US5591269A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Vacuum processing apparatus
Assignee: Shin-Etsu Chemical Co Ltd
•
Filing: 1994-06-23
•
Granted: 1997-01-07
•
Expires: 2014-06-23
Abstract
Abstract A vacuum processing apparatus includes: a processing chamber for performing a film formation process to a semiconductor wafer in a vacuum; a mounting member provided in the processing chamber and having a mounting surface for mounting a target object; an electrostatic chuck, provided to the mounting surface of the mounting member, for chucking the semiconductor wafer; a heating mechanism for heating the semiconductor wafer; and a processing gas supply mechanism for supplying a processing gas for performing the film formation process to the semiconductor wafer into the processing chamber. The mounting member has a base, a first insulating layer formed on the surface of the base, and a second insulating layer formed on the first insulating layer, and has a conductive layer between the first insulating layer and the second insulating layer on the mounting surface side of the mounting member to obtain the above electrostatic chuck constituted by the first insulating layer, the second insulating layer, and the conductive layer, and the heating mechanism has a heating member provided between the first insulating layer and the second insulating layer on the lower surface side of the mounting member.
Inventors
- 👤 Junichi Arami
- 👤 Kenji Ishikawa
- 👤 Youichi Deguchi
- 👤 Hironori Yagi
- 👤 Nobuo Kawada
- 👤 Isao Yanagisawa
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 09:11
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/458; C23C16/4582; C23C16/4583; C23C16/4586; C23C16/46; C23C16/463; C23C16/466
Claims Analysis
Total Claims: 22
Claim 1
Independent Claim
181 words
A vacuum processing apparatus comprising: a processing chamber for processing a target object in a vacuum; a mounting member provided in said processing chamber and having a mounting surface for mounting said target object; electrostatic chuck means, provided to said mounting surface of said mounting member, for chucking said target object; heating means for heating said target object; and processing gas supply means for supplying a processing gas for processing said target object into said processing chamber, wherein said mounting member has a base, a first insulating layer formed on a surface of said base, and a second insulating layer formed on said first insulating layer, and has a conductive layer between said first insulating layer and said second insulating layer on a mounting surface side of said mounting member to obtain the electrostatic chuck means constituted by said first insulating layer, said second insulating layer, and said conductive layer, and the heating means has a heating member provided between said first insulating layer and said second insulating layer on a surface side opposing said mounting surface of said mounting member.
Claim 2
Dependent Claim
181 words
A vacuum processing apparatus comprising: a processing chamber for processing a target object in a vacuum; a mounting member provided in said processing chamber and having a mounting surface for mounting said target object; electrostatic chuck means, provided to said mounting surface of said mounting member, for chucking said target object; heating means for heating said target object; and processing gas supply means for supplying a processing gas for processing said target object into said processing chamber, wherein said mounting member has a base, a first insulating layer formed on a surface of said base, and a second insulating layer formed on said first insulating layer, and has a conductive layer between said first insulating layer and said second insulating layer on a mounting surface side of said mounting member to obtain the electrostatic chuck means constituted by said first insulating layer, said second insulating layer, and said conductive layer, and the heating means has a heating member provided between said first insulating layer and said second insulating layer on a surface side opposing said mounting surface of said mounting member.
Claim 3
Dependent Claim
22 words
A vacuum processing apparatus according to claim 1, wherein said base of said mounting member contains boron nitride (BN) or carbon (C).
Claim 4
Dependent Claim
25 words
A vacuum processing apparatus according to claim 1, wherein said first and second insulating layers of said mounting member are chemical vapor deposition (CVD) films.
Claim 5
Dependent Claim
48 words
A vacuum processing apparatus according to claim 1, wherein said first insulating layer of said mounting member contains a material selected from pyrolytic boron nitride (P--BN), silicon oxide (SiO 2 ), aluminum nitride (AlN), alumina (Al 2 O 3 ), and silicon nitride (Si 3 N 4 ).
Claim 6
Dependent Claim
48 words
A vacuum processing apparatus according to claim 1, wherein said second insulating layer of said mounting member contains a material selected from pyrolytic boron nitride (P--BN), silicon oxide (SiO 2 ), aluminum nitride (AlN), alumina (Al 2 O 3 ), and silicon nitride (Si 3 N 4 ).
Claim 7
Dependent Claim
162 words
A vacuum processing apparatus comprising: a processing chamber for processing a target object in a vacuum; a mounting member provided in said processing chamber and having a mounting surface for mounting said target object; electrostatic chuck means, provided to said mounting surface of said mounting member, for chucking said target object; heating means for heating said target object; and processing gas supply means for supplying a processing gas for processing said target object into said processing chamber, wherein said mounting member has an insulating base and an insulating layer formed on a surface of said base, and has a conductive layer between said base and said insulating layer on a mounting surface side of said mounting member to obtain the electrostatic chuck means constituted by said base, said insulating layer, and said conductive layer, and the heating means has a heating member provided between said base and said insulating layer on a surface side opposing said mounting surface of said mounting member.
Claim 8
Dependent Claim
162 words
A vacuum processing apparatus comprising: a processing chamber for processing a target object in a vacuum; a mounting member provided in said processing chamber and having a mounting surface for mounting said target object; electrostatic chuck means, provided to said mounting surface of said mounting member, for chucking said target object; heating means for heating said target object; and processing gas supply means for supplying a processing gas for processing said target object into said processing chamber, wherein said mounting member has an insulating base and an insulating layer formed on a surface of said base, and has a conductive layer between said base and said insulating layer on a mounting surface side of said mounting member to obtain the electrostatic chuck means constituted by said base, said insulating layer, and said conductive layer, and the heating means has a heating member provided between said base and said insulating layer on a surface side opposing said mounting surface of said mounting member.
Claim 9
Dependent Claim
20 words
A vacuum processing apparatus according to claim 6, wherein said insulating base of said mounting member contains boron nitride (BN).
Claim 10
Dependent Claim
24 words
A vacuum processing apparatus according to claim 6, wherein first and second insulating layers of said mounting member are chemical vapor deposition (CVD) films.
Claim 11
Dependent Claim
47 words
A vacuum processing apparatus according to claim 6, wherein said insulating layer of said mounting member contains a material selected from pyrolytic boron nitride (P--BN), silicon oxide (SiO 2 ), aluminum nitride (AlN), alumina (Al 2 O 3 ), and silicon nitride (Si 3 N 4 ).
Claim 12
Dependent Claim
154 words
A mounting table having an electrostatic chuck function and a heating function, comprising: a mounting member having a mounting surface for mounting a target object; electrostatic chuck means, provided to said mounting surface of said mounting member, for chucking said target object; and heating means for heating said target object, wherein said mounting member has a base, a first insulating layer formed on a surface of said base, and a second insulating layer formed on said first insulating layer, and has a conductive layer between said first insulating layer and said second insulating layer on a mounting surface side of said mounting member to obtain the electrostatic chuck means constituted by said first insulating layer, said second insulating layer, and said conductive layer, and the heating means has a heating member provided between said first insulating layer and said second insulating layer on a surface side opposing said mounting surface of said mounting member.
Claim 13
Dependent Claim
154 words
A mounting table having an electrostatic chuck function and a heating function, comprising: a mounting member having a mounting surface for mounting a target object; electrostatic chuck means, provided to said mounting surface of said mounting member, for chucking said target object; and heating means for heating said target object, wherein said mounting member has a base, a first insulating layer formed on a surface of said base, and a second insulating layer formed on said first insulating layer, and has a conductive layer between said first insulating layer and said second insulating layer on a mounting surface side of said mounting member to obtain the electrostatic chuck means constituted by said first insulating layer, said second insulating layer, and said conductive layer, and the heating means has a heating member provided between said first insulating layer and said second insulating layer on a surface side opposing said mounting surface of said mounting member.
Claim 14
Dependent Claim
21 words
A mounting table according to claim 10, wherein said base of said mounting member contains boron nitride (BN) or carbon (C).
Claim 15
Dependent Claim
24 words
A mounting table according to claim 10, wherein said first and second insulating layers of said mounting member are chemical vapor deposition (CVD) films.
Claim 16
Dependent Claim
47 words
A mounting table according to claim 10, wherein said first insulating layer of said mounting member contains a material selected from pyrolytic boron nitride (P--BN), silicon oxide (SiO 2 ), aluminum nitride (AlN), alumina (Al 2 O 3 ), and silicon nitride (Si 3 N 4 ).
Claim 17
Dependent Claim
47 words
A mounting table according to claim 10, wherein said second insulating layer of said mounting member contains a material selected from pyrolytic boron nitride (P--BN), silicon oxide (SiO 2 ), aluminum nitride (AlN), alumina (Al 2 O 3 ), and silicon nitride (Si 3 N 4 ).
Claim 18
Dependent Claim
135 words
A mounting table having an electrostatic chuck function and a heating function, comprising: a mounting member having a mounting surface for mounting a target object; electrostatic chuck means, provided to said mounting surface of said mounting member, for chucking said target object; and heating means for heating said target object, wherein said mounting member has an insulating base and an insulating layer formed on a surface of said base, and has a conductive layer between said base and said insulating layer on a mounting surface side of said mounting member to obtain the electrostatic chuck means constituted by said base, said insulating layer, and said conductive layer, and the heating means has a heating member provided between said base and said insulating layer on a surface side opposing said mounting surface of said mounting member.
Claim 19
Dependent Claim
135 words
A mounting table having an electrostatic chuck function and a heating function, comprising: a mounting member having a mounting surface for mounting a target object; electrostatic chuck means, provided to said mounting surface of said mounting member, for chucking said target object; and heating means for heating said target object, wherein said mounting member has an insulating base and an insulating layer formed on a surface of said base, and has a conductive layer between said base and said insulating layer on a mounting surface side of said mounting member to obtain the electrostatic chuck means constituted by said base, said insulating layer, and said conductive layer, and the heating means has a heating member provided between said base and said insulating layer on a surface side opposing said mounting surface of said mounting member.
Claim 20
Dependent Claim
19 words
A mounting table according to claim 15, wherein said insulating base of said mounting member contains boron nitride (BN).
Claim 21
Dependent Claim
23 words
A mounting table according to claim 15, wherein first and second insulating layers of said mounting member are chemical vapor deposition (CVD) films.
Claim 22
Dependent Claim
46 words
A mounting table according to claim 15, wherein said insulating layer of said mounting member contains a material selected from pyrolytic boron nitride (P--BN), silicon oxide (SiO 2 ), aluminum nitride (AlN), alumina (Al 2 O 3 ), and silicon nitride (Si 3 N 4 ).
References Cited (Backward Citations)
JPS5267353A
Cited
JPS59124140A
Cited
JPS63216283A
Cited
JPH04124076A
Cited
US5155652A
Cited
JPH04358074A
Cited
US5275683A
Cited
JPH05129210A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2000-01-07 | 2000-07-08 | 2001-01-07 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2004-01-07 | 2004-07-08 | 2005-01-07 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2008-01-07 | 2008-07-08 | 2009-01-07 | $7700.00 | Window Closed / Lapsed |