenna encapsulated in epoxy; a structurally rigid housing surrounding the epoxy, wherein said epoxy and antenna are hermetically sealed; and a dielectric capping plate having a plurality of holes, said dielectric capping plate being located adjacent a first side of said housing.
Claim 16
Dependent Claim
70 words
A plasma processing chamber comprising: an inductively coupled plasma source attached to an internal wall of said plasma processing chamber, said inductively coupled plasma source comprising: a spiral antenna encapsulated in epoxy; a structurally rigid housing surrounding the epoxy, wherein said epoxy and antenna are hermetically sealed; and a dielectric capping plate having a plurality of holes, said dielectric capping plate being located adjacent a first side of said housing.
Claim 17
Dependent Claim
26 words
The plasma processing chamber of claim 14, wherein said spiral antenna comprises a plurality of leads extending through said internal wall of said plasma processing chamber.
Claim 18
Dependent Claim
43 words
The plasma processing chamber of claim 15, further comprising at least one matching network connected to said plurality of leads and at least one RF power supply connected to said at least one matching network for supplying RF power to said spiral antenna.
Claim 19
Dependent Claim
50 words
The plasma processing chamber of claim 16, wherein said at least one RF power supply comprises a master power supply and one or more slave power supplies connected in a master-slave configuration having a phase shifter located between said master power supply and said one or more slave power supplies.
Claim 20
Dependent Claim
14 words
The plasma processing chamber of claim 14, wherein said dielectric capping plate is contoured.
Claim 21
Dependent Claim
12 words
The plasma processing chamber of claim 14, wherein said antenna is contoured.
Claim 22
Dependent Claim
23 words
The plasma processing chamber of claim 14, further comprising at least one electrically conducting ring located on said first side of said housing.
Claim 23
Dependent Claim
26 words
The plasma processing chamber of claim 14, wherein said antenna comprises a plurality of coil segments separated from each other by a capacitor and an insulator.
Claim 24
Independent Claim
76 words
A method for incorporating an inductively coupled plasma source in a plasma processing chamber comprising the steps of: providing a plasma processing chamber having a chuck for holding a wafer; encapsulating a spiral antenna in an epoxy; surrounding said antenna and epoxy with a structurally rigid housing; hermetically sealing said epoxy; attaching said housing to an internal wall of said plasma processing chamber; and providing a dielectric capping plate to a first side of said housing.
Claim 25
Independent Claim
76 words
A method for incorporating an inductively coupled plasma source in a plasma processing chamber comprising the steps of: providing a plasma processing chamber having a chuck for holding a wafer; encapsulating a spiral antenna in an epoxy; surrounding said antenna and epoxy with a structurally rigid housing; hermetically sealing said epoxy; attaching said housing to an internal wall of said plasma processing chamber; and providing a dielectric capping plate to a first side of said housing.
Claim 26
Dependent Claim
33 words
The method of claim 22, further comprising the steps of supplying RF power to said spiral antenna; and providing at least one process gas to said plasma processing chamber to form a plasma.
Claim 27
Dependent Claim
20 words
The method of claim 23, further comprising the step of time modulating the RF power supplied to said spiral antenna.
Claim 28
Dependent Claim
29 words
The method of claim 22, further comprising the step of placing spacers between said housing and said internal wall to adjust the spacing between said housing and said chuck.
Claim 29
Dependent Claim
15 words
The method of claim 22, further comprising the step of contouring said dielectric capping plate.
Claim 30
Dependent Claim
18 words
The method of claim 22, further comprising the step of contouring said spiral antenna into a conical shape.
Claim 31
Dependent Claim
21 words
The method of claim 22, further comprising the step of placing electrically conductive plates on said first side of said housing.
References Cited (Backward Citations)
US4361114A
Cited
US5036252A
Cited
US4948458A
Cited
EP0467046A2
Cited
US5460707A
Cited
US5231334A
Cited
EP0565960A1
Cited
US5436528A
Cited
US5346578A
Cited
EP0601468A1
Cited
US5439524A
Cited
US5464476A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1999-12-03 | 2000-06-03 | 2000-12-03 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2003-12-03 | 2004-06-03 | 2004-12-03 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2007-12-03 | 2008-06-03 | 2008-12-03 | $7700.00 | Window Closed / Lapsed |