US5825040A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Bright beam method for super-resolution in e-beam lithography
Assignee: Konica Minolta Inc
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Filing: 1996-12-23
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Granted: 1998-10-20
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Expires: 2016-12-23
Abstract
Abstract A method and apparatus for bonding a layer of coating material onto a subate with minimal bulk heating of the substrate. A pulsed electron beam generator is used to produce high energy electrons at the beginning of the pulse and a larger number of lower energy electrons at the end of the pulse. A thin sacrificial or ablative layer of an easily-vaporized material such as tin is placed on top the coating. The high energy electrons penetrate through the ablative and coating layers. The ablative layer is heated to a molten state, causing it to vaporize. The ablation process generates a force on the coating layer which drives it into the substrate.
Inventors
- 👤 Christie R. K. Marrian
- 👤 Martin C. Peckerar
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 14:01
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/30; H01J37/302; H01J37/3023; H01J37/3026; H01J2237/00; H01J2237/30; H01J2237/317; H01J2237/3175; H01J2237/31761; H01J2237/31764; H01J2237/31769
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
106 words
A method of using an e-beam to expose a pattern onto an e-beam sensitive resist film, said method having the following steps: (a) dividing said pattern into a plurality of pixel elements, wherein a first one of said pixel elements corresponds to a boundary of said pattern and a second one of said pixel elements is located adjacent to said first one of said pixel elements; (b) positioning said e-beam at said second pixel element; and (c) delivering a selected dose of electron beam radiation to said second pixel element in accordance with a predetermined regiment sufficient to expose said first one of said pixel elements.
Claim 2
Independent Claim
106 words
A method of using an e-beam to expose a pattern onto an e-beam sensitive resist film, said method having the following steps: (a) dividing said pattern into a plurality of pixel elements, wherein a first one of said pixel elements corresponds to a boundary of said pattern and a second one of said pixel elements is located adjacent to said first one of said pixel elements; (b) positioning said e-beam at said second pixel element; and (c) delivering a selected dose of electron beam radiation to said second pixel element in accordance with a predetermined regiment sufficient to expose said first one of said pixel elements.
Claim 3
Dependent Claim
34 words
The method of claim 1, further including the steps of: (a) determining the exposure energy threshold for said resist; and (b) selecting said dose of electron beam radiation in accordance with said exposure threshold.
Claim 4
Dependent Claim
34 words
The method of claim 2, wherein said dose is selected so that said resist will undergo a transition from exposure to less than said energy threshold to exposure to more than said energy threshold.
Claim 5
Dependent Claim
21 words
The method of claim 3, wherein said transition occurs at a selected point within said first one of said pixel elements.
Claim 6
Dependent Claim
54 words
The method of claim 1, further including the steps of: (a) determining the energy absorption profile for said resist for e-beam electrons incident at a point on said resist as a function of the radius from said point; and (b) selecting said dose of electron beam radiation in accordance with said energy absorption profile.
Claim 7
Dependent Claim
54 words
The method of claim 1, further including the steps of: (a) determining the point spread function for said resist for e-beam electrons incident at a point on said resist as a function of the radius from said point; and (b) selecting said dose of electron beam radiation in accordance with said point spread function.
Claim 8
Dependent Claim
48 words
The method of claim 6, further including the step of: (a) determining the amount of energy required to be absorbed by said resist in order to convert said resist into a develop able state and further selecting said dose of electron beam radiation in accordance with said determination.
Claim 9
Independent Claim
163 words
A method of using an e-beam to expose a pattern onto an e-beam sensitive resist film, said method having the following steps: (a) dividing said pattern into a plurality of pixel elements, wherein a first one of said pixel elements corresponds to a boundary of said pattern and a second one of said pixel elements is located adjacent to said first one of said pixel elements; (b) positioning said e-beam at said second pixel element; (c) determining the exposure energy threshold for said resist; (d) determining the energy absorption profile for said resist for e-beam electrons incident at a point on said resist as a function of the radius from said point; and (e) delivering a selected dose of electron beam radiation to said second pixel element in accordance with said exposure energy threshold and said energy absorption profile so that said resist will undergo a transition from exposure to less than said energy threshold to exposure to more than said energy threshold.
Claim 10
Independent Claim
163 words
A method of using an e-beam to expose a pattern onto an e-beam sensitive resist film, said method having the following steps: (a) dividing said pattern into a plurality of pixel elements, wherein a first one of said pixel elements corresponds to a boundary of said pattern and a second one of said pixel elements is located adjacent to said first one of said pixel elements; (b) positioning said e-beam at said second pixel element; (c) determining the exposure energy threshold for said resist; (d) determining the energy absorption profile for said resist for e-beam electrons incident at a point on said resist as a function of the radius from said point; and (e) delivering a selected dose of electron beam radiation to said second pixel element in accordance with said exposure energy threshold and said energy absorption profile so that said resist will undergo a transition from exposure to less than said energy threshold to exposure to more than said energy threshold.
Claim 11
Dependent Claim
21 words
The method of claim 8, wherein said transition occurs at a selected point within said first one of said pixel elements.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 2001-10-19 | 2002-04-20 | 2002-10-20 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2005-10-19 | 2006-04-20 | 2006-10-20 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2009-10-19 | 2010-04-20 | 2010-10-20 | $7700.00 | Window Closed / Lapsed |