Pattern forming method and composition for pattern formation to be used therefor

Claim 2

A pattern forming method comprising the steps of: providing a resist film on a substrate; providing a photosensitive film containing a photosensitive diazonium salt on the resist film; and then subjecting the resultant composite to pattern exposure by use of a light to which both of the resist film and the photosensitive diazonium salt are sensitive.

Claim 3

A pattern forming method according to Claim 1, wherein the photosensitive diazonium salt is at least one selected from the group consisting of the compounds of the formulae (I) - (IX) shown below: wherein R 1 and R 2 may be either identical or different and represent alkyl groups, or R 1 and R 2 taken together may be cyclized through a carbon, oxygen or nitrogen atom; R 3 and R 4 may either be identical or different and each represent a hydrogen atom, an alkyl group, an aryl group, an aralkyl group, an alkoxy group, an alkylmercapto group, an aralkylmercapto group, an acyl group, a halogen atom, a sulfo group or a carboxyl group; and X represents a halogen ion or an anion constituted of a halide of boron, aluminum, iron, zinc, arsenic, antimony or phosphorus, wherein R 3 , R 4 and X⊖ are the same as defined above, wherein R 5 , R 6 , R 7 and R 8 may be either identical or different and each represent a hydrogen atom, a halogen atom, an amino group, a sulfo group, a .carboxyl group, an alkyl group, an alkoxy group, a dialkylamino group, an alkylmercapto group or an acyl group each having 1 to 6 carbon atoms, an aryl group or an aralkyl group each having 6 to 12 carbon atoms; and X represents a halogen ion, a sulfate ion or an anion consisting of a halide of either boron, phosphorus, zinc, arsenic, aluminum, iron or antimony, wherein R 9 and R 10 each represent a hydrogen atom, a halogen atom, an alkyl group, an alkenyl group, an alkoxy group, an aryl group, an aralkyl group, an amino group, a dialkylamino group, an alkylmercapto group, an acyl group, a sulfo group, a carboxyl group or where R 11 and R 12 each represent a hydrogen atom, a halogen atom, an alkyl group, an alkenyl group, an alkoxy group, an aryl group, an aralkyl group, an amino group, a dialkylamino group, an alkylmercapto group, an acyl group, a sulfo group or a carboxyl group; and X represents an anion capable of forming a diazonium salt, wherein R 13 , R 14 , R 15 and R 16 each represent a hydrogen atom, a halogen atom, an alkyl group, an alkenyl group, an alkoxy group, an aryl group, an aralkyl group, an amino group, a dialkylamino group, an alkylmercapto group, an acyl group, a sulfo group or a carboxyl group; and X represents an anion capable of forming a diazonium salt, wherein R 17 and R 18 each represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, a phenyl group, or R 17 and R 18 taken together may be cyclized through a carbon, oxygen or nitrogen atom; R 19 and R 20 each represent a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group or an alkenyl group each having 1 to 6 carbon atoms; R 21 and R 22 each represent a hydrogen atom,. a hydroxyl group, a carboxyl group, a sulfo group, an alkyl group or an alkoxy group each having 1 to 6 carbon atoms, an amino group, a nitro group or a benzoyl group.

Claim 4

A pattern forming method according to Claim 1, wherein the photosensitive solution for forming the photosensitive film contains at least one selected from the group consisting of benzenesulfonic acid derivatives of the formula (X), the naphthosulfonic acid derivatives of the formula (XI), the phenol derivatives of the formula (XII) and the naphthol derivatives of the formula (XIII): wherein R 23 and R24 may be either identical or different and each represent a hydrogen atom, a halogen atom, a hydroxyl group, a carboxyl group or an alkyl group, wherein R 25 and R 26 may be either identical or different and each represent a hydrogen atom, a halogen atom, a hyroxyl group, a carboxyl group, a sulfo group, an alkyl group having 1 to 5 carbon atoms, an amino group or a nitro group, wherein R 25 and R 26 have the same meanings as defined above, wherein R 25 and R 26 have the same meanings as defined above.

Claim 5

A pattern forming method according to Claim 3, wherein the compounds represented by the formulae (X) to (XIII) are contained in an amount of 0.5 to 5.0 mole per mole of the photosensitive diazonium salt.

Claim 6

A pattern forming method according to Claim l, wherein the light has a wavelength of 300 nm or longer to 450 nm or less.

Claim 7

A pattern forming method according to Claim 1, including the step of forming a transparent thin film, which does not dissolve said resist film and is also difficultly soluble in the photosensitive film, on the resist film.

Claim 8

A composition for pattern formation comprising a photosensitive diazonium salt, a resin binder and a solvent.

Claim 9

A composition for pattern formation comprising a photosensitive diazonium salt, a resin binder and a solvent.

Claim 10

A composition for pattern formation according to Claim 7, wherein said photosensitive diazonium salt is at least one selected from the group consisting of the formulae (I) - (IX) shown below: wherein R 1 and R 2 may be either identical or different and represent alkyl groups, or R 1 and R 2 taken together may be cyclized through a carbon, oxygen or nitrogen atom; R 3 and R 4 may either be identical or different and each represent a hydrogen atom, an alkyl group, an aryl group, an aralkyl group, an alkoxy group, an alkylmercapto group, an aralkylmercapto group, an acyl group, a halogen atom, a sulfo group or a carboxyl group; and X⊖ represents a halogen ion or an anion constituted of a halide of boron, aluminum, iron, zinc, arsenic, antimony or phosphorus, wherein R 3 , R 4 and X⊖ are the same as defined above, wherein R 5 , R 6 , R 7 and R may be either identical or different and each represent a hydrogen atom, a halogen atom, an amino group, a sulfo group, a carboxyl group, an alkyl group, an alkoxy group, a dialkylamino group, an alkylmercapto group or an acyl group each having 1 to 6 carbon atoms, an aryl group or an aralkyl group each having 6 to 12 carbon atoms; and X represents a halogen ion, a sulfate ion or an anion consisting of a halide of either boron, phosphorus, zinc, arsenic, aluminum, iron or antimony, wherein R 9 and R 10 each represent a hydrogen atom, a halogen atom, an alkyl group, an alkenyl group, an alkoxy group, an aryl group, an aralkyl group, an amino group, a dialkylamino group, an alkylmercapto group, an acyl group, a sulfo group, a carboxyl group or where R 11 and R 12 each represent a hydrogen atom, a halogen atom, an alkyl group, an alkenyl group, an alkoxy group, an aryl group, an aralkyl group, an amino group, a dialkylamino group, an alkylmercapto group, an acyl group, a sulfo group or a carboxyl group; and X represents an anion capable of forming a diazonium salt, wherein R 1 3, R 14 , R 15 and R 16 each represent a hydrogen atom, a halogen atom, an alkyl group, an alkenyl group, an alkoxy group, an aryl group, an aralkyl group, an amino group, a dialkylamino group, an alkylmercapto group, an acyl group, a sulfo group or a carboxyl group; and X represents an anion capable of forming a diazonium salt, wherein R 17 and R 18 each represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, a phenyl group, or R 17 and R 18 taken together may be cyclized through a carbon, oxygen or nitrogen atom; R 19 and R 20 each represent a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group or an alkenyl group each having 1 to 6 carbon atoms; R 21 and R 22 each represent a hydrogen atom, a hydroxyl group, a carboxyl group, a sulfo group, an alkyl group or an alkoxy group each having 1 to 6 carbon atoms, an amino group, a nitro group or a benzoyl group.

Claim 11

A composition for pattern formation according to Claim 7, wherein the resin binder is selected from the group consisting of polyvinylpyrrolidone, copolymers of vinyl methyl ether and maleic anhydride, polyvinyl alcohol, methyl cellulose, hydroxymethyl cellulose, hydroxypropyl cellulose, hydroxypropylmethyl cellulose, gelatin, egg white, casein, shellac, cellulose acetate butyrate, cellulose acetate, ethyl cellulose, polystyrene, cyclized polyisoprene, polyvinyl chloride, polyvinyl acetate, phenolic resins, polyester resin, copolymers of methyl methacrylate and methacrylic acid, and copolymers of methyl acrylate and acrylic acid.

Claim 12

A composition for pattern formation according to Claim 7, further containing at least one selected from the group consisting of benzenesulfonic acid derivatives of the formula (X), the naphthosulfonic acid derivatives of the formula (XI), the phenol derivatives of the formula (XII) and the naphthol derivatives of the formula (XIII): wherein R 23 and R 24 may be either identical or different and each represent a hydrogen atom, a halogen atom, a hydroxyl group, a carboxyl group or an alkyl group, wherein R 25 and R 26 may be either identical or different and each represent a hydrogen atom, a halogen atom, a hyroxyl group, a carboxyl group, a sulfo group, an alkyl group having 1 to 5 carbon atoms, an amino group or a nitro group, wherein R 25 and R 26 have the same meanings as defined above, wherein R 25 and R 26 have the same meanings as defined above.

Claim 13

A composition for pattern formation according to Claim 10, wherein the compounds represented by the formulae (X) to (XIII) are contained in an amount of 0.5 to 5.0 mole per mole of the photosensitive diazonium salt.