US6074568A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Dry etching method
Assignee: Sharp Corp
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Filing: 1998-01-05
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Granted: 2000-06-13
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Expires: 2018-01-05
Abstract
Abstract A method for diagnosing a function of plasma etching apparatuses and a method for estimating selectivity in an actual etching process in fabrication of semiconductor devices involves generating plasma of a gas mixture including halogen and oxygen in a predetermined condition. An intensity of one of first emissions from the plasma at a first wavelength and an intensity of one of second emissions from the plasma at a second wavelength is measured A ratio of the intensity of the one of first emissions to that of the one of second emissions is obtained. The obtained emission intensity ratio is compared with an emission intensity ratio which is previously measured for a plasma condition when the plasma etching apparatus operates normally.
Inventors
- 👤 Kouichiro Adachi
- 👤 Satoshi Morishita
- 👤 Kazuo Sugimoto
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 09:03
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32192; G; G01; G01N; G01N21/00; G01N21/62; G01N21/66; G01N21/68; H01J37/32431; H01J37/3266; H01J37/32678; H01J37/32917; H01J37/32935; H01J37/32972; H10; H10P; H10P50/00; H10P50/20; H10P50/24; H10P50/242; H01J2237/00; H01J2237/32; H01J2237/33; H01J2237/334; H01J2237/3343; H01J2237/3346
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
105 words
A method for diagnosing a function of a plasma etching apparatus including the steps of: generating plasma of a gas mixture including halogen and oxygen in a predetermined condition; measuring an intensity of one of first emissions from the plasma at a first wavelength and an intensity of one of second emissions from the plasma at a second wavelength; obtaining a ratio of the intensity of the one of first emissions to that of the one of second emissions; comparing the obtained emission intensity ratio with an emission intensity ratio which is previously measured for a plasma condition when the plasma etching apparatus operates normally.
Claim 2
Independent Claim
105 words
A method for diagnosing a function of a plasma etching apparatus including the steps of: generating plasma of a gas mixture including halogen and oxygen in a predetermined condition; measuring an intensity of one of first emissions from the plasma at a first wavelength and an intensity of one of second emissions from the plasma at a second wavelength; obtaining a ratio of the intensity of the one of first emissions to that of the one of second emissions; comparing the obtained emission intensity ratio with an emission intensity ratio which is previously measured for a plasma condition when the plasma etching apparatus operates normally.
Claim 3
Dependent Claim
41 words
A method for diagnosing a function of a plasma etching apparatus according to claim 1, wherein in the step of measuring the intensities, emissions from oxygen radicals and emissions from halogen radicals are measured as the first and second emissions, respectively.
Claim 4
Dependent Claim
45 words
A method for diagnosing a function of a plasma etching apparatus according to claim 2, wherein in the step of measuring intensities, emissions from oxygen radicals at a wavelength of 777 nm and emissions from bromine radicals at a wavelength of 780 nm are measured.
Claim 5
Dependent Claim
45 words
A method for diagnosing a function of a plasma etching apparatus according to claim 2, wherein in the step of measuring intensities, emissions from oxygen radicals at a wavelength of 777 nm and emissions from chlorine radicals at a wavelength of 808 nm are measured.
Claim 6
Dependent Claim
30 words
A method for diagnosing a function of a plasma etching apparatus according to claim 1, wherein the gas mixture includes at least one of bromine and chlorine as the halogen.
Claim 7
Dependent Claim
56 words
A method for diagnosing a function of a plasma etching apparatus according to claim 1, wherein previous measuring of the emission intensity ratio is performed with respect to process parameters for controlling the plasma condition, and wherein the comparing step includes analyzing the obtained and previously measured emission intensity ratios with respect to the process parameters.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2003-06-13 | 2003-12-13 | 2004-06-13 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2007-06-13 | 2007-12-13 | 2008-06-13 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2011-06-13 | 2011-12-13 | 2012-06-13 | $7700.00 | Window Closed / Lapsed |