Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
140 words
A method for producing fine patterns by spin-coating a photosensitive resin solution as an upper layer, which comprises a diazonium salt as a photobleachable agent, at least one of water and an organic solvent, and a polymer, on a resist layer as a lower layer and then light-exposing both the upper layer and the lower layer, wherein the polymer in the upper layer has a structural unit represented by formula (I): wherein R₁, R₂, and R₃ each represents a hydrogen atom, an alkyl group having from 1 to 4 carbon atoms, a halogen atom, or a nitrile group; R₄ represents a hydrogen atom, an alkyl group having from 1 to 4 carbon atoms, a halogen atom, a hydroxyl group, or a carboxyl group; and X represents a hydrogen atom, an alkali metal, an alkaline earth metal, or an ammonium group.
Claim 2
Independent Claim
140 words
A method for producing fine patterns by spin-coating a photosensitive resin solution as an upper layer, which comprises a diazonium salt as a photobleachable agent, at least one of water and an organic solvent, and a polymer, on a resist layer as a lower layer and then light-exposing both the upper layer and the lower layer, wherein the polymer in the upper layer has a structural unit represented by formula (I): wherein R₁, R₂, and R₃ each represents a hydrogen atom, an alkyl group having from 1 to 4 carbon atoms, a halogen atom, or a nitrile group; R₄ represents a hydrogen atom, an alkyl group having from 1 to 4 carbon atoms, a halogen atom, a hydroxyl group, or a carboxyl group; and X represents a hydrogen atom, an alkali metal, an alkaline earth metal, or an ammonium group.
Claim 3
Dependent Claim
29 words
A method for producing fine patterns as claimed in claim 1, wherein the polymer in the upper layer is a copolymer containing the structural unit shown by formula (I).
Claim 4
Dependent Claim
37 words
A method for producing fine patterns as claimed in claim 2, wherein the proportion of a comonomer having the structural unit shown by formula (I) in the polymer in the upper layer is at least 50 mol%.
Claim 5
Independent Claim
75 words
A method for producing fine patterns by spin-coating a photosensitive resin solution as an upper layer, which comprises a diazonium salt as a photobleachable agent, at least one of water and an organic solvent, and a polymer, on a resist layer as a lower layer and then light-exposing both the upper layer and the lower layer, wherein a counter anion of the diazonium salt is a functional group of the polymer in the photosensitive resin.
Claim 6
Independent Claim
75 words
A method for producing fine patterns by spin-coating a photosensitive resin solution as an upper layer, which comprises a diazonium salt as a photobleachable agent, at least one of water and an organic solvent, and a polymer, on a resist layer as a lower layer and then light-exposing both the upper layer and the lower layer, wherein a counter anion of the diazonium salt is a functional group of the polymer in the photosensitive resin.
Claim 7
Dependent Claim
26 words
A method for producing fine patterns as claimed in claim 4, wherein the functional group of the polymer in the photosensitive resin is a sulfonic group.
Claim 8
Dependent Claim
96 words
A method for producing fine patterns as claimed in claim 4, wherein the polymer in the photosensitive resin has a structural unit represented by formula (I): wherein R₁, R₂, and R₃ each represents a hydrogen atom, an alkyl group having from 1 to 4 carbon atoms, a halogen atom, or a nitrile group; R₄ represents a h ydrogen atom, an alkyl group having from 1 to 4 carbon atoms, a halogen atom, a hydroxyl group, or a carboxyl group; and X represents a hydrogen atom, an alkali metal, an alkaline earth metal, or an ammonium group.
Claim 9
Dependent Claim
29 words
A method for producing fine patterns as claimed in claim 6, wherein the polymer in the photosensitive resin is a copolymer containing the structural unit shown by formula (I).
Claim 10
Dependent Claim
37 words
A method for producing fine patterns as claimed in claim 7, wherein the proportion of a comonomer having the structural unit shown by formula (I) in the polymer in the photosensitive resin is at least 50 mol%.
Claim 11
Dependent Claim
53 words
A method for producing fine patterns as claimed in claim 4, wherein in the polymer of the photosensitive resin, the proportion of the free functional group in the polymer is at least 30% of both the functional group which can be a counter anion of the diazonium salt and the free functional group.