US5867276A
Expired / Lapsed
US
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Method for broad wavelength scatterometry
Assignee: Nanometrics Inc
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Filing: 1997-03-07
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Granted: 1999-02-02
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Expires: 2017-03-07
Abstract
Abstract An optical scatterometer system enables analysis of a sample material at various wavelengths without rotating or otherwise moving the sample material.
Inventors
- 👤 John R. McNeil
- 👤 Scott R. Wilson
- 👤 Richard H. Krukar
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 22:14
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70483; G03F7/70605; G03F7/70616; G01; G01B; G01B11/00; G01B11/30; G01B11/303
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
121 words
A method for broad wavelength scatterometry analysis of a patterned sample material having unknown parameter values, the method comprising: illuminating the sample material with an incident light beam having a broad spectral composition; measuring a beam of light diffracted from the sample material using a spectrometer to obtain spectrally-resolved diffraction characteristics of the sample material; determining the range and resolution of each of one or more sample parameters to be treated as one or more variables to thereby parameterize the sample material; generating calibration data; training a multivariate statistical analysis technique using the generated calibration data; and submitting the measured diffraction characteristics of the sample material to the trained statistical analysis technique to determine the parameter values of the sample material.
Claim 2
Independent Claim
121 words
A method for broad wavelength scatterometry analysis of a patterned sample material having unknown parameter values, the method comprising: illuminating the sample material with an incident light beam having a broad spectral composition; measuring a beam of light diffracted from the sample material using a spectrometer to obtain spectrally-resolved diffraction characteristics of the sample material; determining the range and resolution of each of one or more sample parameters to be treated as one or more variables to thereby parameterize the sample material; generating calibration data; training a multivariate statistical analysis technique using the generated calibration data; and submitting the measured diffraction characteristics of the sample material to the trained statistical analysis technique to determine the parameter values of the sample material.
Claim 3
Dependent Claim
24 words
A method as in claim 1, further comprising the step of determining the range and resolution of the wavelength of the incident light beam.
Claim 4
Dependent Claim
28 words
A method as in claim 1 wherein the calibration data comprise diffraction characteristics corresponding to sample materials having parameters at a plurality of points in a parameter space.
Claim 5
Dependent Claim
36 words
A method as in claim 3 wherein the diffraction characteristics comprise intensity and wavelength information corresponding to a plurality of diffracted light beams corresponding to sample materials at the plurality of points in the parameter space.
Claim 6
Dependent Claim
24 words
A method as in claim 1 wherein the step of generating calibration data comprises a selected computational electromagnetic technique to obtain theoretical calibration data.
Claim 7
Dependent Claim
41 words
A method as in claim 1 wherein the step of generating calibration data comprises generating calibration data using a set of sample materials that are similar to said sample material and having parameter values corresponding to all points in parameter space.
Claim 8
Dependent Claim
16 words
A method as in claim 1 wherein the multivariate statistical analysis technique comprises a chemometrics method.
Claim 9
Dependent Claim
17 words
A method as in claim 1 wherein the multivariate statistical analysis technique comprises an error minimization technique.
Claim 10
Dependent Claim
17 words
A method as in claim 1 wherein the multivariate statistical analysis technique comprises a parameter estimation technique.
Claim 11
Independent Claim
73 words
A method for broad wavelength scatterometry monitoring of a process for fabricating a patterned sample material, the method comprising: illuminating the sample material with an incident light beam having a broad spectral composition; measuring a beam of light diffracted from the sample material using a spectrometer to obtain spectrally-resolved diffraction characteristics of the sample material; utilizing the spectrally-resolved diffraction characteristic of the sample material to determine if the process is within specified tolerances.
Claim 12
Independent Claim
73 words
A method for broad wavelength scatterometry monitoring of a process for fabricating a patterned sample material, the method comprising: illuminating the sample material with an incident light beam having a broad spectral composition; measuring a beam of light diffracted from the sample material using a spectrometer to obtain spectrally-resolved diffraction characteristics of the sample material; utilizing the spectrally-resolved diffraction characteristic of the sample material to determine if the process is within specified tolerances.
Claim 13
Dependent Claim
24 words
A method as in claim 10, further comprising the step of controlling the process based upon the spectrally-resolved diffraction characteristics of the sample material.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2002-02-01 | 2002-08-03 | 2003-02-02 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-02-01 | 2006-08-03 | 2007-02-02 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-02-01 | 2010-08-03 | 2011-02-02 | $7700.00 | Window Closed / Lapsed |