Abstract A method for making molds for use in manufacturing multiple-lead microstructures is disclosed. Each of the molds comprises a set of punch head molds and a set of matching die plate molds, and the method comprises the steps of (a) dividing the multiple-lead microstructure into a plurality of portions, each portion is to be prepared by a pair of a punch head, which contains a plurality of prutrusions, and a die plate, which contains a plurality of matching recesses; (b) preparing each of the punch head molds using a first lithographic technique; and (c) preparing each of the die plate molds using a second lithographic technique. The first lithographic technique comprises the steps of: (i) forming a thick layer of a photoresist on a baseplate; (ii) irradiating an x-ray of ultraviolet ray onto the photoresist via a first photomask; (iii) developing the photoresist to remove undesired portion thereof; (iv) electroplating a metal or metal-ceramic composite material onto the photoresist that has been developed; (v) removing the photoresist to form a micromold having recesses matching the portion of the microstructure to be prepared. The second lithographic technique involves the same steps except a second photomask, which is conjugate to the first photomask, is used.
A method for making molds for use in manufacturing multiple-lead micro structures, wherein each of said molds comprises a set of punch head molds and a set of matching die plate molds, and said method comprises the steps of: (a) dividing said multiple-lead microstructure into a plurality of portions, each portion is to be prepared by a respective pair of a punch head, which contains a plurality of protrusions, and a die plate, which contains a plurality of matching recesses; (b) preparing each of said punch head molds using a first lithographic technique; and (c) preparing each of said die plate molds using a second lithographic technique; (d) further wherein said first lithographic technique comprises the following steps: (i) forming a thick layer of a photoresist on a baseplate; (ii) irradiating an x-ray or ultraviolet ray onto said photoresist via a first photomask; (iii) developing said photoresist to remove undesired portion thereof; (iv) electroplating a metal or metal-ceramic composite material onto said photoresist that has been developed; (v) removing said photoresist to form a micromold having recesses matching said portion of said microstructure to be prepared; and (d) said second lithographic technique comprises the following steps: (i) forming a thick layer of a photoresist on another baseplate; (ii) irradiating an x-ray or ultraviolet ray onto said photoresist via a second photomask, which is a conjugate of said first photomask; (iii) developing said photoresist to remove undesired portion thereof; (iv) electroplating a metal or metal-ceramic composite material onto said photoresist that has been developed; (v) removing said photoresist to form a micromold having protrusions matching said portion of said microstructure to be prepared.
Claim 2
Independent Claim
272 words
A method for making molds for use in manufacturing multiple-lead micro structures, wherein each of said molds comprises a set of punch head molds and a set of matching die plate molds, and said method comprises the steps of: (a) dividing said multiple-lead microstructure into a plurality of portions, each portion is to be prepared by a respective pair of a punch head, which contains a plurality of protrusions, and a die plate, which contains a plurality of matching recesses; (b) preparing each of said punch head molds using a first lithographic technique; and (c) preparing each of said die plate molds using a second lithographic technique; (d) further wherein said first lithographic technique comprises the following steps: (i) forming a thick layer of a photoresist on a baseplate; (ii) irradiating an x-ray or ultraviolet ray onto said photoresist via a first photomask; (iii) developing said photoresist to remove undesired portion thereof; (iv) electroplating a metal or metal-ceramic composite material onto said photoresist that has been developed; (v) removing said photoresist to form a micromold having recesses matching said portion of said microstructure to be prepared; and (d) said second lithographic technique comprises the following steps: (i) forming a thick layer of a photoresist on another baseplate; (ii) irradiating an x-ray or ultraviolet ray onto said photoresist via a second photomask, which is a conjugate of said first photomask; (iii) developing said photoresist to remove undesired portion thereof; (iv) electroplating a metal or metal-ceramic composite material onto said photoresist that has been developed; (v) removing said photoresist to form a micromold having protrusions matching said portion of said microstructure to be prepared.
Claim 3
Dependent Claim
42 words
The method for making molds for use in manufacturing multiple-lead microstructures according to claim 1 which further comprises the step of forming a keyway near a top end of said punch head so to fix said punch head to a holding plate.