Patent US559498A successfully refreshed from Google Patents.
Patent EP0171068A2 successfully refreshed from Google Patents.
EP0171068A2
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EP
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Method of forming ultrafine patterns
Assignee: Fujifilm Holdings Corp
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Filing: 1985-08-06
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Granted: —
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Expires: 2005-08-06
Abstract
Abstract A method of forming an ultrafine pattern, said method comprising selectively forming adsorption sites on a substrate surface by irradiation with a focused electron beam in a vacuum and then depositing a pattern-forming substance onto the substrate by vacuum vapor deposition, chemical vapor deposition, sputtering or other suitable deposition methods, thereby forming the aimed ultrafine patterns. The method can provide ultrafine patterns in a very high resolution or precision by means of an electron beam irradiation and deposition technique under carefully controlled process conditions and, particularly, the electron beam irradiation in the presence of oil gas results in a better quality of pattern.
Inventors
- 👤 Shizuo Umemura
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-01 15:42
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/20; G03F7/2051; G03F7/2059; C; C23; C23C; C23C16/00; C23C16/04; C23C16/047; G03F7/004
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
47 words
A method of forming an ultrafine pattern which comprises selectively forming preferred sites for the deposition of a pattern-forming substance (adsorption sites) on the surface of a substrate by irradiation with a focused electron beam in a vacuum and then depositing said pattern-forming substance onto said substrate.
Claim 2
Independent Claim
47 words
A method of forming an ultrafine pattern which comprises selectively forming preferred sites for the deposition of a pattern-forming substance (adsorption sites) on the surface of a substrate by irradiation with a focused electron beam in a vacuum and then depositing said pattern-forming substance onto said substrate.
Claim 3
Dependent Claim
30 words
The method of forming an ultrafine pattern as claimed in Claim 1 in which said pattern-forming substance is deposited onto said substrate being heated at a temperature higher 50 °C.
Claim 4
Dependent Claim
28 words
The method of forming an ultrafine pattern as claimed in Claim 1 in which said substrate is heated to a temperature higher than 50 °C after said deposition.
Claim 5
Dependent Claim
50 words
The method of forming an ultrafine pattern as claimed in Claim 1 in which said adsorption sites are formed by performing said electron beam irradiation in a vacuum atmosphere containing vapor or gas, thereby forming adsorbates or deposits of said vapor or gas, on the irradiated area of said substrate.
Claim 6
Dependent Claim
54 words
The method of forming an ultrafine pattern as claimed in Claim 1 in which said adsorption sites are formed by performing said electron beam irradiation in a vacuum atmosphere containing vapor or gas, thereby forming adsorbates or deposits of the decomposition products of said vapor or gas, on the irradiated area of said substrate.
Claim 7
Dependent Claim
55 words
The method of forming an ultrafine pattern as claimed in Claim 1 in which said adsorption sites are formed by performing said electron beam irradiation in a vacuum atmosphere containing vapor or gas, thereby forming the deposits of reaction products of said vapor or gas with said substrate, on the irradiated area of said substrate.
Claim 8
Dependent Claim
27 words
The method of forming an ultrafine pattern as claimed in Claim 4 in which said vapor is the vapor of oil used in an oil diffusion pump.
Claim 9
Dependent Claim
27 words
The method of forming an ultrafine pattern as claimed in Claim 5 in which said vapor is the vapor of oil used in an oil diffusion pump.
Claim 10
Dependent Claim
27 words
The method of forming an ultrafine pattern as claimed in Claim 6 in which said vapor is the vapor of oil used in an oil diffusion pump.
Claim 11
Dependent Claim
37 words
The method of forming an ultrafine pattern as claimed in Claim 1 in which said substance capable of forming said adsorption sites is adsorbed onto the entire surface of said substrate prior to said electron beam irradiation.
Claim 12
Dependent Claim
22 words
The method of forming a ultrafine pattern as claimed in Claim 1 in which said substrate is made of metal or semiconductor.
References Cited (Backward Citations)
No citation records indexed.
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